Abstract: Systems and methods of setting rules that automate the creation of a ticket related to incidents on a computer network. In some embodiments, incident management data structures are stored, each of the incident management data structures includes one or more defined incident identification characteristics and one or more automated ticket generation rules. A network incident data structure are received that describes a network incident on a network. A target incident management data structure are selected from the incident management data structures based on the defined automated incident identification characteristics of the target incident management data structure matching the network incident described by the network incident data structure. A ticket incident data structure is generated in accordance with the one or more automated ticket generation rules of the target incident management data structure.

Abstract: Systems and methods of setting rules that automate the creation of a ticket related to incidents on a computer network. In some embodiments, a graphical user interface (GUI) is presented, wherein the GUI includes one or more first graphical items for defining a network incident type on a network. One or more user selections of the one or more first graphical items are received. One or more automated incident identification characteristics of an incident management data structure are generated based on the user selections of the first graphical items. User input is received in the GUI that defines one or more automated ticket generation rules of the incident management data structure.

Abstract: Exemplary semiconductor processing methods may include providing one or more deposition precursors to a semiconductor processing chamber. A substrate may be disposed within a processing region of the semiconductor processing chamber. The methods may include depositing a silicon-containing material on the substrate and on one or more components of the semiconductor processing chamber. The methods may include providing a fluorine-containing precursor to the processing region. The fluorine-containing precursor may be plasma-free when provided to the processing region. The methods may include contacting the silicon-containing material on the one or more components of the semiconductor processing chamber with the fluorine-containing precursor. The methods may include removing at least a portion of the silicon-containing material on the one or more components of the semiconductor processing chamber with the fluorine-containing precursor.

Abstract: A method and apparatus for automatically manufacturing a custom fit garment is provided. The method comprises creating a pattern for the garment to be manufactured and determining at least a portion of the body of the customer to be scanned based on the created pattern and scanning at least the portion of body of the customer to determine sizing requirements for the garment to be manufactured. The method further comprises customizing the pattern for the garment to be manufactured based on the determined sizing requirement and automatically manufacturing the garment based on the customized pattern.

Abstract: A method and apparatus for automatically manufacturing a custom fit garment is provided. The method comprises creating a pattern for the garment to be manufactured and determining at least a portion of the body of the customer to be scanned based on the created pattern and scanning at least the portion of body of the customer to determine sizing requirements for the garment to be manufactured. The method further comprises customizing the pattern for the garment to be manufactured based on the determined sizing requirement and automatically manufacturing the garment based on the customized pattern.