Patents by Inventor A. S. Chu

A. S. Chu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11049719
    Abstract: In one implementation, a processing system includes a first transfer chamber coupling to at least one epitaxy process chamber, a second transfer chamber, a transition station disposed between the first transfer chamber and the second transfer chamber, a first plasma chamber coupled to the second transfer chamber for removing oxides from a surface of a substrate, and a load lock chamber coupled to the second transfer chamber. The transition station connects to the first transfer chamber and the second transfer chamber, and the transition station includes a second plasma chamber for removing contaminants from the surface of the substrate.
    Type: Grant
    Filed: August 7, 2018
    Date of Patent: June 29, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Lara Hawrylchak, Kin Pong Lo, Errol C. Sanchez, Schubert S. Chu, Tushar Mandrekar
  • Publication number: 20210180050
    Abstract: High-fidelity, high-throughput nucleic acid sequencing enables healthcare practitioners and patients to gain insight into genetic variants and potential health risks. However, previous methods of nucleic acid sequencing often introduces sequencing errors (for example, mutations that arise during the preparation of a nucleic acid library, during amplification, or sequencing). Provided herein are methods and compositions for sequencing nucleic acids. Further provided are methods of identifying an error in a nucleic acid sequence.
    Type: Application
    Filed: February 26, 2021
    Publication date: June 17, 2021
    Inventors: Henry H. Lai, Clement S. Chu
  • Patent number: 11037838
    Abstract: The systems and methods discussed herein are for a cluster tool that can be used for MOSFET device fabrication, including NMOS and PMOS devices. The cluster tool includes process chambers for pre-cleaning, metal-silicide or metal-germanide film formation, and surface protection operations such as capping and nitridation. The cluster tool can include one or more process chambers configured to form a source and a drain. The devices fabricated in the cluster tool are fabricated to have at least one protective layer formed over the metal-silicide or metal-germanide film to protect the film from contamination during handling and transfer to separate systems.
    Type: Grant
    Filed: September 3, 2019
    Date of Patent: June 15, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Xuebin Li, Schubert S. Chu, Errol Antonio C. Sanchez, Patricia M. Liu, Gaurav Thareja, Raymond Hoiman Hung
  • Publication number: 20210175115
    Abstract: In one embodiment, a susceptor for thermal processing is provided. The susceptor includes an outer rim surrounding and coupled to an inner dish, the outer rim having an inner edge and an outer edge. The susceptor further includes one or more structures for reducing a contacting surface area between a substrate and the susceptor when the substrate is supported by the susceptor. At least one of the one or more structures is coupled to the inner dish proximate the inner edge of the outer rim.
    Type: Application
    Filed: February 23, 2021
    Publication date: June 10, 2021
    Inventors: Anhthu NGO, Zuoming ZHU, Balasubramanian RAMACHANDRAN, Paul BRILLHART, Edric TONG, Anzhong CHANG, Kin Pong LO, Kartik SHAH, Schubert S. CHU, Zhepeng CONG, James Francis MACK, Nyi O. MYO, Kevin Joseph BAUTISTA, Xuebin LI, Yi-Chiau HUANG, Zhiyuan YE
  • Patent number: 11021795
    Abstract: Embodiments of the present disclosure generally relate to apparatus and methods for semiconductor processing, more particularly, to a thermal process chamber. The thermal process chamber includes a substrate support, a first plurality of heating elements disposed over or below the substrate support, and a spot heating module disposed over the substrate support. The spot heating module is utilized to provide local heating of cold regions on a substrate disposed on the substrate support during processing. Localized heating of the substrate improves temperature profile, which in turn improves deposition uniformity.
