Abstract: A RF generator includes a first RF power source configured to output a first RF output signal to a first electrode of a load. The RF generator includes a first sensor for detecting a first parameter of the first RF output signal and determining a first characteristic of a plasma in the load. A second RF power source outputs a second RF output signal to a second electrode. A second sensor detects a second parameter of the second RF output signal and determines a second characteristic of a plasma in the load. A RF power controller receives the first characteristic and the second characteristic and generates a first control signal and a second control signal. The first control signal adjusts the first RF output signal, and the second control signal adjusts the second RF output signal.

Abstract: A controller for a plasma generation system includes a model evaluation module receives a sensed value that varies in accordance with a state of a plasma controlled by a RF power generator. The model evaluation module generates a plasma parameter that varies in accordance with the sensed value. A model integration module receives the plasma parameter, integrates the plasma parameter, and outputs an integrated model parameter. An IEDF evaluation module receives the integrated model parameter and generates an ion energy distribution function (IEDF) in accordance with the integrated model parameter. An IEDF controller module receives the IEDF and generates a signal for controlling a RF generator. A RF generator control module receives the signal and generates an RF generator control signal to control at least one of power, frequency, or phase of the RF power generator.

Abstract: A power generator includes a power source and a control module coupled to the power source. The control module is configured to generate at least one control signal to vary a respective at least one of an output signal from the power source or an impedance between the power source and a load. The output signal includes a signal modulated by a pulse signal, and the control module is further configured to adjust the at least one control signal to vary at least one of an amplitude or a frequency of the output signal or the impedance between the power source and the load to control a shape of the pulse signal. The at least one of the amplitude, the frequency, or the impedance is adjusted in accordance with respective feedforward adjustments that vary in accordance with a respective sensed pulse parameter detected between a matching network and the load.

Abstract: A radio frequency (RF) generator includes a RF power source configured to output an RF power signal, and a controller coupled to the RF power source. The controller is configured to generate a pulse to modulate the RF power signal of the RF power source. The pulse includes one or more state transitions. The controller is further configured to receive a sync signal indicative of one or more operating characteristics or parameters of another RF generator, and adjust at least one of the state transitions of the pulse to synchronize the state transition with a defined phase of the received sync signal. Other example RF generators, RF power delivery systems including one or more RF generators, and control methods for adjusting a state transition of a pulse to synchronize the state transition with a defined phase of a sync signal are also disclosed.

Abstract: A switched capacitor modulator (SCM) includes a RF power amplifier. The RF power amplifier receives a rectified voltage and a RF drive signal and modulates an input signal in accordance with the rectified voltage to generate a RF output signal to an output terminal. A reactance in parallel with the output terminal is configured to vary in response to a control signal to vary an equivalent reactance in parallel with the output terminal. A controller generates the control signal and a commanded phase. The commanded phase controls the RF drive signal. The reactance is at least one of a capacitance or an inductance, and the capacitance or the inductance varies in accordance with the control signal.

Abstract: A radio frequency (RF) power generation system includes a RF power source that generates a RF output signal delivered to a load. A RF power controller is configured to generate a control signal to vary the RF output signal. The controller adjusts a parameter associated with the RF output signal, and the parameter is controlled in accordance with a trigger signal. The parameter is adjusted in accordance with a cost function, and the cost function is determined by intruding a perturbation into an actuator that affects the cost function. The actuator may control an external RF output signal, and the trigger signal may vary in accordance with the external RF output signal.

Abstract: A power supply system includes a RF generator, a matching network, and a control module. The matching network includes at least one mechanically variable impedance element and at least one electrically variable impedance element. The control module is coupled to the matching network and configured to generate one or more signals to adjust at least one of an impedance of the mechanically variable impedance element or an impedance of the electrically variable impedance element to vary an impedance match between the generator and a load. In other examples, a hybrid variable impedance module includes at least one mechanically variable impedance element, at least one electrically variable impedance element, and a control module. The control module is configured to generate one or more signals to adjust at least one of an impedance of the mechanically variable impedance element or an impedance of the electrically variable impedance element.

Abstract: A plasma generator system for reducing the effects of impedance mismatch. The system has a variable frequency source having an output for emitting an RF signal. A plasma chamber has an input for receiving the RF signal. The variable frequency source modulates at least one of the frequency and phase of the RF signal to improve the system tolerance of impedance mismatches between the output of the variable frequency source and the input of the plasma chamber.

Abstract: A radio frequency (RF) system includes a control module that allocates M predetermined frequency intervals. The system also includes N RF sources that each applies first RF power to electrodes within a plasma chamber at frequencies within an assigned respective one of the M predetermined frequency intervals. The N RF sources also each respond to second RF power including feedback from the plasma chamber. The N RF sources each include a processing module that adjusts the first RF power based on the second RF power and the respective one of the M predetermined frequency intervals. M and N are integers greater than 1.

Abstract: A radio frequency (RF) system includes a control module that allocates M predetermined frequency intervals. The system also includes N RF sources that each applies first RF power to electrodes within a plasma chamber at frequencies within an assigned respective one of the M predetermined frequency intervals. The N RF sources also each respond to second RF power including feedback from the plasma chamber. The N RF sources each include a processing module that adjusts the first RF power based on the second RF power and the respective one of the M predetermined frequency intervals. M and N are integers greater than 1.

Abstract: A plasma generator system for reducing the effects of impedance mismatch. The system has a variable frequency source having an output for emitting an RF signal. A plasma chamber has an input for receiving the RF signal. The variable frequency source modulates at least one of the frequency and phase of the RF signal to improve the system tolerance of impedance mismatches between the output of the variable frequency source and the input of the plasma chamber.

Abstract: A scalable radio frequency (RF) generator system including at least one power supply, at least one power amplifier receiving input from the power supply, and a power supply control module, and a system controller. Output from the at least one power supply can be combined and applied to each of the power amplifiers. Output form each of the at least one power amplifiers can be combined to generate a single RF signal. A compensator module controls operation of the at least one power supply. The compensator module, system control module, and power supply controller communicate in a daisy chain configuration.

Abstract: A high efficiency stable RF power amplifier with frequency tuning capability is disclosed. The present invention includes a novel circuit configuration which allows the drain or collector terminal of the power transistor to be at ground potential eliminating the need for an electrical insulator between the transistor and the heatsink. In an alternative embodiment, the source or emitter terminal of the power transistor is allowed to be at ground potential. In either case, the amplifier is operated in a switched mode to provide high efficiency amplification at a predetermined frequency band. Additionally, despite the switched mode operation, the amplifier is stable because properly controlled impedances are provided for baseband, sub-harmonic and harmonic frequencies.

Abstract: A high efficiency stable RF power amplifier with frequency tuning capability is disclosed. The present invention includes a novel circuit configuration which allows the drain or collector terminal of the power transistor to be at ground potential eliminating the need for an electrical insulator between the transistor and the heatsink. In an alternative embodiment, the source or emitter terminal of the power transistor is allowed to be at ground potential. In either case, the amplifier is operated in a switched mode to provide high efficiency amplification at a predetermined frequency band. Additionally, despite the switched mode operation, the amplifier is stable because properly controlled impedances are provided for baseband, sub-harmonic and harmonic frequencies.