Patents by Inventor Abhjeet Bagal

Abhjeet Bagal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • EUV resist patterning using pulsed plasma
    Patent number: 10847368
    Abstract: A coating layer is deposited on a patterned feature on a first portion of a substrate. A second portion of the substrate outside the patterned feature is etched. The etching and the depositing are performed in a single pulsed plasma process using at least one of a pulsed source power signal and a pulsed bias power signal.
    Type: Grant
    Filed: April 7, 2017
    Date of Patent: November 24, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Byungkook Kong, Sangwook Kim, SeungHyun Park, Abhjeet Bagal, Kyoungjin Lee, Daksh Agarwal