Patents by Inventor Abe Eftekhari

Abe Eftekhari has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of determining shear stress employing a monomer-polymer laminate structure
    Patent number: 5270781
    Abstract: The laminate structure comprises a liquid crystal polymer substrate attached to a test surface of an article. A light absorbing coating is applied to the substrate and is thin enough to permit bonding steric interaction between the liquid crystal polymer substrate and an overlying liquid crystal monomer thin film. Light is directed through and reflected by the liquid crystal monomer thin film and unreflected light is absorbed by the underlying coating. The wavelength of the reflected light is indicative of the shear stress experienced by the test surface.
    Type: Grant
    Filed: February 8, 1993
    Date of Patent: December 14, 1993
    Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
    Inventors: Jag J. Singh, Abe Eftekhari, Devendra S. Parmar
  • Shear sensitive monomer-polymer laminate structure and method of using same
    Patent number: 5223310
    Abstract: The laminate structure comprises a liquid crystal polymer substrate attached to a test surface of an article. A light absorbing coating is applied to the substrate and is thin enough to permit bonding steric interaction between the liquid crystal polymer substrate and an overlying liquid crystal monomer thin film. Light is directed through and reflected by the liquid crystal monomer thin film and unreflected light is absorbed by the underlying coating. The wavelength of the reflected light is indicative of the shear stress experienced by the test surface.
    Type: Grant
    Filed: March 2, 1992
    Date of Patent: June 29, 1993
    Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
    Inventors: Jag J. Singh, Abe Eftekhari, Devendra S. Parmar
  • Slow positron beam generator for lifetime studies
    Patent number: 5015851
    Abstract: A slow positron beam generator uses a conductive source residing between two test films. Moderator pieces are placed next to the test films on the opposite side of the conductive source. A voltage potential is applied between the moderator pieces and the conductive source. Incident energetic positrons are, first, emitted from the conductive source, second, passed through test film, and then, third, isotropically strike moderator pieces before diffusing out of the moderator pieces as slow positrons. The slow positrons diffusing out of moderator pieces are attracted to the conductive source which is held at an appropriate potential below the moderator pieces. The slow positrons have to pass through the test films before reaching the conductive source. A voltage is adjusted so that the potential difference between the moderator pieces and the conductive source forces the positrons to stop in the test films.
    Type: Grant
    Filed: May 31, 1990
    Date of Patent: May 14, 1991
    Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
    Inventors: Jag J. Singh, Abe Eftekhari, Terry L. St. Clair