Abstract: A portable beverage apparatus that is configured to store a plurality of bottles in a position for dispensing liquid therefrom and wherein the present invention further includes storage for additional beverage receptacles. The present invention includes an annular base support member having a lower storage container superposed thereto. The lower storage container is configured to receive and store beverage containers of various sizes. A support mast member extends upward from the lower end of the portable beverage apparatus to the upper end thereof. A beverage dispensing assembly is rotatably mounted about the support mast member. The beverage dispensing assembly is configured to receive and retain a plurality of bottles in an inverted position providing access to the contents of the bottle through valve assemblies. An upper tray member is located at the top of the beverage dispensing assembly and is configured to receive and store alternate types of beverage containers.

Abstract: A portable beverage apparatus that is configured to store a plurality of bottles in a position for dispensing liquid therefrom and wherein the present invention further includes storage for additional beverage receptacles. The present invention includes an annular base support member having a lower storage container superposed thereto. The lower storage container is configured to receive and store beverage containers of various sizes. A support mast member extends upward from the lower end of the portable beverage apparatus to the upper end thereof. A beverage dispensing assembly is rotatably mounted about the support mast member. The beverage dispensing assembly is configured to receive and retain a plurality of bottles in an inverted position providing access to the contents of the bottle through valve assemblies. An upper tray member is located at the top of the beverage dispensing assembly and is configured to receive and store alternate types of beverage containers.

Abstract: The present invention provides methods of preparing heteroaryl-ketone fused azadecalin glucocorticoid receptor modulators, and compositions having low impurity levels.

Abstract: The present disclosure relates to lithographic masks and, more particularly, to a lithographic mask substrate structure and methods of manufacture. The mask includes a sub-resolution assist feature (SRAF) formed on a quartz substrate and composed of a patterned transition film and absorber layer.

Abstract: The present disclosure relates to lithographic masks and, more particularly, to a lithographic mask substrate structure and methods of manufacture. The mask includes a sub-resolution assist feature (SRAF) formed on a quartz substrate and composed of a patterned transition film and absorber layer.

Abstract: A photoresist trimming gas compound is provided which will selectively remove a resist foot or scum from the lower portions of sidewalls of a photoresist. Additionally, the trimmer compound hardens or toughens an upper surface of the photoresist thereby strengthening the photoresist. The trimmer compound includes O2 and at least one other gaseous oxide and is typically utilized in a dry etching process after a trench has been formed in a photoresist. The other oxide gases, in addition to the O2 may include CO2, SO2 and NO2.

Abstract: A photoresist trimming gas compound is provided which will selectively remove a resist foot or scum from the lower portions of sidewalls of a photoresist. Additionally, the trimmer compound hardens or toughens an upper surface of the photoresist thereby strengthening the photoresist. The trimmer compound includes O2 and at least one other gaseous oxide and is typically utilized in a dry etching process after a trench has been formed in a photoresist. The other oxide gases, in addition to the O2 may include CO2, SO2 and NO2.

Abstract: A photoresist trimming gas compound is provided which will selectively remove a resist foot or scum from the lower portions of sidewalls of a photoresist. Additionally, the trimmer compound hardens or toughens an upper surface of the photoresist thereby strengthening the photoresist. The trimmer compound includes O2 and at least one other gaseous oxide and is typically utilized in a dry etching process after a trench has been formed in a photoresist The other oxide gases, in addition to the O2 may include CO2, SO2 and NO2.