Patents by Inventor A Man Zheng

A Man Zheng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250031366
    Abstract: A semiconductor structure is disclosed. The semiconductor structure includes a staircase structure disposed over a substrate. The staircase structure includes a plurality of layer stacks, where each layer stack is made of a first material layer over a portion of a second material layer. The staircase structure further includes a plurality of landing pads, where each landing pad is disposed over another portion of the second material layer of a respective layer stack.
    Type: Application
    Filed: October 4, 2024
    Publication date: January 23, 2025
    Applicant: Yangtze Memory Technologies Co., Ltd.
    Inventors: Zhenyu LU, Jun CHEN, Xiaowang DAI, Jifeng ZHU, Qian TAO, Yu Ru HUANG, Si Ping HU, Lan YAO, Li Hong XIAO, A Man ZHENG, Kun BAO, Haohao YANG
  • Patent number: 12137558
    Abstract: A semiconductor structure is disclosed. The semiconductor structure includes a staircase structure disposed over a substrate. The staircase structure includes a plurality of layer stacks, where each layer stack is made of a first material layer over a portion of a second material layer. The staircase structure further includes a plurality of landing pads, where each landing pad is disposed over another portion of the second material layer of a respective layer stack.
    Type: Grant
    Filed: November 10, 2022
    Date of Patent: November 5, 2024
    Assignee: Yangtze Memory Technologies Co., Ltd.
    Inventors: Zhenyu Lu, Jun Chen, Xiaowang Dai, Jifeng Zhu, Qian Tao, Yu Ru Huang, Si Ping Hu, Lan Yao, Li Hong Xiao, A Man Zheng, Kun Bao, Haohao Yang
  • Patent number: 12010838
    Abstract: A semiconductor structure is disclosed. The semiconductor structure includes a staircase structure disposed over a substrate. The staircase structure includes a plurality of layer stacks, where each layer stack is made of a first material layer over a portion of a second material layer. The staircase structure further includes a plurality of landing pads, where each landing pad is disposed over another portion of the second material layer of a respective layer stack.
    Type: Grant
    Filed: September 13, 2021
    Date of Patent: June 11, 2024
    Assignee: Yangtze Memory Technologies Co., Ltd.
    Inventors: Zhenyu Lu, Jun Chen, Xiaowang Dai, Jifeng Zhu, Qian Tao, Yu Ru Huang, Si Ping Hu, Lan Yao, Li Hong Xiao, A Man Zheng, Kun Bao, Haohao Yang
  • Publication number: 20230084008
    Abstract: A semiconductor structure is disclosed. The semiconductor structure includes a staircase structure disposed over a substrate. The staircase structure includes a plurality of layer stacks, where each layer stack is made of a first material layer over a portion of a second material layer. The staircase structure further includes a plurality of landing pads, where each landing pad is disposed over another portion of the second material layer of a respective layer stack.
    Type: Application
    Filed: September 13, 2021
    Publication date: March 16, 2023
    Applicant: Yangtze Memory Technologies Co., Ltd.
    Inventors: Zhenyu Lu, Jun Chen, Xiaowang Dai, Jifeng Zhu, Qian Tao, Yu Ru Huang, Si Ping Hu, Lan Yao, Li Hong Xiao, A Man Zheng, Kun Bao, Haohao Yang
  • Publication number: 20230083030
    Abstract: A semiconductor structure is disclosed. The semiconductor structure includes a staircase structure disposed over a substrate. The staircase structure includes a plurality of layer stacks, where each layer stack is made of a first material layer over a portion of a second material layer. The staircase structure further includes a plurality of landing pads, where each landing pad is disposed over another portion of the second material layer of a respective layer stack.
    Type: Application
    Filed: November 10, 2022
    Publication date: March 16, 2023
    Applicant: Yangtze Memory Technologies Co., Ltd.
    Inventors: Zhenyu Lu, Jun Chen, Xiaowang Dai, Jifeng Zhu, Qian Tao, Yu Ru Huang, Si Ping Hu, Lan Yao, Li Hong Xiao, A Man Zheng, Kun Bao, Haohao Yang
  • Patent number: 11145666
    Abstract: A semiconductor structure is disclosed. The semiconductor structure includes a staircase structure disposed over a substrate. The staircase structure includes a plurality of layer stacks, where each layer stack is made of a first material layer over a portion of a second material layer. The staircase structure further includes a plurality of landing pads, where each landing pad is disposed over another portion of the second material layer of a respective layer stack.
    Type: Grant
    Filed: May 28, 2020
    Date of Patent: October 12, 2021
    Assignee: Yangtze Memory Technologies Co., Ltd.
    Inventors: Zhenyu Lu, Jun Chen, Xiaowang Dai, Jifeng Zhu, Qian Tao, Yu Ru Huang, Si Ping Hu, Lan Yao, Li Hong Xiao, A Man Zheng, Kun Bao, Haohao Yang
  • Patent number: 11101276
    Abstract: Embodiments of semiconductor structures including word line contact structures for three-dimensional memory devices and fabrication methods for forming word line contact structures are disclosed. The semiconductor structures include a staircase structure having a plurality of steps, and each step includes a conductive layer disposed over a dielectric layer. The semiconductor structures further include a barrier layer disposed over a portion of the conductive layer of each step. The semiconductor structures also include an etch-stop layer disposed on the barrier layer and an insulating layer disposed on the etch-stop layer. The semiconductor structures also include a plurality of conductive structures formed in the insulating layer and each conductive structure is formed on the conductive layer of each step.
    Type: Grant
    Filed: May 1, 2020
    Date of Patent: August 24, 2021
    Assignee: Yangtze Memory Technologies Co., Ltd.
