Patents by Inventor Aaron Webb
Aaron Webb has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11927364Abstract: An air handling unit (AHU) for a heating, ventilation, air conditioning, and refrigeration (HVACR) system includes a housing and a combustion heater disposed within the housing. The housing includes a combustion section with a first channel and a second channel. The combustion heater includes heat exchanger tubes and a tube support that supports heat exchanger tubes within the combustion section. The tube support slidably disposed in the first channel and the second channel. The combustion heater configured to be slidably removable from the AHU. An AHU for an HVACR system includes a housing with a fan section and a fan assembly disposed within the housing. The fan assembly including a pair of grooves slidably disposed on a pair of rails of the housing. The fan assembly configured to be both slidably removable from the AHU and liftably removable from the AHU.Type: GrantFiled: December 31, 2020Date of Patent: March 12, 2024Assignee: TRANE INTERNATIONAL INC.Inventors: Christopher Daniel, Jason William Parks, Gregory L. Meeuwsen, Nathan Wagers, Chasity Webb, Anthony Chiles, Gregory Edmund Beltran, Aaron Allison Stevens, Stephen Kowalski, Jason Harpst
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Patent number: 11306824Abstract: The present disclosure generally relates to an isolation device for use in processing systems. The isolation device has a body with an inlet opening disposed at a first end coupled to a processing system component such as a remote plasma source and outlet openings, for example two, disposed at a second end which are coupled to a processing system component such as a process chamber. Flaps disposed within the body are actuatable to an open position from a closed position or to a closed position from an open position, to selectively allow or prevent passage of a fluid from the processing system component coupled to the isolation device to the other processing system component coupled thereto.Type: GrantFiled: September 28, 2018Date of Patent: April 19, 2022Assignee: Applied Materials, Inc.Inventors: Benjamin B. Riordon, Charles T. Carlson, Aaron Webb, Gary Wyka
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Patent number: 10969029Abstract: Embodiments of the disclosure generally relate to a flapper valve. The flapper valve may be used with processing chambers, such as semiconductor substrate processing chambers. In one embodiment, a flapper valve includes a housing having a first opening at a first end thereof and a second opening at a second end thereof, a first flapper pivotably disposed in the housing, and a second flapper pivotably disposed in the housing. The first and second flappers are movable to selectively open and close at least one of the first opening and the second opening.Type: GrantFiled: December 1, 2017Date of Patent: April 6, 2021Assignee: Applied Materials, Inc.Inventors: Charles T. Carlson, Tammy Jo Pride, Benjamin B. Riordon, Aaron Webb
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Patent number: 10854483Abstract: Apparatuses for annealing semiconductor substrates, such as a batch processing chamber, are provided herein. The batch processing chamber includes a chamber body enclosing an internal volume, a cassette moveably disposed within the internal volume and a plug coupled to a bottom wall of the cassette. The chamber body has a hole through a bottom wall of the chamber body and is interfaced with one or more heaters operable to maintain the chamber body at a temperature of greater than 290° C. The cassette is configured to be raised to load a plurality of substrates thereon and lowered to seal the internal volume. The plug is configured to move up and down within the internal volume. The plug includes a downward-facing seal configured to engage with a top surface of the bottom wall of the chamber body and close the hole through the bottom wall of the chamber body.Type: GrantFiled: October 11, 2018Date of Patent: December 1, 2020Assignee: APPLIED MATERIALS, INC.Inventors: Jason M. Schaller, Robert Brent Vopat, Charles T. Carlson, Jeffrey Charles Blahnik, Timothy J. Franklin, David Blahnik, Aaron Webb
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Publication number: 20200217423Abstract: The present disclosure generally relates to an isolation device for use in processing systems. The isolation device has a body with an inlet opening disposed at a first end coupled to a processing system component such as a remote plasma source and outlet openings, for example two, disposed at a second end which are coupled to a processing system component such as a process chamber. Flaps disposed within the body are actuatable to an open position from a closed position or to a closed position from an open position, to selectively allow or prevent passage of a fluid from the processing system component coupled to the isolation device to the other processing system component coupled thereto.Type: ApplicationFiled: September 28, 2018Publication date: July 9, 2020Inventors: Benjamin B. RIORDON, Charles T. CARLSON, Aaron WEBB, Gary WYKA
