Patents by Inventor Aaron Louis LaBrie
Aaron Louis LaBrie has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240312827Abstract: Some examples provide a vacuum wafer chuck assembly for supporting a wafer. An example chuck assembly comprises a chuck hub and a centering hub disposed within the chuck hub. Chuck arms are mounted to the chuck hub, with each chuck arm extending radially between a proximal end adjacent the chuck hub, and a distal end remote therefrom. At least one vacuum pad is provided for supporting the wafer during a wafer centering or wafer processing operation. A vacuum sensor detects a presence or absence of a vacuum pressure at the vacuum pad during the wafer centering or processing operation, a detection indicative of a presence or absence of the wafer in the chuck assembly, or a presence of a defective wafer.Type: ApplicationFiled: May 22, 2024Publication date: September 19, 2024Inventors: Aaron Louis LaBrie, Claudiu Valentin Puha
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Patent number: 12027409Abstract: Some examples provide a vacuum wafer chuck assembly for supporting a wafer. An example chuck assembly comprises a chuck hub and a centering hub disposed within the chuck hub. Chuck arms are mounted to the chuck hub, with each chuck arm extending radially between a proximal end adjacent the chuck hub, and a distal end remote therefrom. At least one vacuum pad is provided for supporting the wafer during a wafer centering or wafer processing operation. A vacuum sensor detects a presence or absence of a vacuum pressure at the vacuum pad during the wafer centering or processing operation, a detection indicative of a presence or absence of the wafer in the chuck assembly, or a presence of a defective wafer.Type: GrantFiled: March 1, 2021Date of Patent: July 2, 2024Assignee: Lam Research CorporationInventors: Aaron Louis LaBrie, Claudiu Valentin Puha
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Patent number: 11508609Abstract: Some examples provide a vacuum wafer chuck assembly for supporting a wafer. An example chuck assembly comprises a chuck hub and a centering hub disposed within the chuck hub. Chuck arms are mounted to the chuck hub, with each chuck arm extending radially between a proximal end adjacent the chuck hub, and a distal end remote therefrom. A plurality of centering cams is provided, each cam mounted at or towards a distal end of a chuck arm and being movable radially inwardly or outwardly relative to the centering hub to engage or release an edge of a supported wafer in response to a rotational movement of the centering hub. At least one vacuum pad is provided for supporting the wafer during a wafer centering or wafer processing operation.Type: GrantFiled: September 11, 2020Date of Patent: November 22, 2022Assignee: Lam Research CorporationInventors: Aaron Louis LaBrie, Claudiu Valentin Puha
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Publication number: 20210183684Abstract: Some examples provide a vacuum wafer chuck assembly for supporting a wafer. An example chuck assembly comprises a chuck hub and a centering hub disposed within the chuck hub. Chuck arms are mounted to the chuck hub, with each chuck arm extending radially between a proximal end adjacent the chuck hub, and a distal end remote therefrom. At least one vacuum pad is provided for supporting the wafer during a wafer centering or wafer processing operation. A vacuum sensor detects a presence or absence of a vacuum pressure at the vacuum pad during the wafer centering or processing operation, a detection indicative of a presence or absence of the wafer in the chuck assembly, or a presence of a defective wafer.Type: ApplicationFiled: March 1, 2021Publication date: June 17, 2021Inventors: Aaron Louis LaBrie, Claudiu Valentin Puha
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Patent number: 10971388Abstract: A chuck useful for supporting a wafer during an edge bevel removal (EBR) process comprises a rotatable center hub having a plurality of support arms extending outwardly from the rotatable center hub, support pins on ends of the support arms, gas passages extending through upper surfaces of the support pins, and gas conduits in the support arms. The gas conduits supply gas to the gas passages or apply a vacuum to the gas passages. The support arms can include alignment cams which are rotatable from an outer non-alignment position away from a periphery of the wafer to an inner alignment position at which the wafer is centered. During centering, the wafer is floated on a gas cushion which reduces wear of the support pins.Type: GrantFiled: July 11, 2019Date of Patent: April 6, 2021Assignee: Lam Research CorporationInventors: Aaron Louis LaBrie, Robert Lynden Braendle, Cian Owen Sweeney
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Publication number: 20200411358Abstract: Some examples provide a vacuum wafer chuck assembly for supporting a wafer. An example chuck assembly comprises a chuck hub and a centering hub disposed within the chuck hub. Chuck arms are mounted to the chuck hub, with each chuck arm extending radially between a proximal end adjacent the chuck hub, and a distal end remote therefrom. A plurality of centering cams is provided, each cam mounted at or towards a distal end of a chuck arm and being movable radially inwardly or outwardly relative to the centering hub to engage or release an edge of a supported wafer in response to a rotational movement of the centering hub. At least one vacuum pad is provided for supporting the wafer during a wafer centering or wafer processing operation.Type: ApplicationFiled: September 11, 2020Publication date: December 31, 2020Inventors: Aaron Louis LaBrie, Claudiu Valentin Puha