    Inventors: Jifeng Zhu, Zhenyu Lu, Jun Chen, Si Ping Hu, Xiaowang Dai, Lan Yao, Li Hong Xiao, A Man Zheng, Kun Bao, Haohao Yang
  • Publication number: 20200295019
    Abstract: A semiconductor structure is disclosed. The semiconductor structure includes a staircase structure disposed over a substrate. The staircase structure includes a plurality of layer stacks, where each layer stack is made of a first material layer over a portion of a second material layer. The staircase structure further includes a plurality of landing pads. where each landing pad is disposed over another portion of the second material layer of a respective layer stack.
    Type: Application
    Filed: May 28, 2020
    Publication date: September 17, 2020
    Applicant: Yangtze Memory Technologies Co., Ltd.
    Inventors: Zhenyu LU, Jun Chen, Xiaowang Dai, Jifeng Zhu, Qian Tao, Yu Ru Huang, Si Ping Hu, Lan Yao, Li Hong Xiao, A Man Zheng, Kun Bao, Haohao Yang
  • Publication number: 20200258837
    Abstract: Embodiments of semiconductor structures including word line contact structures for three-dimensional memory devices and fabrication methods for forming word line contact structures are disclosed. The semiconductor structures include a staircase structure having a plurality of steps, and each step includes a conductive layer disposed over a dielectric layer. The semiconductor structures further include a barrier layer disposed over a portion of the conductive layer of each step. The semiconductor structures also include an etch-stop layer disposed on the barrier layer and an insulating layer disposed on the etch-stop layer. The semiconductor structures also include a plurality of conductive structures formed in the insulating layer and each conductive structure is formed on the conductive layer of each step.
    Type: Application
    Filed: May 1, 2020
    Publication date: August 13, 2020
    Applicant: Yangtze Memory Technologies Co., Ltd.
    Inventors: Jifeng ZHU, Zhenyu LU, Jun CHEN, Si Ping HU, Xiaowang DAI, Lan YAO, Li Hong XIAO, A Man ZHENG, Kun BAO, Haohao YANG
  • Patent number: 10680003
    Abstract: A semiconductor structure is disclosed. The semiconductor structure includes a staircase structure disposed over a substrate. The staircase structure includes a plurality of layer stacks, where each layer stack is made of a first material layer over a portion of a second material layer. The staircase structure further includes a plurality of landing pads, where each landing pad is disposed over another portion of the second material layer of a respective layer stack.
    Type: Grant
    Filed: September 10, 2018
    Date of Patent: June 9, 2020
    Assignee: Yangtze Memory Technologies Co., Ltd.
    Inventors: Zhenyu Lu, Jun Chen, Xiaowang Dai, Jifeng Zhu, Qian Tao, Yu Ru Huang, Si Ping Hu, Lan Yao, Li Hong Xiao, A Man Zheng, Kun Bao, Haohao Yang
  • Patent number: 10672711
    Abstract: Embodiments of semiconductor structures including word line contact structures for three-dimensional memory devices and fabrication methods for forming word line contact structures are disclosed. The semiconductor structures include a staircase structure having a plurality of steps, and each step includes a conductive layer disposed over a dielectric layer. The semiconductor structures further include a barrier layer disposed over a portion of the conductive layer of each step. The semiconductor structures also include an etch-stop layer disposed on the barrier layer and an insulating layer disposed on the etch-stop layer. The semiconductor structures also include a plurality of conductive structures formed in the insulating layer and each conductive structure is formed on the conductive layer of each step.
    Type: Grant
    Filed: September 10, 2018
    Date of Patent: June 2, 2020
    Assignee: Yangtze Memory Technologies Co., Ltd.
    Inventors: Jifeng Zhu, Zhenyu Lu, Jun Chen, Si Ping Hu, Xiaowang Dai, Lan Yao, Li Hong Xiao, A Man Zheng, Kun Bao, Haohao Yang
  • Publication number: 20190096810
    Abstract: Embodiments of semiconductor structures including word line contact structures for three-dimensional memory devices and fabrication methods for forming word line contact structures are disclosed. The semiconductor structures include a staircase structure having a plurality of steps, and each step includes a conductive layer disposed over a dielectric layer. The semiconductor structures further include a barrier layer disposed over a portion of the conductive layer of each step. The semiconductor structures also include an etch-stop layer disposed on the barrier layer and an insulating layer disposed on the etch-stop layer. The semiconductor structures also include a plurality of conductive structures formed in the insulating layer and each conductive structure is formed on the conductive layer of each step.
    Type: Application
    Filed: September 10, 2018
    Publication date: March 28, 2019
    Applicant: Yangtze Technologies Co., Ltd.
    Inventors: Jifeng ZHU, Zhenyu LU, Jun CHEN, Si Ping HU, Xiaowang DAI, Lan YAO, Li Hong XIAO, A Man ZHENG, Kun BAO, Haohao YANG
  • Publication number: 20190081070
    Abstract: A semiconductor structure is disclosed. The semiconductor structure includes a staircase structure disposed over a substrate. The staircase structure includes a plurality of layer stacks, where each layer stack is made of a first material layer over a portion of a second material layer. The staircase structure further includes a plurality of landing pads, where each landing pad is disposed over another portion of the second material layer of a respective layer stack.
    Type: Application
    Filed: September 10, 2018
    Publication date: March 14, 2019
    Applicant: Yangtze Memory Technologies Co., Ltd.
    Inventors: Zhenyu LU, Jun Chen, Xiaowang Dai, Jifeng Zhu, Qian Tao, Yu Ru Huang, Si Ping Hu, Lan Yao, Li Hong Xiao, A Man Zheng, Kun Bao, Haohao Yang