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Patent number: 10674910Abstract: A computer-implemented patient monitoring system includes a patient data monitoring system on a first computing system, including a patient medical data query engine configured to generate one or more rule execution requests. The monitoring system further includes a network circuit communicating with the medical database system and one or more remote patient care computing devices. The remote care computing devices in turn include a patient medical data repository and a query response engine configured to respond to received rule execution requests. Responding to rule execution requests includes verifying the validity of a rule execution request, identifying data in the patient medical data repository responsive to the rule execution request, and transmitting response patient medical data responsive to the rule execution request.Type: GrantFiled: September 1, 2017Date of Patent: June 9, 2020Assignee: Epic Systems CorporationInventors: Stirling Martin, Aaron Webb
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Publication number: 20190293199Abstract: Embodiments of the disclosure generally relate to a flapper valve. The flapper valve may be used with processing chambers, such as semiconductor substrate processing chambers. In one embodiment, a flapper valve includes a housing having a first opening at a first end thereof and a second opening at a second end thereof, a first flapper pivotably disposed in the housing, and a second flapper pivotably disposed in the housing. The first and second flappers are movable to selectively open and close at least one of the first opening and the second opening.Type: ApplicationFiled: December 1, 2017Publication date: September 26, 2019Inventors: Charles T. CARLSON, Tammy Jo PRIDE, Benjamin B. RIORDON, Aaron WEBB
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Publication number: 20190148186Abstract: Apparatuses for annealing semiconductor substrates, such as a batch processing chamber, are provided herein. The batch processing chamber includes a chamber body enclosing an internal volume, a cassette moveably disposed within the internal volume and a plug coupled to a bottom wall of the cassette. The chamber body has a hole through a bottom wall of the chamber body and is interfaced with one or more heaters operable to maintain the chamber body at a temperature of greater than 290° C. The cassette is configured to be raised to load a plurality of substrates thereon and lowered to seal the internal volume. The plug is configured to move up and down within the internal volume. The plug includes a downward-facing seal configured to engage with a top surface of the bottom wall of the chamber body and close the hole through the bottom wall of the chamber body.Type: ApplicationFiled: October 11, 2018Publication date: May 16, 2019Inventors: Jason M. SCHALLER, Robert Brent VOPAT, Charles T. CARLSON, Jeffrey Charles BLAHNIK, Timothy J. FRANKLIN, David BLAHNIK, Aaron WEBB
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Patent number: 9995631Abstract: An improved system for measuring the temperature of a plurality of workpieces in a rotating semiconductor processing device is disclosed. Because silicon has variable emissivity in the infrared band, a temperature stable, high emissivity coating is applied to a portion of the workpiece, allowing the temperature of the workpiece to be measured by observing the temperature of the coating. Further, by limiting the amount of coating applied to the workpiece, the effect of the coating on the intrinsic temperature of the workpiece and the surrounding semiconductor processing device may be minimized. The temperature of the workpieces is measured as the workpieces pass under an aperture by capturing a thermal image of a portion of the workpiece. In certain embodiments, a controller is used to process the plurality of thermal images into a single thermal image showing all of the workpieces disposed within the semiconductor processing device.Type: GrantFiled: August 17, 2016Date of Patent: June 12, 2018Assignee: Varian Semiconductor Equipment Associates, Inc.Inventors: Paul E. Pergande, Gary E. Wyka, Aaron Webb