    Type: Grant
    Filed: October 25, 2018
    Date of Patent: June 1, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Shu-Kwan Lau, Koji Nakanishi, Toshiyuki Nakagawa, Zuoming Zhu, Zhiyuan Ye, Joseph M. Ranish, Nyi O. Myo, Errol Antonio C. Sanchez, Schubert S. Chu
  • Publication number: 20210103944
    Abstract: A computer system may access an attributization rule and convert, based on the attributization rule, profile data into attributes for a robust recipient profile. The system may identify, based on tag logic, tags that are associated with the attributes. The tag logic may include instructions to compare the attributes with predetermined attributes associated with the tags. The system may map the identified tags to the recipient identifier. The system may perform communication with a mobile device based on the robust recipient profile and a real-time location of the mobile device. To perform the communication, the system may monitor the plurality of data channels for data comprising real-time location information for the mobile device. The system may determine the mobile device is proximate to a physical object that is associated with the tag and the system may transmit offer information to the mobile device.
    Type: Application
    Filed: December 14, 2020
    Publication date: April 8, 2021
    Applicant: Accenture Global Services Limited
    Inventors: Christopher John Hawkins, Leeann Chau Tuyet Dang, David Tong Nguyen, Hyon S. Chu, Serena Tsiao-Yi Cheng, Bryan Michael Walker, Ziqiu Li
  • Patent number: 10968447
    Abstract: High-fidelity, high-throughput nucleic acid sequencing enables healthcare practitioners and patients to gain insight into genetic variants and potential health risks. However, previous methods of nucleic acid sequencing often introduces sequencing errors (for example, mutations that arise during the preparation of a nucleic acid library, during amplification, or sequencing). Provided herein are methods and compositions for sequencing nucleic acids. Further provided are methods of identifying an error in a nucleic acid sequence.
    Type: Grant
    Filed: January 17, 2018
    Date of Patent: April 6, 2021
    Assignee: MYRIAD WOMEN'S HEALTH, INC.
    Inventors: Henry H. Lai, Clement S. Chu
  • Patent number: 10930543
    Abstract: In one embodiment, a susceptor for thermal processing is provided. The susceptor includes an outer rim surrounding and coupled to an inner dish, the outer rim having an inner edge and an outer edge. The susceptor further includes one or more structures for reducing a contacting surface area between a substrate and the susceptor when the substrate is supported by the susceptor. At least one of the one or more structures is coupled to the inner dish proximate the inner edge of the outer rim.
    Type: Grant
    Filed: August 23, 2018
    Date of Patent: February 23, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Anhthu Ngo, Zuoming Zhu, Balasubramanian Ramachandran, Paul Brillhart, Edric Tong, Anzhong Chang, Kin Pong Lo, Kartik Shah, Schubert S. Chu, Zhepeng Cong, James Francis Mack, Nyi O. Myo, Kevin Joseph Bautista, Xuebin Li, Yi-Chiau Huang, Zhiyuan Ye
  • Publication number: 20210024992
    Abstract: High-fidelity, high-throughput nucleic acid sequencing enables healthcare practitioners and patients to gain insight into genetic variants and potential health risks. However, previous methods of nucleic acid sequencing often introduce sequencing errors (for example, mutations that arise during the preparation of a nucleic acid library, during amplification, or sequencing). Provided herein are methods and compositions for sequencing nucleic acids. Further provided are methods of identifying an error in a nucleic acid sequence.
    Type: Application
    Filed: July 14, 2020
    Publication date: January 28, 2021
    Inventors: Clement S. Chu, Noah C. Welker, Henry H. Lai
  • Publication number: 20210028075
    Abstract: A method for processing a substrate within a processing chamber comprises receiving a first radiation signal corresponding to a film on a target element disposed within the processing chamber, analyzing the first radiation signal, and controlling the processing of the substrate based on the analyzed first radiation signal. The processing chamber includes a substrate support configured to support the substrate within a processing volume and a controller coupled to a first sensing device configured to receive the first radiation signal.
