Patents by Inventor A. Reid

A. Reid has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PHOTORESIST TRIMMING PROCESS
    Publication number: 20080032214
    Abstract: A photoresist trimming gas compound is provided which will selectively remove a resist foot or scum from the lower portions of sidewalls of a photoresist. Additionally, the trimmer compound hardens or toughens an upper surface of the photoresist thereby strengthening the photoresist. The trimmer compound includes O2 and at least one other gaseous oxide and is typically utilized in a dry etching process after a trench has been formed in a photoresist. The other oxide gases, in addition to the O2 may include CO2, SO2 and NO2.
    Type: Application
    Filed: October 9, 2007
    Publication date: February 7, 2008
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Shaun Crawford, Cuc Huynh, A. Reid, Adam Smith, Thomas Wagner
  • PHOTORESIST TRIMMING PROCESS
    Publication number: 20080020586
    Abstract: A photoresist trimming gas compound is provided which will selectively remove a resist foot or scum from the lower portions of sidewalls of a photoresist. Additionally, the trimmer compound hardens or toughens an upper surface of the photoresist thereby strengthening the photoresist. The trimmer compound includes O2 and at least one other gaseous oxide and is typically utilized in a dry etching process after a trench has been formed in a photoresist. The other oxide gases, in addition to the O2 may include CO2, SO2 and NO2.
    Type: Application
    Filed: September 27, 2007
    Publication date: January 24, 2008
    Applicant: International Business Machines Corporation
    Inventors: Shaun CRAWFORD, Cuc Huynh, A. Reid, Adam Smith, Thomas Wagner
  • PHOTORESIST TRIMMING PROCESS
    Publication number: 20060040504
    Abstract: A photoresist trimming gas compound is provided which will selectively remove a resist foot or scum from the lower portions of sidewalls of a photoresist. Additionally, the trimmer compound hardens or toughens an upper surface of the photoresist thereby strengthening the photoresist. The trimmer compound includes O2 and at least one other gaseous oxide and is typically utilized in a dry etching process after a trench has been formed in a photoresist The other oxide gases, in addition to the O2 may include CO2, SO2 and NO2.
    Type: Application
    Filed: August 19, 2004
    Publication date: February 23, 2006
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Shaun Crawford, Cuc Huynh, A. Reid, Adam Smith, Thomas Wagner