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Publication number: 20170356807Abstract: An improved system for measuring the temperature of a plurality of workpieces in a rotating semiconductor processing device is disclosed. Because silicon has variable emissivity in the infrared band, a temperature stable, high emissivity coating is applied to a portion of the workpiece, allowing the temperature of the workpiece to be measured by observing the temperature of the coating. Further, by limiting the amount of coating applied to the workpiece, the effect of the coating on the intrinsic temperature of the workpiece and the surrounding semiconductor processing device may be minimized. The temperature of the workpieces is measured as the workpieces pass under an aperture by capturing a thermal image of a portion of the workpiece. In certain embodiments, a controller is used to process the plurality of thermal images into a single thermal image showing all of the workpieces disposed within the semiconductor processing device.Type: ApplicationFiled: August 17, 2016Publication date: December 14, 2017Inventors: Paul E. Pergande, Gary E. Wyka, Aaron Webb
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Patent number: 9750408Abstract: A computer-implemented patient monitoring system includes a patient data monitoring system on a first computing system, including a patient medical data query engine configured to generate one or more rule execution requests. The monitoring system further includes a network circuit communicating with the medical database system and one or more remote patient care computing devices. The remote care computing devices in turn include a patient medical data repository and a query response engine configured to respond to received rule execution requests. Responding to rule execution requests includes verifying the validity of a rule execution request, identifying data in the patient medical data repository responsive to the rule execution request, and transmitting response patient medical data responsive to the rule execution request.Type: GrantFiled: August 29, 2012Date of Patent: September 5, 2017Assignee: Epic Systems CorporationInventors: Stirling Martin, Aaron Webb
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Patent number: 9091491Abstract: A cooling plate includes a channel to transmit a fluid, wherein the channel is disposed within a base and the channel has a first portion and a second portion. The first portion is disposed substantially along a peripheral edge of the base, and the second portion is coupled to the first portion and is disposed further away from the peripheral edge of the base than the first portion. The second portion has a length that is at least about 35% as long as the length of the first portion. The cooling plate also includes a lid disposed over the base and the channel, wherein the lid provides support for a substrate.Type: GrantFiled: October 6, 2008Date of Patent: July 28, 2015Assignee: Applied Materials, Inc.Inventors: Helder Lee, Miriam Schwartz, Michael Kuchar, Aaron Webb, Theodoss Costuros
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Publication number: 20140225007Abstract: A system for loading workpieces into a process chamber for processing in a matrix configuration includes a conveyor configured to transport multiple workpieces in a linear fashion. A workpiece hotel is configured to receive the multiple workpieces from the conveyor. The workpiece hotel comprises a matrix of cells arranged in N columns and M floors. A pick blade is configured to insert into the hotel and retract from the hotel in order to unload a plurality of substrates from a first floor into a single row of the pick blade, and to repeat the unloading operation to form a matrix comprising a plurality of rows of substrates disposed on the pick blade. In one example, the workpiece hotel has a staggered configuration that provides individual accessibility of each hotel cell.Type: ApplicationFiled: April 15, 2014Publication date: August 14, 2014Inventors: William T. Weaver, Jamie A. Carrera, Robert B. Vopat, Aaron Webb, Charles T. Carlson
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Patent number: 8698104Abstract: A system for loading workpieces into a process chamber for processing in a matrix configuration includes a conveyor configured to transport multiple workpieces in a linear fashion. A workpiece hotel is configured to receive the multiple workpieces from the conveyor. The workpiece hotel comprises a matrix of cells arranged in N columns and M floors. A pick blade is configured to insert into the hotel and retract from the hotel in order to unload a plurality of substrates from a first floor into a single row of the pick blade, and to repeat the unloading operation to form a matrix comprising a plurality of rows of substrates disposed on the pick blade. In one example, the workpiece hotel has a staggered configuration that provides individual accessibility of each hotel cell.Type: GrantFiled: November 8, 2010Date of Patent: April 15, 2014Assignee: Varian Semiconductor Equipment Associates, Inc.Inventors: William T. Weaver, Jaime A. Carrera, Robert B. Vopat, Aaron Webb, Charles T. Carlson
