Patents by Inventor Achim Körber
Achim Körber has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230398319Abstract: The present disclosure relates to systems and method of controlling the pressure level of a gas mixture being delivered to a patient via a pressure support device adapted to provide breathing support to a patient that varies with time. More specifically, the systems and methods described herein enable the accurate detection of active inspiration by the patient and the fast triggering of an increased inspiratory positive airway pressure pulse. Further, the systems and methods described rely upon the patient pressure measured along a turbulent gas flow path and finds particular application when the pressure support device is configured to provide a non-zero positive end-expiratory pressure.Type: ApplicationFiled: February 23, 2023Publication date: December 14, 2023Inventors: Achim Koerber, Tamara Mathea Elisabeth Nijsen
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Patent number: 11491438Abstract: Provided is a system for adsorbing a gaseous component comprising nitrogen from a pressurized flow of air containing the gaseous component. The system comprises a first adsorption bed, and a second adsorption bed. Each of the adsorption beds are suitable for selectively adsorbing the gaseous component from the flow of air to produce a product gas having a higher oxygen concentration than that of the air. The system includes an adjustable feed gas supply which alternately supplies the first adsorption bed and the second adsorption bed with the air. The first adsorption bed is supplied with air during a first half cycle of operation of the system, and the second adsorption bed is then supplied with air during a second half cycle of operation of the system. The feed gas supply enables adjustment of at least one parameter relating to the amount or respective amounts of air being supplied to the first adsorption bed in the first half cycle and/or to the second adsorption bed in the second half cycle.Type: GrantFiled: November 9, 2020Date of Patent: November 8, 2022Assignee: Koninklijke Philips N.V.Inventors: Achim Körber, Rainer Hilbig, Paul van der Sluis, Douglas Adam Whitcher, Brian Edward Dickerson, Daniel Paul Servansky
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Publication number: 20210260329Abstract: There is provided a portable oxygen concentrator. The portable oxygen concentrator comprises a sieve bed comprising an inlet and an outlet; a first region of adsorbent material adjacent the inlet; and a second region of adsorbent material adjacent the outlet. The first and second regions of adsorbent material comprise beads of adsorbent material. The first region comprises beads of a first size and the second region comprises beads of a second size which is larger than the first size.Type: ApplicationFiled: January 25, 2021Publication date: August 26, 2021Inventors: Achim Koerber, Rainer Hilbig, Douglas Adam Whitcher, Brian Edward Dickerson, Joseph Thomas Dolensky, Robert William Murdoch
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Publication number: 20210229026Abstract: Provided is a system for adsorbing a gaseous component comprising nitrogen from a pressurized flow of air containing the gaseous component. The system comprises a first adsorption bed, and a second adsorption bed. Each of the adsorption beds are suitable for selectively adsorbing the gaseous component from the flow of air to produce a product gas having a higher oxygen concentration than that of the air. The system includes an adjustable feed gas supply which alternately supplies the first adsorption bed and the second adsorption bed with the air. The first adsorption bed is supplied with air during a first half cycle of operation of the system, and the second adsorption bed is then supplied with air during a second half cycle of operation of the system. The feed gas supply enables adjustment of at least one parameter relating to the amount or respective amounts of air being supplied to the first adsorption bed in the first half cycle and/or to the second adsorption bed in the second half cycle.Type: ApplicationFiled: November 9, 2020Publication date: July 29, 2021Inventors: Achim Körber, Rainer Hilbig, Paul van der Sluis, Douglas Adam Whitcher, Brian Edward Dickerson, Daniel Paul Servansky
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Publication number: 20130327329Abstract: The invention relates to the field of nitric oxide generation. The present invention particularly relates to a method for generating a stream of gas, the gas comprising oxygen and nitric oxide. According to the invention, an intermittent stream of oxygen comprising gas having at least one gap is provided, in which gap a defined pulse of nitric oxide comprising gas is provided. The pulse of nitric oxide comprising gas is embedded in a first pulse of inert gas being provided before the pulse of nitric oxide comprising gas and a second pulse of inert gas being provided after the pulse of nitric oxide comprising gas, the first pulse of inert gas and the second pulse of inert gas being provided in the gap of the intermittent stream of oxygen comprising gas. The method according to the invention reduces the danger of toxic compounds to be formed in the generated gas stream and furthermore provides a method being usable for therapeutic applications independent from the breathing cycle of a patient.Type: ApplicationFiled: February 16, 2012Publication date: December 12, 2013Applicant: KONINKLIJKE PHILIPS N.V.Inventors: Claudia Hannelore Igney, Achim Koerber, Rainer Hilbig
