Patents by Inventor Aaron Bowser

Aaron Bowser has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Transmission balancing for phase shift mask with a trim mask
    Patent number: 9482965
    Abstract: Implementations described and claimed herein include photolithography technology to alleviate the imbalance of transmission intensity induced. In one implementation, a method comprises exposing an alternating phase shift mask (Alt-PSM) and a trim mask, wherein an exposure placement of the trim mask is shifted relative to an exposure placement of the Alt-PSM.
    Type: Grant
    Filed: May 2, 2016
    Date of Patent: November 1, 2016
    Assignee: SEAGATE TECHNOLOGY LLC
    Inventors: Dan Yu, Aaron Bowser, Yi Liu
  • TRANSMISSION BALANCING FOR PHASE SHIFT MASK WITH A TRIM MASK
    Publication number: 20160246183
    Abstract: Implementations described and claimed herein include photolithography technology to alleviate the imbalance of transmission intensity induced. In one implementation, a method comprises exposing an alternating phase shift mask (Alt-PSM) and a trim mask, wherein an exposure placement of the trim mask is shifted relative to an exposure placement of the Alt-PSM.
    Type: Application
    Filed: May 2, 2016
    Publication date: August 25, 2016
    Inventors: Dan Yu, Aaron Bowser, Yi Liu
  • Transmission balancing for phase shift mask with a trim mask
    Patent number: 9341939
    Abstract: Implementations described and claimed herein include photolithography technology to alleviate the imbalance of transmission intensity induced. In one implementation, a method comprises exposing an alternating phase shift mask (Alt-PSM) and a trim mask, wherein an exposure placement of the trim mask is shifted relative to an exposure placement of the Alt-PSM.
    Type: Grant
    Filed: October 30, 2014
    Date of Patent: May 17, 2016
    Assignee: SEAGATE TECHNOLOGY LLC
    Inventors: Dan Yu, Aaron Bowser, Yi Liu
  • TRANSMISSION BALANCING FOR PHASE SHIFT MASK WITH A TRIM MASK
    Publication number: 20160124299
    Abstract: Implementations described and claimed herein include photolithography technology to alleviate the imbalance of transmission intensity induced. In one implementation, a method comprises exposing an alternating phase shift mask (Alt-PSM) and a trim mask, wherein an exposure placement of the trim mask is shifted relative to an exposure placement of the Alt-PSM.
    Type: Application
    Filed: October 30, 2014
    Publication date: May 5, 2016
    Inventors: Dan Yu, Aaron Bowser, Yi Liu