Patents by Inventor Aaron A. Fernandes

Aaron A. Fernandes has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11186502
    Abstract: Described are methods and devices for the treatment of fecal matter. A column reactor is used to smolder fecal matter to produce and a volatile components stream and smoldered media. The volatile components stream may be subject to catalysis to reduce the emission of noxious substances and/or generate heat energy. Also described is the use of a turntable for removing smoldered media from the column reactor.
    Type: Grant
    Filed: July 17, 2017
    Date of Patent: November 30, 2021
    Assignee: The Governing Council of the University of Toronto
    Inventors: Yu-Ling Cheng, Shadi Saberi, Aaron Fernandes
  • Patent number: 9852160
    Abstract: A data computation rate is calculated for use by components in a computational data system. The data computation rate defines the frequency at which a computation, or other types of processing, is performed on or using certain data, such as a data value in a database. The data computation rate might be calculated based upon a current or historical data consumption rate that defines the frequency at which a consumer requests or has requested data, a data update rate that defines the current or historical frequency at which the data that is utilized to generate the processed data is or has been modified, a consumer-specified tolerance, and/or other information. The computed data consumption rate might then be utilized to specify the frequency at which the data should be processed by components in the computational data system.
    Type: Grant
    Filed: May 30, 2013
    Date of Patent: December 26, 2017
    Assignee: Amazon Technologies, Inc.
    Inventors: Harsha Ramalingam, Aaron Fernandes
  • Patent number: 6013156
    Abstract: Apparatus for monitoring the hydrogen peroxide concentration in a sulfuric acid bath used to remove photoresist from semiconductor wafers uses the amount of bubbles in the fluid mixture to signal the addition of hydrogen peroxide. The bubbles are directly related to the hydrogen peroxide in sulfuric acid mixture. The bubbles are sensed by a light source and photoelectric sensor connected to a threshold adjustment control which controls a metering solenoid valve to add hydrogen peroxide from a reservoir to the bath when the bubbles decrease.
    Type: Grant
    Filed: March 3, 1998
    Date of Patent: January 11, 2000
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Allison Holbrook, Jiahua Huang, Aaron A. Fernandes