Patents by Inventor Aaron Geurdon Chin

Aaron Geurdon Chin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods and systems for detecting defects on a reticle
    Patent number: 8041106
    Abstract: Methods and systems for detecting defects on a reticle are provided. One method includes printing a single die reticle in first areas of a wafer using different values of a parameter of a lithography process and at least one second area using a nominal value of the parameter. The method also includes acquiring first images of the first areas and second image(s) of the at least one second area. In addition, the method includes separately comparing the first images acquired for different first areas to at least one of the second image(s). The method further includes detecting defects on the reticle based on first portions of the first images in which variations in the first images compared to the at least one second image are greater than second portions of the first images and the first portions that are common to two or more of the first images.
    Type: Grant
    Filed: December 5, 2008
    Date of Patent: October 18, 2011
    Assignee: KLA-Tencor Corp.
    Inventors: Patrick Tung-Sing Pak, Wee-Teck Chia, Aaron Geurdon Chin, Irfan Malik, Brian Duffy
  • METHODS AND SYSTEMS FOR DETECTING DEFECTS ON A RETICLE
    Publication number: 20100142800
    Abstract: Methods and systems for detecting defects on a reticle are provided. One method includes printing a single die reticle in first areas of a wafer using different values of a parameter of a lithography process and at least one second area using a nominal value of the parameter. The method also includes acquiring first images of the first areas and second image(s) of the at least one second area. In addition, the method includes separately comparing the first images acquired for different first areas to at least one of the second image(s). The method further includes detecting defects on the reticle based on first portions of the first images in which variations in the first images compared to the at least one second image are greater than second portions of the first images and the first portions that are common to two or more of the first images.
    Type: Application
    Filed: December 5, 2008
    Publication date: June 10, 2010
    Applicant: KLA-TENCOR CORPORATION
    Inventors: Patrick Tung-Sing Pak, Wee-Teck Chia, Aaron Geurdon Chin, Irfan Malik, Brian Duffy