Patents by Inventor Abe Sho

Abe Sho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Negative resist composition, method of forming resist pattern and polymeric compound
    Patent number: 8771921
    Abstract: A negative resist composition including an alkali-soluble resin component (A), an acid generator component (B) that generates acid upon exposure, and a cross-linking component (C), the alkali-soluble resin component (A) including a polymeric compound (F) having a structural unit (f1) containing a base dissociable group and a structural unit (f2) containing a cross-linking group-containing group.
    Type: Grant
    Filed: March 2, 2012
    Date of Patent: July 8, 2014
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Abe Sho, Shiono Daiju, Hirano Tomoyuki, Dazai Takahiro
  • NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND
    Publication number: 20120164581
    Abstract: A negative resist composition including an alkali-soluble resin component (A), an acid generator component (B) that generates acid upon exposure, and a cross-linking component (C), the alkali-soluble resin component (A) including a polymeric compound (F) having a structural unit (f1) containing a base dissociable group and a structural unit (f2) containing a cross-linking group-containing group.
    Type: Application
    Filed: March 2, 2012
    Publication date: June 28, 2012
    Inventors: Abe Sho, Shiono Daiju, Hirano Tomoyuki, Dazai Takahiro
  • Negative resist composition for immersion exposure and method of forming resist pattern
    Publication number: 20090274976
    Abstract: A negative resist composition for immersion exposure including a fluorine-containing polymeric compound (F) containing a structural unit having a base dissociable group, an alkali-soluble resin component (A) excluding the fluorine-containing polymeric compound (F), an acid generator component (B) that generates acid upon exposure, and a cross-linking component (C); and a method of forming a resist pattern including applying the negative resist composition for immersion exposure to a substrate to form a resist film, subjecting the resist film to immersion exposure, and subjecting the resist film to alkali developing to form a resist pattern.
    Type: Application
    Filed: April 30, 2009
    Publication date: November 5, 2009
    Inventor: Abe Sho