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Publication number: 20080007179Abstract: The invention relates to a high-pressure discharge lamp with a discharge vessel having a filling comprising a rare gas, for example argon, mercury, and chlorine, wherein the filling quantities of mercury [Hg] and chlorine [Cl] comply with the following conditions: [Hg].[Cl]?200 (?mole/cm3)2, [Cl]?10 ?mole/cm3. The condition [Hg].[Cl]?200 (?mole/cm3)2 achieves HgCl vapor pressures in the discharge sufficient for generating significant radiation components of the B2?+-X2?+ band system of this molecule. The condition [Cl]?10 ?mole/cm3 serves to limit the chemical aggressiveness of the chlorine filling, in particular to limit the attacks on the wall and electrodes and thus to achieve longer lamp lives. The addition of chlorine-binding metals, in particular of germanium, leads to a further improvement in the radiation and life properties of the lamp.Type: ApplicationFiled: September 18, 2007Publication date: January 10, 2008Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.Inventors: Achim Koerber, Rainer Hilbig, Robert Scholl, Johannes Baier, Ghaleb Natour
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Publication number: 20070018583Abstract: The invention relates to a high pressure discharge lamp intended for use in assimilation lighting. According to the invention the high-pressure discharge lamp has a discharge vessel, which besides a buffer gas comprises substantially LiI as metal halide or a mixture of LiI and NaI.Type: ApplicationFiled: October 7, 2004Publication date: January 25, 2007Inventors: Volker Hildenbrand, Achim Koerber, Antonius Van Amstel, Johannes Antonius Schellen, Marco Haverlag, Cornelis Pot
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Publication number: 20060091812Abstract: The invention relates to a high-pressure discharge lamp with a discharge vessel having a filling comprising—a rare gas, for example argon, —mercury, and —chlorine, wherein the filling quantities of mercury [Hg] and chlorine [Cl] comply with the following conditions: —[Hg](E[Cl]3 200 (?mole/cm3)2, —[Cl] £ 10 ?mole/cm3. The condition [Hg](E[Cl]3 200 (?mole/cm3)2 achieves HgCl vapor pressures in the discharge sufficient for generating significant radiation components of the B2S+?X2S+ band system of this molecule. The condition [Cl] £ 10 ?mole/cm3 serves to limit the chemical aggressiveness of the chlorine filling, in particular to limit the attacks on the wall and electrodes and thus to achieve longer lamp lives. The addition of chlorine-binding metals, in particular of germanium, leads to a further improvement in the radiation and life properties of the lamp.Type: ApplicationFiled: November 21, 2003Publication date: May 4, 2006Applicant: Koninklijke Philips Electronics, N.V.Inventors: Achim Koerber, Rainer Hilbig, Robert Scholl, Johannes Baier, Ghaleb Natour
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Patent number: 6972521Abstract: A low-pressure gas discharge lamp provided with a gas discharge vessel containing a mercury-free gas filling with an indium compound in an amount of about 1 to 10 microgram per cubic centimeter and a partial pressure in the range from 1.0 to 30 micro bar, and a buffer gas for emitting radiation in a continuous spectrum in the visible and near UVA regions of the electromagnetic spectrum, which low-pressure gas discharge lamp is also provided with electrodes and a ballast for controlling the ignition and operation of the lamp.Type: GrantFiled: September 7, 2001Date of Patent: December 6, 2005Assignee: Koninklijke Philips Electronics N.V.Inventors: Robert Peter Scholl, Rainer Hilbig, Achim Koerber, Johannes Baier
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Publication number: 20050242737Abstract: A low-pressure gas discharge lamp equipped with a gas discharge vessel containing an inert gas filling as the buffer gas, and with electrodes and with means for generating and maintaining a low-pressure gas discharge, is described, wherein the lamp contains at least one tin halide.Type: ApplicationFiled: September 1, 2003Publication date: November 3, 2005Applicant: Kininklijke Philips Electronics N.V.Inventors: Robert Scholl, Rainer Hilbig, Achim Koerber, Johannes Baier
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Publication number: 20040169456Abstract: A low-pressure gas discharge lamp comprising a gas discharge vessel with a gas filling containing an indium compound and a buffer gas, and comprising a phosphor layer containing at least one phosphor emitting in the visible range of the spectrum, and comprising electrodes and means for generating and maintaining a low-pressure gas discharge.Type: ApplicationFiled: December 9, 2003Publication date: September 2, 2004Inventors: Robert Peter Scholl, Rainer Hilbig, Achim Koerber, Johannes Baier, Thomas Juestel, Cornelis Reinder Ronda
