Abstract: Systems and methods for operating a power grid-based system. The methods comprising: determining, by the processor, a spectral correlation function for a power grid signal being monitored; applying, by the processor, a trained classification model to the spectral correlation function, the trained classification model comprising a machine learning model trained to classify power grid signals based on power grid signal distortions; assigning, by the processor, a power grid distortion classification to the power grid signal based on an output of the trained classification model; and controlling operation(s) of an electrical device of the power grid-based system based on the power grid distribution classification.

Abstract: The present disclosure relates to CRISPR-related systems and components for targeting, editing, and/or modulating expression of a CD70 (Cluster of Differentiation 70) gene. The present disclosure also relates to methods and applications thereof in connection with engineered cells including T cells or T cell precursors.

Abstract: Systems and methods for testing, evaluating, and scoring IT products (e.g., software) and product updates from a technology provider are disclosed herein. More specifically, organizational assessment may be performed to evaluate the provider's development lifecycle processes and generate organization maturity scores. Architecture assessment may be performed to evaluate the system-level and software-level architectures associated with the application and generate architecture maturity scores. Product verification may be performed via automated testing and penetration testing to generate verification maturity scores. The organization maturity scores, architecture maturity scores, and verification maturity scores may be used to provide recommendations to the provider and also combined into an overall maturity score, which may serve as a comprehensive summary of the evaluation. These generated scores inform and expedite testing of future iterations of the product.

Abstract: Systems and methods for testing, evaluating, and scoring IT products (e.g., software) and product updates from a technology provider are disclosed herein. More specifically, organizational assessment may be performed to evaluate the provider's development lifecycle processes and generate organization maturity scores. Architecture assessment may be performed to evaluate the system-level and software-level architectures associated with the application and generate architecture maturity scores. Product verification may be performed via automated testing and penetration testing to generate verification maturity scores. The organization maturity scores, architecture maturity scores, and verification maturity scores may be used to provide recommendations to the provider and also combined into an overall maturity score, which may serve as a comprehensive summary of the evaluation. These generated scores inform and expedite testing of future iterations of the product.

Abstract: The present invention relates to a method of protecting a metal surface from damage or removal during an alkaline de-metallization process, comprising printing a water-based resist composition onto a metal-coated filmic substrate, thereby protecting the metal surface from damage or removal during the de-metallization process, wherein the water-based resist composition comprises a cationic acid-soluble resin or cationic acid-stabilized resin and water.

Abstract: Systems and methods for testing, evaluating, and scoring IT products (e.g., software) and product updates from a technology provider are disclosed herein. More specifically, organizational assessment may be performed to evaluate the provider's development lifecycle processes and generate organization maturity scores. Architecture assessment may be performed to evaluate the system-level and software-level architectures associated with the application and generate architecture maturity scores. Product verification may be performed via automated testing and penetration testing to generate verification maturity scores. The organization maturity scores, architecture maturity scores, and verification maturity scores may be used to provide recommendations to the provider and also combined into an overall maturity score, which may serve as a comprehensive summary of the evaluation. These generated scores inform and expedite testing of future iterations of the product.

Abstract: There is provided an electrically-powered material-transport vehicle having a vehicle-charging contact on one side of the vehicle, and a second vehicle-charging contact on the opposite side of the vehicle. The vehicle has a load-bearing cap that covers the top of the vehicle, and a cap elevator for raising and lowering the cap. The cap can be raised and lowered to a transit position, a payload-engagement position, a charging position, and a maintenance position. In the transit position and payload-engagement position, the cap covers the vehicle-charging contacts so that they are not exposed. In the charging position, the cap is raised so that the vehicle-charging contacts are exposed. The vehicle can enter a charging-dock with the cap in the charging position in order to recharge the vehicle's battery.

Abstract: The present invention relates to a vector(s) containing and expressing an optimized HIV EnvF gene, methods for making the same and cell substrates qualified for vaccine production which may comprise vector(s) containing optimized HIV genes.

Abstract: There is provided an electrically-powered material-transport vehicle having a vehicle-charging contact on one side of the vehicle, and a second vehicle-charging contact on the opposite side of the vehicle. The vehicle has a load-bearing cap that covers the top of the vehicle, and a cap elevator for raising and lowering the cap. The cap can be raised and lowered to a transit position, a payload-engagement position, a charging position, and a maintenance position. In the transit position and payload-engagement position, the cap covers the vehicle-charging contacts so that they are not exposed. In the charging position, the cap is raised so that the vehicle-charging contacts are exposed. The vehicle can enter a charging-dock with the cap in the charging position in order to recharge the vehicle's battery.

