Patents by Inventor Abhiram Lakshmi Ganesh Govindaraju

Abhiram Lakshmi Ganesh Govindaraju has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Target material control in an EUV light source
    Patent number: 11963285
    Abstract: Provided is an apparatus that includes a first reservoir system including a first fluid reservoir configured to be in fluid communication with a nozzle supply system during operation of the nozzle supply system, a second reservoir system including a second fluid reservoir configured to be, at least part of the time during operation of the nozzle supply system, in fluid communication with the first reservoir system, a priming system configured to produce a fluid target material from a solid matter, and a fluid control system fluidly connected to the priming system, the first reservoir system, the second reservoir system, and the nozzle supply system. The fluid control system is configured to, during operation of the nozzle supply system: isolate at least one fluid reservoir and the nozzle supply system from the priming system, and maintain a fluid flow path between at least one fluid reservoir and the nozzle supply system.
    Type: Grant
    Filed: March 9, 2020
    Date of Patent: April 16, 2024
    Assignee: ASML Netherlands B.V.
    Inventors: Abhiram Lakshmi Ganesh Govindaraju, David Bessems, Sandeep Rai, Petrus Adrianus Willems, Serkan Kincal, Joshua Mark Lukens, Jon David Tedrow
  • TARGET MATERIAL CONTROL IN AN EUV LIGHT SOURCE
    Publication number: 20220159817
    Abstract: Provided is an apparatus that includes a first reservoir system including a first fluid reservoir configured to be in fluid communication with a nozzle supply system during operation of the nozzle supply system, a second reservoir system including a second fluid reservoir configured to be, at least part of the time during operation of the nozzle supply system, in fluid communication with the first reservoir system, a priming system configured to produce a fluid target material from a solid matter, and a fluid control system fluidly connected to the priming system, the first reservoir system, the second reservoir system, and the nozzle supply system. The fluid control system is configured to, during operation of the nozzle supply system: isolate at least one fluid reservoir and the nozzle supply system from the priming system, and maintain a fluid flow path between at least one fluid reservoir and the nozzle supply system.
    Type: Application
    Filed: March 9, 2020
    Publication date: May 19, 2022
    Inventors: Abhiram Lakshmi Ganesh Govindaraju, David Bessems, Sandeep Rai, Petrus Adrianus Willems, Serkan Kincal, Joshua Mark Lukens, Jon David Tedrow