Patents by Inventor Abhaya K. Datye

Abhaya K. Datye has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11275089
    Abstract: A method of making free-standing ALD-coated plasmonic nanoparticles. The method comprises providing a plurality of semiconductor quantum dots. One or more conformal layers of dielectric material are deposited over the quantum dots to form dielectric-coated quantum dots. A conformal metallic nanoshell is deposited over the dielectric-coated quantum dots to form plasmonic nanoparticles. At least one layer chosen from i) the conformal layers of dielectric material and ii) the conformal metallic nanoshell is deposited using a vapor phase atomic layer deposition (ALD) process. Plasmonic nanoparticles and systems employing the nanoparticles are also disclosed.
    Type: Grant
    Filed: November 1, 2017
    Date of Patent: March 15, 2022
    Inventors: Ravinder Jain, Abhaya K. Datye, Ying-Bing Jiang
  • Publication number: 20190128894
    Abstract: A method of making free-standing ALD-coated plasmonic nanoparticles. The method comprises providing a plurality of semiconductor quantum dots. One or more conformal layers of dielectric material are deposited over the quantum dots to form dielectric-coated quantum dots. A conformal metallic nanoshell is deposted over the dielectric-coated quantum dots to form plasmonic nanoparticles. At least one layer chosen from i) the conformal layers of dielectric material and ii) the conformal metallic nanoshell is deposited using a vapor phase atomic layer deposition (ALD) process. Plasmonic nanoparticles and systems employing the nanoparticles are also disclosed.
    Type: Application
    Filed: November 1, 2017
    Publication date: May 2, 2019
    Inventors: Ravinder Jain, Abhaya K. Datye, Ying-Bing Jiang
  • Publication number: 20030207752
    Abstract: A method and composition of matter relating to mesoporous structures. The inventive method and inventive structures relate to, for example, attrition-resistant heterogeneous catalysts. A preferred embodiment makes use of a liquid-crystal template mechanism to create a silica structure where insoluble nanoparticles (generally submicron particles) are trapped inside. Such a structure provides controlled porosity for transport of reactants to and products from the catalytically active phase, respectively. Catalytically active structures of the present invention are useful for Fischer-Tropsch synthesis where the breakup and attrition of the catalytically active phase ordinarily hinders performance. The method of the present invention is generally applicable to other mesoporous materials and active phase combinations.
    Type: Application
    Filed: March 20, 2003
    Publication date: November 6, 2003
    Inventors: Hien N. Pham, Abhaya K. Datye
  • Patent number: 6548440
    Abstract: The present invention relates to catalysts in mesoporous structures. In a preferred embodiment, the invention comprises a method for encapsulating a dispersed insoluble compound in a mesoporous structure comprising combining a soluble oxide precursor, a solvent, and a surfactant to form a mixture; dispersing an insoluble compound in the mixture; spray-drying the mixture to produce dry powder; and calcining the powder to yield a porous structure comprising the dispersed insoluble compound.
    Type: Grant
    Filed: May 23, 2000
    Date of Patent: April 15, 2003
    Assignee: Science & Technology Corporation @ UNM
    Inventors: Hien N. Pham, Abhaya K. Datye