Abstract: Apparatus for directing and focusing X-rays by the new method of confinement is disclosed. A capillary having an inlet end and an outlet end with a generally tubular or rectangular inner wall surface defines a longitudinal central opening. The central opening is tapered inwardly from the inlet end to the outlet end. X-rays are directed into the inlet end at angles less than the critical glancing angle for the inner wall surface to direct X-rays through the capillary to a focus point near the capillary outlet end.

Abstract: An aperture probe in the form of a tapered metal-coated glass pipette having a thin tip provides near-field access to a sample for near-field microscopy. The pipette is formed from a glass tube drawn down to a fine tip, and then coated, as by evaporation, by a metallic layer. The central opening of the tube is drawn down to a submicron diameter, and the metal coating is formed with an aperture at that opening. Aperture diameters down to 500 Angstroms diameter are provided. Also disclosed is a microscope utilizing the pipette aperture for scanning near-field imaging of samples.

Abstract: A method and device for creating patterns on a wide variety of substrates. The dimensions are variable in a wide range, from sub-microscopic and upwards. The device can also be used for microsurgery type manipulations in genetic engineering: a variety of substances can be introduced into biological cells. The production of patterns is based on the guidance of the radiation, electron beam etc. via a tube having a small-diameter tapered end which is metal-coated, and which can be brought to very close proximity of the substrate.

Abstract: An optical system for determining and reproducing spatial separation of features in the range of 80.ANG. to 2500.ANG. for optical microscopy and lithography using visible light, the system being independent of the wavelength of the incident light. An aperture mask is provided having at least one aperture of between about 80.ANG. and 2500.ANG. diameter. The mask may be used in optical microscopy to view objects with a high degree of resolution by placing the mask within the near field of light emanating from a sample to be viewed. The mask may also be used for high resolution optical lithography by placing a resist material within the near field of light passing through the mask.

Abstract: An optical system for determining and reproducing spatial separation of features in the range of 80 .ANG. to 2500 .ANG. for optical microscopy and lithography using visible light, the system being independent of the wavelength of the incident light.An aperture mask is provided having at least one aperture of between about 80 .ANG. and 2500 .ANG. diameter. The mask may be used in optical microscopy to view objects with a high degree of resolution by placing the mask within the near field of light emanating from a sample to be viewed. The mask may also be used for high resolution optical lithography by placing a resist material within the near field of light passing through the mask.