Patents by Inventor Abhiram Govindaraju

Abhiram Govindaraju has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Droplet generator steering system
    Patent number: 10426020
    Abstract: Steering system for a droplet generator in a EUV system. The steering system permits controlled positioning of a droplet release point of the droplet generator. A movable member holding the droplet generator is coupled to stationary elements of the EUV system through a coupling system having a first subsystem that constrains lateral translation of the movable member, and a second subsystem that controls a relative inclination of the movable member. The first and second subsystems preferably include one or a combination of flexures that permit highly precise and repeatable positioning.
    Type: Grant
    Filed: February 2, 2016
    Date of Patent: September 24, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Peter M. Baumgart, John Martin Algots, Abhiram Govindaraju, Chirag Rajyaguru
  • DROPLET GENERATOR STEERING SYSTEM
    Publication number: 20160150626
    Abstract: Steering system for a droplet generator in a EUV system. The steering system permits controlled positioning of a droplet release point of the droplet generator. A movable member holding the droplet generator is coupled to stationary elements of the EUV system through a coupling system having a first subsystem that constrains lateral translation of the movable member, and a second subsystem that controls a relative inclination of the movable member. The first and second subsystems preferably include one or a combination of flexures that permit highly precise and repeatable positioning.
    Type: Application
    Filed: February 2, 2016
    Publication date: May 26, 2016
    Inventors: Peter M. BAUMGART, J. Martin ALGOTS, Abhiram GOVINDARAJU, Chirag RAJYAGURU
  • Droplet generator steering system
    Patent number: 9279445
    Abstract: Steering system for a droplet generator in a EUV system. The steering system permits controlled positioning of a droplet release point of the droplet generator. A movable member holding the droplet generator is coupled to stationary elements of the EUV system through a coupling system having a first subsystem that constrains lateral translation of the movable member, and a second subsystem that controls a relative inclination of the movable member. The first and second subsystems preferably include one or a combination of flexures that permit highly precise and repeatable positioning.
    Type: Grant
    Filed: December 16, 2011
    Date of Patent: March 8, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Peter M. Baumgart, J. Martin Algots, Abhiram Govindaraju, Chirag Rajyaguru
  • DROPLET GENERATOR STEERING SYSTEM
    Publication number: 20130153792
    Abstract: Steering system for a droplet generator in a EUV system. The steering system permits controlled positioning of a droplet release point of the droplet generator. A movable member holding the droplet generator is coupled to stationary elements of the EUV system through a coupling system having a first subsystem that constrains lateral translation of the movable member, and a second subsystem that controls a relative inclination of the movable member. The first and second subsystems preferably include one or a combination of flexures that permit highly precise and repeatable positioning.
    Type: Application
    Filed: December 16, 2011
    Publication date: June 20, 2013
    Applicant: CYMER, INC
    Inventors: Peter M. Baumgart, J. Martin Algots, Abhiram Govindaraju, Chirag Rajyaguru
  • EUV light source glint reduction system
    Patent number: 8368039
    Abstract: An apparatus includes a light source having a gain medium for producing an amplified light beam of a source wavelength along a beam path to irradiate a target material in a chamber and to generate extreme ultraviolet light; and a subsystem overlying at least a portion of an internal surface of the chamber and configured to reduce a flow of light at the source wavelength from the internal surface back along the beam path.
    Type: Grant
    Filed: April 5, 2010
    Date of Patent: February 5, 2013
    Assignee: Cymer, Inc.
    Inventors: Abhiram Govindaraju, William N. Partlo
  • Extreme Ultraviolet Light Source
    Publication number: 20110240890
    Abstract: An apparatus includes a light source having a gain medium for producing an amplified light beam of a source wavelength along a beam path to irradiate a target material in a chamber and to generate extreme ultraviolet light; and a subsystem overlying at least a portion of an internal surface of the chamber and configured to reduce a flow of light at the source wavelength from the internal surface back along the beam path.
    Type: Application
    Filed: April 5, 2010
    Publication date: October 6, 2011
    Applicant: Cymer Inc.
    Inventors: Abhiram Govindaraju, William N. Partlo