    Type: Application
    Filed: July 24, 2020
    Publication date: January 28, 2021
    Inventors: Zuoming ZHU, Shu-Kwan LAU, Ala MORADIAN, Enle CHOO, Flora Fong-Song CHANG, Vilen K. NESTOROV, Zhiyuan YE, Bindusagar MARATH SANKARATHODI, Maxim D. SHAPOSHNIKOV, Surendra Singh SRIVASTAVA, Zhepeng CONG, Patricia M. LIU, Errol C. SANCHEZ, Jenny C. LIN, Schubert S. CHU, Balakrishnam R. JAMPANA
  • Patent number: 10867311
    Abstract: A computer system may access an attributization rule and convert, based on the attributization rule, profile data into attributes for a robust recipient profile. The system may identify, based on tag logic, tags that are associated with the attributes. The tag logic may include instructions to compare the attributes with predetermined attributes associated with the tags. The system may map the identified tags to the recipient identifier. The system may perform communication with a mobile device based on the robust recipient profile and a real-time location of the mobile device. To perform the communication, the system may monitor the plurality of data channels for data comprising real-time location information for the mobile device. The system may determine the mobile device is proximate to a physical object that is associated with the tag and the system may transmit offer information to the mobile device.
    Type: Grant
    Filed: January 8, 2019
    Date of Patent: December 15, 2020
    Assignee: Accenture Global Services Limited
    Inventors: Christopher John Hawkins, Leeann Chau Tuyet Dang, David Tong Nguyen, Hyon S. Chu, Serena Tsiao-Yi Cheng, Bryan Michael Walker, Ziqiu Li
  • Patent number: 10770319
    Abstract: Embodiments described herein provide processing chambers that include an enclosure for a processing volume, a rotatable support within the enclosure, the support having a shaft that extends outside the enclosure, wherein the shaft has a signal feature located outside the processing volume, an energy module within the enclosure, wherein the shaft extends through the energy module, one or more directed energy sources coupled to the enclosure, and one or more signalers positioned proximate to the signal feature, each signaler coupled to at least one of the directed energy sources.
    Type: Grant
    Filed: February 12, 2019
    Date of Patent: September 8, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Shu-Kwan Danny Lau, Zhiyuan Ye, Zuoming Zhu, Nyi O. Myo, Errol Antonio C. Sanchez, Schubert S. Chu
  • Patent number: 10752946
    Abstract: High-fidelity, high-throughput nucleic acid sequencing enables healthcare practitioners and patients to gain insight into genetic variants and potential health risks. However, previous methods of nucleic acid sequencing often introduce sequencing errors (for example, mutations that arise during the preparation of a nucleic acid library, during amplification, or sequencing). Provided herein are methods and compositions for sequencing nucleic acids. Further provided are methods of identifying an error in a nucleic acid sequence.
    Type: Grant
    Filed: January 17, 2018
    Date of Patent: August 25, 2020
    Assignee: MYRIAD WOMEN'S HEALTH, INC.
    Inventors: Clement S. Chu, Noah C. Welker, Henry H. Lai
  • Publication number: 20200255824
    Abstract: Methods and compositions are provided for preparing DNA libraries. Enzymes, adaptors, and sample nucleic acids are provided in a single reaction mixture to facilitate library preparation.
    Type: Application
    Filed: April 27, 2020
    Publication date: August 13, 2020
    Inventors: Henry H. Lai, Clement S. Chu
  • Patent number: 10731272
    Abstract: Methods and apparatus for deposition processes are provided herein. In some embodiments, an apparatus may include a substrate support including a susceptor plate having a pocket disposed in an upper surface of the susceptor plate and having a lip formed in the upper surface and circumscribing the pocket, the lip configured to support a substrate on the lip; and a plurality of vents extending from the pocket to the upper surface of the susceptor plate to exhaust gases trapped between the backside of the substrate and the pocket when a substrate is disposed on the lip. Methods of utilizing the inventive apparatus for depositing a layer on a substrate are also disclosed.
