Patents by Inventor A. Marcia Almanza-Workman

A. Marcia Almanza-Workman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8029964
    Abstract: A polymer-based pattern mask system and methods of masking and patterning a substrate employ an organosilane to enhance adhesion between a pattern mask and the substrate. The substrate is compatible with the organosilane. The methods include applying a coating of the organosilane to a substrate surface and printing a pattern mask on the coated surface using a roll-to-roll printing process. The pattern mask is polymer-based. The organosilane enhances adhesion during printing of the pattern mask. The method of patterning further includes patterning the substrate surface and lifting-off the pattern mask. The organosilane further enhances adhesion during patterning and does not hinder lifting-off the pattern mask. The system includes the pattern mask, the organosilane and a lift-off agent to remove the pattern mask.
    Type: Grant
    Filed: July 20, 2007
    Date of Patent: October 4, 2011
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: A. Marcia Almanza-Workman, Carl P. Taussig
  • Patent number: 8017293
    Abstract: A liquid toner-based pattern mask system and methods of masking and patterning a substrate employ a polymer-based liquid toner as a pattern mask. The liquid toner is deposited on the substrate in a masking pattern. The pattern mask is lifted off of the substrate after patterning the substrate using a lift-off technique that breaks a bond between the surface of the substrate and the pattern mask.
    Type: Grant
    Filed: April 9, 2007
    Date of Patent: September 13, 2011
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: A. Marcia Almanza-Workman, Carl P. Taussig
  • Publication number: 20080248405
    Abstract: A liquid toner-based pattern mask system and methods of masking and patterning a substrate employ a polymer-based liquid toner as a pattern mask. The liquid toner is deposited on the substrate in a masking pattern. The pattern mask is lifted off of the substrate after patterning the substrate using a lift-off technique that breaks a bond between the surface of the substrate and the pattern mask.
    Type: Application
    Filed: April 9, 2007
    Publication date: October 9, 2008
    Inventors: A. Marcia Almanza-Workman, Carl P. Taussig