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Patent number: 10811299Abstract: The present disclosure generally relates to chuck technology for supporting semiconductor wafers during processing. In one example, a wafer chuck assembly comprises a chuck hub and a centering hub disposed within the chuck hub. An engagement device is operable between an engaged position and a disengaged position respectively to engage the chuck hub with the centering hub to prevent relative movement therebetween in at least a first direction, or to allow relative movement therebetween. A chuck motor is provided for selectively rotating the chuck hub and/or the centering hub during a wafer processing operation and a wafer centering operation based on an engaged or disengaged position of the engagement device. A plurality of chuck arms is mounted to the chuck hub, each chuck arm extending radially between a proximal end adjacent the chuck hub, and a distal end remote therefrom.Type: GrantFiled: December 10, 2018Date of Patent: October 20, 2020Assignee: Lam Research CorporationInventors: Aaron Louis LaBrie, Claudiu Valentin Puha, Robert Marshall Stowell
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Publication number: 20190341290Abstract: The present disclosure generally relates to chuck technology for supporting semiconductor wafers during processing. In one example, a wafer chuck assembly comprises a chuck hub and a centering hub disposed within the chuck hub. An engagement device is operable between an engaged position and a disengaged position respectively to engage the chuck hub with the centering hub to prevent relative movement therebetween in at least a first direction, or to allow relative movement therebetween. A chuck motor is provided for selectively rotating the chuck hub and/or the centering hub during a wafer processing operation and a wafer centering operation based on an engaged or disengaged position of the engagement device. A plurality of chuck arms is mounted to the chuck hub, each chuck arm extending radially between a proximal end adjacent the chuck hub, and a distal end remote therefrom.Type: ApplicationFiled: December 10, 2018Publication date: November 7, 2019Inventors: Aaron Louis LaBrie, Claudiu Valentin Puha, Robert Marshall Stowell
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Publication number: 20190341291Abstract: A chuck useful for supporting a wafer during an edge bevel removal (EBR) process comprises a rotatable center hub having a plurality of support arms extending outwardly from the rotatable center hub, support pins on ends of the support arms, gas passages extending through upper surfaces of the support pins, and gas conduits in the support arms, the gas conduits configured to supply gas to the gas passages or apply a vacuum to the gas passages. The support arms can include alignment cams which are rotatable from an outer non-alignment position away from a periphery of the wafer to an inner alignment position at which the wafer is centered. To supply gas or apply a vacuum force to the gas outlets in the support pins, the rotatable center hub can have a gas inlet and a plurality of gas delivery ports in fluid communication with the gas delivery conduits in the support arms.Type: ApplicationFiled: July 11, 2019Publication date: November 7, 2019Inventors: Aaron Louis LaBrie, Robert Lynden Braendle, Cian Owen Sweeney
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Patent number: 10373858Abstract: A chuck useful for supporting a wafer during an edge bevel removal (EBR) process comprises a rotatable center hub having a plurality of support arms extending outwardly from the rotatable center hub, support pins on ends of the support arms, gas passages extending through upper surfaces of the support pins, and gas conduits in the support arms. The gas conduits supply gas to the gas passages or apply a vacuum to the gas passages. The support arms can include alignment cams which are rotatable from an outer non-alignment position away from a periphery of the wafer to an inner alignment position at which the wafer is centered. During centering, the wafer is floated on a gas cushion which reduces wear of the support pins.Type: GrantFiled: April 6, 2016Date of Patent: August 6, 2019Assignee: LAM RESEARCH CORPORATIONInventors: Aaron Louis LaBrie, Robert Lynden Braendle, Cian Owen Sweeney
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Publication number: 20170294332Abstract: A chuck useful for supporting a wafer during an edge bevel removal (EBR) process comprises a rotatable center hub having a plurality of support arms extending outwardly from the rotatable center hub, support pins on ends of the support arms, gas passages extending through upper surfaces of the support pins, and gas conduits in the support arms, the gas conduits configured to supply gas to the gas passages or apply a vacuum to the gas passages. The support arms can include alignment cams which are rotatable from an outer non-alignment position away from a periphery of the wafer to an inner alignment position at which the wafer is centered. To supply gas or apply a vacuum force to the gas outlets in the support pins, the rotatable center hub can have a gas inlet and a plurality of gas delivery ports in fluid communication with the gas delivery conduits in the support arms.Type: ApplicationFiled: April 6, 2016Publication date: October 12, 2017Inventors: Aaron Louis LaBrie, Robert Lynden Braendle, Cian Owen Sweeney