Patents by Inventor Abdourahmane Ange Sarr

Abdourahmane Ange Sarr has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9240306
    Abstract: The invention relates to a device for spot size measurement at wafer level in a multi charged particle beam lithography system. The device comprises a knife edge structure on top of a scintillating material, such a YAG material. The knife edge structure is arranged in a Si wafer which has a top plane at a sharp angle to a (1 1 0) plane of the Si. In an embodiment the angle is in the range from 2 to 4 degrees, preferably in the range from 2.9-3.1 degrees. The invention relates in addition to a method for manufacturing a device for spot size measurement at wafer level in a multi charged particle beam lithography system.
    Type: Grant
    Filed: December 5, 2012
    Date of Patent: January 19, 2016
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Jan Andries Meijer, Paul IJmert Scheffers, Abdourahmane Ange Sarr