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Publication number: 20130108406Abstract: A system and method for receiving unprocessed workpieces, moving them, orienting them and placing them in a load lock, or other end point is disclosed. The system includes a gantry module for moving workpieces from a conveyor system to a swap module. The swap module is used to remove a carrier or matrix of processed workpieces from a load lock and place a carrier of matrix of unprocessed workpieces in its place. The processed workpieces are then moved by the gantry module back to the conveyor. The gantry module may have X, Y, Z and rotational actuators and include an end effector having multiple grippers. A method of aligning a plurality of workpieces on the end effector so that the plurality can be transported at the same time is also disclosed.Type: ApplicationFiled: May 14, 2012Publication date: May 2, 2013Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.Inventors: Jason Schaller, Robert Vopat, Charles T. Carlson, Malcolm N. Daniel, JR., Aaron Webb, William T. Weaver
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Publication number: 20120210937Abstract: Aspects of the invention include a method and apparatus for processing a substrate using a multi-chamber processing system (e.g., a cluster tool) adapted to process substrates in one or more batch and/or single substrate processing chambers to increase the system throughput.Type: ApplicationFiled: April 27, 2012Publication date: August 23, 2012Applicant: Applied Materials, Inc.Inventors: RANDHIR THAKUR, STEVE G. GHANAYEM, JOSEPH YUDOVSKY, AARON WEBB, ADAM ALEXANDER BRAILOVE, NIR MERRY, VINAY K. SHAH, ANDREAS G. HEGEDUS
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Publication number: 20110108742Abstract: A system for loading workpieces into a process chamber for processing in a matrix configuration includes a conveyor configured to transport multiple workpieces in a linear fashion. A workpiece hotel is configured to receive the multiple workpieces from the conveyor. The workpiece hotel comprises a matrix of cells arranged in N columns and M floors. A pick blade is configured to insert into the hotel and retract from the hotel in order to unload a plurality of substrates from a first floor into a single row of the pick blade, and to repeat the unloading operation to form a matrix comprising a plurality of rows of substrates disposed on the pick blade. In one example, the workpiece hotel has a staggered configuration that provides individual accessibility of each hotel cell.Type: ApplicationFiled: November 8, 2010Publication date: May 12, 2011Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.Inventors: William T. Weaver, Jaime A. Carrera, Robert B. Vopat, Aaron Webb, Charles T. Carlson
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Publication number: 20110041764Abstract: A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.Type: ApplicationFiled: November 3, 2010Publication date: February 24, 2011Inventors: Aaron Webb, Adam Brailove, Joseph Yudovsky, Nir Merry, Andrew Constant, Efrain Quiles, Michael R. Rice, Gary J. Rosen, Vinay K. Shah
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Patent number: 7833351Abstract: A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.Type: GrantFiled: June 26, 2006Date of Patent: November 16, 2010Assignee: Applied Materials, Inc.Inventors: Aaron Webb, Adam Brailove, Joseph Yudovsky, Nir Merry, Andrew Constant, Efrain Quiles, Michael R. Rice, Gary J. Rosen, Vinay K. Shah
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Publication number: 20100173495Abstract: Aspects of the invention include a method and apparatus for processing a substrate using a multi-chamber processing system (e.g., a cluster tool) adapted to process substrates in one or more batch and/or single substrate processing chambers to increase the system throughput. In one embodiment, a system is configured to perform a substrate processing sequence that contains batch processing chambers only, or batch and single substrate processing chambers, to optimize throughput and minimize processing defects due to exposure to a contaminating environment. In one embodiment, a batch processing chamber is used to increase the system throughput by performing a process recipe step that is disproportionately long compared to other process recipe steps in the substrate processing sequence that are performed on the cluster tool. In another embodiment, two or more batch chambers are used to process multiple substrates using one or more of the disproportionately long processing steps in a processing sequence.Type: ApplicationFiled: March 16, 2010Publication date: July 8, 2010Inventors: Randhir Thakur, Steve G. Ghanayem, Joseph Yudovsky, Aaron Webb, Adam Alexander Brailove, Nir Merry, Vinay K. Shah, Andreas G. Hegedus