    Type: Grant
    Filed: February 22, 2019
    Date of Patent: August 4, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Nyi O. Myo, Kevin Bautista, Zhiyuan Ye, Schubert S. Chu, Yihwan Kim
  • Publication number: 20200105575
    Abstract: Embodiments described herein generally provide improved silicon-on-insulator (SOI) substrates for RF integrated circuits and methods for fabricating the same. In one embodiment, a method for forming a multilayer structure is provided. The method includes forming an intrinsic silicon layer on a handle substrate in a process chamber, wherein the handle substrate has a first resistivity and the intrinsic silicon layer having a second resistivity higher than the first resistivity, forming a charge trapping layer on the intrinsic silicon layer in the process chamber, bonding the handle substrate to an active substrate comprising a device layer and an insulating layer, wherein the insulating layer of the active substrate is in physical contact with the charge trapping layer, and removing at least a portion of the handle substrate.
    Type: Application
    Filed: September 23, 2019
    Publication date: April 2, 2020
    Inventors: Schubert S. CHU, Masato ISHII
  • Publication number: 20200091010
    Abstract: The systems and methods discussed herein are for a cluster tool that can be used for MOSFET device fabrication, including NMOS and PMOS devices. The cluster tool includes process chambers for pre-cleaning, metal-silicide or metal-germanide film formation, and surface protection operations such as capping and nitridation. The cluster tool can include one or more process chambers configured to form a source and a drain. The devices fabricated in the cluster tool are fabricated to have at least one protective layer formed over the metal-silicide or metal-germanide film to protect the film from contamination during handling and transfer to separate systems.
    Type: Application
    Filed: September 3, 2019
    Publication date: March 19, 2020
    Inventors: Xuebin LI, Schubert S. CHU, Errol Antonio C. SANCHEZ, Patricia M. LIU, Gaurav THAREJA, Raymond HUNG
  • Publication number: 20200082908
    Abstract: Described are methods for selecting an amount of a critical parameter (such as an amount of a sequencing library, amount of a capture probe library, or a number of amplification cycles) for direct targeted sequencing.
    Type: Application
    Filed: August 30, 2019
    Publication date: March 12, 2020
    Inventors: Henry Lai, Clement S. Chu
  • Publication number: 20200035525
    Abstract: Implementations of the present disclosure generally relate to methods and apparatuses for epitaxial deposition on substrate surfaces. More particularly, implementations of the present disclosure generally relate to an integrated system for processing N-type metal-oxide semiconductor (NMOS) devices. In one implementation, a cluster tool for processing a substrate is provided. The cluster tool includes a pre-clean chamber, an etch chamber, one or more pass through chambers, one or more outgassing chambers, a first transfer chamber, a second transfer chamber, and one or more process chambers. The pre-clean chamber and the etch chamber are coupled to a first transfer chamber. The one or more pass through chambers are coupled to and disposed between the first transfer chamber and the second transfer chamber. The one or more outgassing chambers are coupled to the second transfer chamber. The one or more process chambers are coupled to the second transfer chamber.
    Type: Application
    Filed: October 2, 2019
    Publication date: January 30, 2020
    Inventors: Xinyu BAO, Hua CHUNG, Schubert S. CHU
  • Patent number: 10519547
    Abstract: Embodiments of the present disclosure generally relate to a susceptor for thermal processing of semiconductor substrates. In one embodiment, the susceptor includes a first rim, an inner region coupled to and surrounded by the first rim, and one or more annular protrusions formed on the inner region. The one or more annular protrusions may be formed on the inner region at a location corresponding to the location where a valley is formed on the substrate, and the one or more annular protrusions help reduce or eliminate the formation of the valley.
    Type: Grant
    Filed: January 19, 2016
    Date of Patent: December 31, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Karthik Ramanathan, Kartik Shah, Nyi O. Myo, Schubert S. Chu, Jeffrey Tobin, Errol Antonio C. Sanchez, Palamurali Gajendra