Abstract: A light absorption film. The light absorption film is a titanium-aluminum-nitride film, including a bottom layer and an outer layer; the bottom layer has a nano-layered structure, the outer layer has a columnar crystal structure, and the top of the columnar crystal structure is a conical surface; within a light wavelength range of 200 nm to 2500 nm, the light absorption film has an average light absorption rate (?) of not less than 0.89. After adding an antireflection layer of TiAlON, TiO2 or SiO2 to the outer layer of the light absorption film, the average light absorption rate (?) is not less than 0.95 within the light wavelength range of 200 nm to 2500 nm. The light absorption film has advantages of such as a wide frequency range for light absorption, a high absorption rate, and stable physical and chemical properties of the film in adverse environments.

Abstract: A modular frame assembly for a wafer fabrication system comprising at least one base casting and at least one upstanding pod door opening casting. The at least one base casting and at least one upstanding pod door opening casting are self registering and allow frames for wafer fabrication systems of any normally desired configuration to be produced out of a small number of cast modules. More specifically, in a preferred embodiment, frames configured to mate with one to four commercially available loaders may be readily assembled out of the aluminum castings.

Abstract: A modular frame assembly for a wafer fabrication system comprising at least one base casting and at least one upstanding pod door opening casting. The at least one base casting and at least one upstanding pod door opening casting are self registering and allow frames for wafer fabrication systems of any normally desired configuration to be produced out or a small number of cast modules. More specifically, in a preferred embodiment, frames configured to mate with one to four commercially available loaders may be readily assembled out of the aluminum castings.

Abstract: An automatic debris removal system for use in combination with a pre-existing construction hoist of the type including a plurality of telescoping extension members. Such a hoist includes a carriage device which traverses the extended hoist by means of a cable/winch mechanism that is an integral component of the hoist. The present debris removal system includes a tilting dumpster or bucket which is mechanically coupled to the carriage device and is transportable from ground level to the roof under construction for carrying debris and other materials. The present system includes a detachable chute device which is attached at the base of hoist to receive debris from the dumpster which is conducted by gravity to a dump truck for disposal. The present system also includes an automatic release mechanism for dumping the contents of the bucket as it contacts the chute at the lowermost position of its travel.

Abstract: Disclosed is a spinning chemical applicator for spin coating a work piece. The spinning chemical applicator includes a bowl having a base region and substantially curved walls. A chuck base having a chuck plate for holding the work piece, the chuck base and the chuck plate contained within an inner region of the bowl. A bowl covering lid being mounted on a top surface of the substantially curved walls. A plurality of upper venting holes being defined in the substantially curved walls, the plurality of upper venting holes defining a venting path to the inner region of the bowl. And plurality of venting drain holes defined in the substantially curved walls at an edge location that is substantially below each of the plurality of upper venting holes. The plurality of venting drain holes providing a venting and drain path for the inner region of the bowl.