Abstract: The present invention relates to a vector(s) containing and expressing an optimized HIV EnvF gene, methods for making the same and cell substrates qualified for vaccine production which may comprise vector(s) containing optimized HIV genes.

Abstract: The present invention relates to a vector(s) containing and expressing an optimized HIV EnvF gene, methods for making the same and cell substrates qualified for vaccine production which may comprise vector(s) containing optimized HIV genes.

Abstract: The present invention relates to a vector(s) containing and expressing an optimized HIV EnvF gene, methods for making the same and cell substrates qualified for vaccine production which may comprise vector(s) containing optimized HIV genes.

Abstract: In the manufacture of integrated circuits, reactive compositions that include a reactive etchant species and an oxygen-containing species can provide selective removal of target material and can reduce contamination of gas delivery lines.

Abstract: An efficient and economical dressage training device and method that teaches dressage riders proper hip and elbow flexion and extension instinctively establishing muscle memory patterns in the rider.

Abstract: In the manufacture of integrated circuits, reactive compositions that include a reactive etchant species and an oxygen-containing species can provide selective removal of target material and can reduce contamination of gas delivery lines.

Abstract: Apparatus, systems and methods for plasma etching substrates are provided. The invention achieves dissipation of charge build-up on a substrate being plasma etched to avoid notching or twisting in high aspect ratio contents and similar features. Charge build-up on a substrate being etched by plasma etching can be dissipated by a method for etching a substrate, the method comprising: providing a plasma processing chamber comprising a chamber enclosure and a substrate support adapted to support a substrate within the chamber enclosure; supporting a substrate on the substrate support; forming a plasma within the chamber enclosure such that a surface of the substrate is in contact with the plasma; etching the substrate by generating a negative bias on the substrate surface relative to the plasma; and intermittently changing the bias on the substrate surface to positive relative to the plasma. The present method can be readily integrated into known plasma processing systems.

Abstract: A process for etching a insulating layer to produce an opening having an aspect ratio of at least 15:1 by supplying a first gaseous etchant having at least fifty (50) percent He to a plasma etch reactor, and exposing the insulating layer to a plasma of the first gaseous etchant. Use of the first gaseous etchant reduces the occurrence of twisting in openings in insulating layers having an aspect ratio of at least 15:1.

Abstract: An etching method includes applying a photoresist over a substrate, forming an opening in the photoresist, and etching the substrate under the opening using a plasma generated with a gas composition containing argon and an amount of higher atomic mass inert gas. The amount may be effective to increase photoresist stability compared to otherwise identical etching lacking any of the higher atomic mass inert gas. The photoresist may have a composition sensitized to an actinic energy wavelength of 248 nm or less. A method of increasing the stability of 248 nm or less photoresist during RIE includes providing a means for reducing electron temperature of a plasma and etching a substrate exposed through photoresist openings without substantially destabilizing the photoresist.

Abstract: The invention includes methods of etching features into substrates. A plurality of hard mask layers is formed over material of a substrate to be etched. A feature pattern is formed in such layers. A feature is etched only partially into the substrate material using the hard mask layers with the feature pattern therein as a mask. After the partial etching, at least one of the hard mask layers is etched selectively relative to the substrate material and remaining of the hard mask layers. After etching at least one of the hard mask layers, the feature is further etched into the substrate material using at least an innermost of the hard mask layers as a mask. After the further etching, the innermost hard mask layer and any hard mask layers remaining thereover are removed from the substrate, and at least a portion of the feature is incorporated into an integrated circuit.

Abstract: The invention features a novel gene encoding methionine synthase reductase. The invention also features a method for detecting an increased likelihood of hyperhomocysteinemia and, in turn, an increased or decreased likelihood of neural tube defects, cardiovascular disease, Down's Syndrome or cancer. The invention also features therapeutic methods for treating and/or reducing the risk of cardiovascular disease, Down's Syndrome, cancer, or neural tube defects. Also provided are the sequences of the human methionine synthase reductase gene and protein and compounds and kits for performing the methods of the invention.