Patents by Inventor Abul Khaer Mohamad Quamrul Hasan

Abul Khaer Mohamad Quamrul Hasan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7135184
    Abstract: It is intended to provide means of efficiently, economically and conveniently dyeing fibers or hair, bleaching pulp or fibers, removing phenol compounds from liquid wastes, degrading endocrine disruptors, producing phenolic resins, producing artificial lacquer coatings, improving wood qualities, etc. A culture of a strain belonging to the genus Flammulina; a culture originating in the above strain which is obtained by culturing the strain at a pH value exceeding 7 and has a phenol oxidase-like activity; a process for producing the culture; a dyeing method which comprises contacting a subject to be dyed with a dye in the presence of the above culture; and a dyeing composition containing the above culture.
    Type: Grant
    Filed: August 28, 2003
    Date of Patent: November 14, 2006
    Assignee: Mandom Corporation
    Inventors: Yoshio Tsujino, Katsunori Endo, Abul Khaer Mohamad Quamrul Hasan
  • Publication number: 20060021152
    Abstract: The present invention relates to a neutral phenol oxidase showing small changes depending on a substrate in optimum pH for various substrates and having high enzymatic activity at pH around neutral region, a method for producing the same, and an antibody raised against the neutral phenol oxidase. According to the present invention, dyeing of fibers, coloring of hair or the like can be achieved. In addition, according to the present invention, effects on the environment, the human body, and the like can be reduced.
    Type: Application
    Filed: March 4, 2004
    Publication date: February 2, 2006
    Inventors: Yoshio Tsujino, Katsunori Endo, Abul Khaer Mohamad Quamrul Hasan, Kaori Otsuka
  • Publication number: 20030206965
    Abstract: Allergen neutralization compositions for use on inanimate objects having an effective amount of an allergy neutralizing metal ion, and a solvent. The allergen neutralization compositions are sprayable, and preferably contain allergen denaturing compounds such as polyphenol compounds, hydrogen peroxide, salicylic acid, citric acid, lactic acid, glycolic acid, and mixtures of these. The metal ion is selected from ions of zinc, stannous, stannic, magnesium, calcium, manganese, titanium, iron, copper, nickel, and mixtures of these. These allergen neutralization compositions provide excellent efficacy against various allergens, and specifically, the allergens associated with house dust mites and other common allergens such as cat dander, pollen and the like. Moreover, these compositions do not stain common household surfaces.
    Type: Application
    Filed: March 26, 2003
    Publication date: November 6, 2003
    Applicant: The Procter & Gamble Company
    Inventors: Abul Khaer Mohamad Quamrul Hasan, Mark Hsiang-Kuen Mao, Ryoko Kobayashi
  • Publication number: 20030203035
    Abstract: Allergen neutralization compositions that retain at least about 30% of dust particles as measured by the Dust Control Test, and the compositions have an average MIU value of less than 3.4 as measured by the Friction Coefficient Analysis method. The compositions preferably contain a film forming polymer to control dust while maintaining a smooth feeling on the surface being treated. These allergen neutralization compositions are for use on inanimate objects, and are sprayable. Preferably these allergen neutralization compositions contain allergen denaturing compounds such as an effective amount of an allergy neutralizing metal ion, polyphenol compounds, hydrogen peroxide, salicylic acid, citric acid, lactic acid, glycolic acid, and mixtures of these.
    Type: Application
    Filed: March 26, 2003
    Publication date: October 30, 2003
    Applicant: The Procter & Gamble Company
    Inventors: Abul Khaer Mohamad Quamrul Hasan, Mark Hsiang-Kuen Mao, Ryoko Kobayashi