Patents by Inventor Aaron W. Baum

Aaron W. Baum has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6005247
    Abstract: An electron beam microscope includes an electron beam pattern source, a vacuum enclosure, electron optics, a detector and a processor. The electron beam pattern source generates a sequence of electron beam patterns for illuminating a set of pixels on a specimen. The electron optics directs the sequence of electron beam patterns to the specimen. The detector detects a result of an interaction between each of the electron beam patterns and the specimen and produces a sequence of detector signals. The processor, in response to the sequence of detector signals, generates an image including a pixel value representative of each of the illuminated of pixels on the specimen. The electron beam microscope preferably includes a deflector for deflecting each of the electron beam patterns relative to the specimen.
    Type: Grant
    Filed: October 1, 1997
    Date of Patent: December 21, 1999
    Assignee: Intevac, Inc.
    Inventor: Aaron W. Baum
  • Patent number: 5932966
    Abstract: An electron source includes a negative electron affinity photocathode on a light-transmissive substrate and a light beam generator for directing a light beam through the substrate at the photocathode for exciting electrons into the conduction band. The photocathode has at least one active area for emission of electrons with dimensions of less than about two micrometers. The electron source further includes electron optics for forming the electrons into an electron beam and a vacuum enclosure for maintaining the photocathode at high vacuum. The photocathode is patterned to define emission areas. A patterned mask may be located on the emission surface of the active layer, may be buried within the active layer or may be located between the active layer and the substrate.
    Type: Grant
    Filed: December 9, 1997
    Date of Patent: August 3, 1999
    Assignees: Intevac, Inc., Board of Trustees of the Leland Stanford Jr. University
    Inventors: James E. Schneider, Kenneth A. Costello, Mark A. McCord, R. Fabian Pease, Aaron W. Baum
  • Patent number: 5898269
    Abstract: An electron beam source includes a cathode having an electron emission surface including an active area for emission of electrons and a cathode shield assembly including a conductive shield disposed in proximity to the electron emission surface of the cathode. The shield has an opening aligned with the active area. The electron beam source further includes a device for stimulating emission of electrons from the active area of the cathode, electron optics for forming the electrons into an electron beam and a vacuum enclosure for maintaining the cathode at high vacuum. The cathode may be a negative electron affinity photocathode formed on a light-transmissive substrate. The shield protects non-emitting areas of the emission surface from contamination and inhibits cathode materials from contaminating components of the electron beam source. The cathode may be moved relative to the opening in the shield so as to align an new active area with the opening.
    Type: Grant
    Filed: May 27, 1997
    Date of Patent: April 27, 1999
    Assignee: The Board of Trustees of the Leland Stanford Jr. University
    Inventors: Aaron W. Baum, James Edward Schneider, Jr.