Patents by Inventor Aaron Mao

Aaron Mao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PHOTOVOLTAIC DEVICES AND METHOD OF MANUFACTURING
    Publication number: 20240088319
    Abstract: A photovoltaic device includes a substrate structure and at least one Se-containing layer, such as a CdSeTe layer. A process for manufacturing the photovoltaic device includes forming the CdSeTe layer over a substrate by at least one of sputtering, evaporation deposition, CVD, chemical bath deposition process, and vapor transport deposition process. The process can also include controlling a thickness range of the Se-containing layer.
    Type: Application
    Filed: November 13, 2023
    Publication date: March 14, 2024
    Applicant: First Solar, Inc.
    Inventors: Dan Damjanovic, Markus Gloeckler, Feng Liao, Andrei Los, Dan Mao, Benjamin Milliron, Gopal Mor, Rick Powell, Kenneth Ring, Aaron Roggelin, Jigish Trivedi, Zhibo Zhao
  • Method for abatement of gaseous pollutants
    Patent number: 6511641
    Abstract: An apparatus and method are provided for treating pollutants in a gaseous stream. The apparatus comprises tubular inlets for mixing a gas stream with other oxidative and inert gases for mixture within a reaction chamber. The reaction chamber is heated by heating elements and has orifices through which cool or heated air enters into the central reaction chamber. A process is also provided whereby additional gases are added to the gaseous stream preferably within the temperature range of 650 C-950 C which minimizes or alleviates the production of NOx.
    Type: Grant
    Filed: June 27, 2001
    Date of Patent: January 28, 2003
    Assignee: Advanced Technology Materials, Inc.
    Inventors: Timothy L. Herman, Jack Ellis, Floris Y. Tsang, Daniel O. Clark, Belynda G. Flippo, David Inori, Keith Kaarup, Mark Morgenlaender, Aaron Mao
  • Advanced apparatus and method for abatement of gaseous pollutants
    Publication number: 20010055555
    Abstract: An apparatus and method are provided for treating pollutants in a gaseous stream. The apparatus comprises tubular inlets for mixing a gas stream with other oxidative and inert gases for mixture within a reaction chamber. The reaction chamber is heated by heating elements and has orifices through which cool or heated air enters into the central reaction chamber. A process is also provided whereby additional gases are added to the gaseous stream preferably within the temperature range of 650 C.-950 C. which minimizes or alleviates the production of NOx.
    Type: Application
    Filed: June 27, 2001
    Publication date: December 27, 2001
    Applicant: Advanced Technology Materials, Inc.
    Inventors: Timothy L. Herman, Jack Ellis, Floris Y. Tsang, Daniel O. Clark, Belynda G. Flippo, David Inori, Keith Kaarup, Mark Morgenlaender, Aaron Mao
  • Advanced apparatus for abatement of gaseous pollutants
    Patent number: 6261524
    Abstract: An apparatus and method are provided for treating pollutants in a gaseous stream. The apparatus comprises tubular inlets for mixing a gas stream with other oxidative and inert gases for mixture within a reaction chamber. The reaction chamber is heated by heating elements and has orifices through which cool or heated air enters into the central reaction chamber. A process is also provided whereby additional gases are added to the gaseous stream preferably within the temperature range of 650 C.-950° C. which minimizes or alleviates the production of NOx.
    Type: Grant
    Filed: April 20, 1999
    Date of Patent: July 17, 2001
    Assignee: Advanced Technology Materials, Inc.
    Inventors: Timothy L. Herman, Jack Ellis, Floris Y. Tsang, Daniel O. Clark, Belynda Flippo, David Inori, Keith Kaarup, Mark Morgenlaender, Aaron Mao