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Publication number: 20040150345Abstract: A gas discharge lamp is described with a discharge gas comprising a light-emitting substance enclosed in a discharge vessel, which is characterized in particular in that the light-emitting substance is formed by a compound of at least one element from the group IV-A (Si, Ge, Sn, Pb) and at least one element from the group VI-A (O, S, Se, and Te) of the periodic system, with the exception of the compound GeSe. It was surprisingly found that the emission maximum lies approximately in the center of the visible spectral range of the light with such a substance, in particular GeTe, at a comparatively low vapor pressure already, and that in addition a very high radiant efficacy is obtained. Furthermore, the emitted light has a color temperature substantially corresponding to that of natural daylight also without additives, in contrast to many other gas discharge lamps, thus opening the way to a use of the lamp for general lighting purposes.Type: ApplicationFiled: December 4, 2003Publication date: August 5, 2004Inventors: Robert Peter Scholl, Rainer Hilbig, Achim Koerber, Johannes Baier
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Publication number: 20040108803Abstract: A gas discharge lamp is described with at least one capacitive coupling structure (10, 10′), which lamp has the particular feature that the coupling structure (10, 10′) is provided for generating an electromagnetic field with a frequency below approximately 50 MHz, that it is formed by a metal element (101, 101′) surrounded by a dielectric layer (102, 102′) at least in the region of a discharge space, which layer is less than approximately 100 &mgr;m thick. It was surprisingly found that operation at low frequencies is possible with such a coupling structure, for which efficient ballasts are available. A further advantage is that this coupling structure compared with known coupling structures for frequencies below approximately 50 MHz only cause a minimum shadow effect. The efficacy of the entire system is considerably higher than that of known lamps of this kind for these two reasons.Type: ApplicationFiled: December 3, 2003Publication date: June 10, 2004Inventors: Robert Peter Scholl, Johannes Baier, Achim Koerber, Rainer Hilbig, Johannes Maria Van Vliet
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Patent number: 6731070Abstract: A low-pressure gas discharge lamp having a gas discharge vessel containing a gas filling with a chalcogenide of the elements of the 4th main group of the periodic systems of elements and a buffer gas, and having inner or outer electrodes and means for generating and maintaining a low-pressure gas discharge.Type: GrantFiled: June 11, 2002Date of Patent: May 4, 2004Assignee: Koninklijke Philips Electronics N.V.Inventors: Robert Peter Scholl, Rainer Hilbig, Achim Koerber, Johannes Baier, Thomas Juestel, Peter J. Schmidt
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Patent number: 6603267Abstract: A low-pressure gas discharge lamp having a gas discharge vessel containing a gas filling including a copper compound. The copper compound is selected from the oxides, chalcogenides, hydroxides, hydrides and the metalorganic compounds of copper. In addition to the copper compound, the gas filling includes a buffer gas such as argon, and may also include a thallium compound and/or a copper halogenide.Type: GrantFiled: September 7, 2001Date of Patent: August 5, 2003Assignee: Koninklijke Philips Electronics N.V.Inventors: Rainer Hilbig, Robert Peter Scholl, Achim Koerber, Johannes Baier
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Publication number: 20030001505Abstract: A low-pressure gas discharge lamp comprising a gas discharge vessel containing a gas filling with a chalcogenide of the elements of the 4th main group of the periodic systems of elements and a buffer gas, and comprising inner or outer electrodes and means for generating and maintaining a low-pressure gas discharge.Type: ApplicationFiled: June 11, 2002Publication date: January 2, 2003Inventors: Robert Peter Scholl, Rainer Hilbig, Achim Koerber, Johannes Baier, Thomas Juestel, Peter J. Schmidt
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Publication number: 20020047524Abstract: A low-pressure gas discharge lamp provided with a gas discharge vessel comprising a gas filling with a copper compound selected from the group formed by the oxides, chalcogenides, hydroxides, hydrides and the metalorganic compounds of copper, and comprising a buffer gas, which low-pressure gas discharge lamp is further provided with electrodes and means for generating and maintaining a low-pressure gas discharge.Type: ApplicationFiled: September 7, 2001Publication date: April 25, 2002Inventors: Rainer Hilbig, Robert Peter Scholl, Achim Koerber, Johannes Baier
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Publication number: 20020047525Abstract: A low-pressure gas discharge lamp provided with a gas discharge vessel containing a gas filling with an indium compound and a buffer gas, which low-pressure gas discharge lamp is also provided with electrodes and means for generating and maintaining a low-pressure gas discharge.Type: ApplicationFiled: September 7, 2001Publication date: April 25, 2002Inventors: Robert Peter Scholl, Rainer Hilbig, Achim Koerber, Johannes Baier