Patents by Inventor Achim Zirkel

Achim Zirkel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240011920
    Abstract: An inspection device for inspecting a panel, in particular a display, or a PCB, includes a first mirror, a second mirror, a third mirror, and a sensor. The first mirror, the second mirror, and the third mirror are arranged to display a section of the panel to be inspected on the sensor with a magnification factor greater than one. At least two of the group of the first mirror, the second mirror, and the third mirror, have both a first type of curvature, and a remaining mirror has a second type of curvature, opposite to the first type of curvature. The first mirror, the second mirror, and the third mirror form a telecentric system which is telecentric on a panel facing side and/or on a sensor facing side.
    Type: Application
    Filed: September 25, 2023
    Publication date: January 11, 2024
    Applicant: Qioptiq Photonics GmbH & Co. KG
    Inventor: Achim Zirkel
  • Patent number: 11586008
    Abstract: The present invention relates to an objective for photographic applications, comprising, in a sequence from an object side end to an image side end, a first lens group having a positive refractivity with at least one lens, a second lens group having a negative refractivity with a single lens, a third lens group having a negative refractivity with a single lens and a fourth lens group having a positive refractivity with at least one lens, wherein the lenses of the second and third lens groups each have a concave surface which face one another and define an air lens, wherein f1 is the overall focal length of the lenses of the second and third lens groups and f2 is the focal length of the air lens, and wherein the relationship 5.0?f1/f2?9.0 is true.
    Type: Grant
    Filed: July 28, 2020
    Date of Patent: February 21, 2023
    Assignee: Leica Camera AG
    Inventors: Achim Zirkel, Jakob Bleicher, Alexandra Bleicher
  • Patent number: 11099354
    Abstract: The present invention relates to an optical lens system for a camera comprising in an order from an end at the object side to an end at the image side a first lens having a positive refractive power, a second lens having a positive refractive power, a third lens having a positive refractive power, and a fourth lens having a negative refractive power, wherein the second and third lenses are each designed as meniscus lenses, wherein the surface of the second lens at the object side is convex and the surface of the third lens at the object side is concave. The invention further relates to an imaging system having an image sensor that has a plurality of light-sensitive elements arranged in rows and columns and having such an optical lens system.
    Type: Grant
    Filed: May 8, 2019
    Date of Patent: August 24, 2021
    Assignee: Leica Camera AG
    Inventors: Marcus Deschauer, Achim Zirkel, Jakob Bleicher, Stephan Albrecht
  • Publication number: 20210041660
    Abstract: The present invention relates to an objective for photographic applications, comprising, in a sequence from an object side end to an image side end, a first lens group having a positive refractivity with at least one lens, a second lens group having a negative refractivity with a single lens, a third lens group having a negative refractivity with a single lens and a fourth lens group having a positive refractivity with at least one lens, wherein the lenses of the second and third lens groups each have a concave surface which face one another and define an air lens, wherein f1 is the overall focal length of the lenses of the second and third lens groups and f2 is the focal length of the air lens, and wherein the relationship 5.0?f1/f2?9.0 is true.
    Type: Application
    Filed: July 28, 2020
    Publication date: February 11, 2021
    Inventors: Achim Zirkel, Jakob Bleicher, Alexandra Bleicher
  • Publication number: 20200225449
    Abstract: The present invention relates to a photographic objective having at least six lenses and at most eight lenses, with the first lens viewed from the object side being manufactured from glass and having a positive refractive power, an Abbe number of greater than or equal to 55, and a deviation of the relative partial dispersion from the normal line ?Pg,F between 0.008 and 0.035.
    Type: Application
    Filed: January 13, 2020
    Publication date: July 16, 2020
    Inventors: Achim Zirkel, Marcus Deschauer, Jakob Bleicher
  • Publication number: 20190377159
    Abstract: The present invention relates to an optical lens system for a camera comprising in an order from an end at the object side to an end at the image side a first lens having a positive refractive power, a second lens having a positive refractive power, a third lens having a positive refractive power, and a fourth lens having a negative refractive power, wherein the second and third lenses are each designed as meniscus lenses, wherein the surface of the second lens at the object side is convex and the surface of the third lens at the object side is concave. The invention further relates to an imaging system having an image sensor that has a plurality of light-sensitive elements arranged in rows and columns and having such an optical lens system.
    Type: Application
    Filed: May 8, 2019
    Publication date: December 12, 2019
    Inventors: Marcus DESCHAUER, Achim Zirkel, Jakob Bleicher, Stephan Albrecht
  • Publication number: 20170322343
    Abstract: The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.
    Type: Application
    Filed: July 24, 2017
    Publication date: November 9, 2017
    Inventors: Vladimir Kamenov, Daniel Kraehmer, Toralf Gruner, Karl-Stefan Weissenrieder, Heiko Feldmann, Achim Zirkel, Alexandra Pazidis, Bruno Thome, Stephan Six
  • Patent number: 9733395
    Abstract: The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.
    Type: Grant
    Filed: May 20, 2011
    Date of Patent: August 15, 2017
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Vladimir Kamenov, Daniel Kraehmer, Toralf Gruner, Karl-Stefan Weissenrieder, Heiko Feldmann, Achim Zirkel, Alexandra Pazidis, Bruno Thome, Stephan Six
  • Publication number: 20140320955
    Abstract: The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.
    Type: Application
    Filed: July 15, 2014
    Publication date: October 30, 2014
    Inventors: Vladimir Kamenov, Daniel Kraehmer, Toralf Gruner, Karl-Stefan Weissenrieder, Heiko Feldmann, Achim Zirkel, Alexandra Pazidis, Bruno Thome, Stephan Six
  • Publication number: 20110222043
    Abstract: The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.
    Type: Application
    Filed: May 20, 2011
    Publication date: September 15, 2011
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Vladimir Kamenov, Daniel Kraehmer, Toralf Gruner, Karl-Stefan Weissenrieder, Heiko Feldmann, Achim Zirkel, Alexandra Pazidis, Bruno Thome, Stephan Six
  • Publication number: 20080297754
    Abstract: The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.
    Type: Application
    Filed: February 14, 2008
    Publication date: December 4, 2008
    Applicant: CARL ZEISS SMT AG
    Inventors: Vladimir Kamenov, Daniel Kraehmer, Toralf Gruner, Karl-Stefan Weissenrieder, Heiko Feldmann, Achim Zirkel, Alexandra Pazidis, Bruno Thome, Stephan Six