Abstract: A building board having an integral vapor-permeable water-resistant barrier (WRB) sheet, and a process for making same, and a two-material layered laminate useful for making said building board, wherein the building board comprises in order, a WRB sheet, a polymer tie layer, and a board substrate bonded together in a face-to-face relationship, the polymer tie layer comprising of a thermally or high frequency activated fibrous web and having voids through the thickness of said layer such that the polymer tie layer has a moisture vapor transmission rate through said layer of at least equal to or greater than that of the WRB sheet, the polymer of the polymer tie layer having an elastic modulus (G?) greater than 1×106 Pa at 20° C. and a softening temperature of greater than 122° F. (50 C), the softening temperature being the temperature at which the polymer elastic modulus (G?) drops below 30 percent of the elastic modulus (G?) of the polymer at 20° C.

Abstract: The present invention provides methods of making chemical mechanical planarization (CMP) polishing pads comprising introducing, separately, through a side liquid feed port into an internal chamber having a downstream open end a liquid polyol component stream comprising an amine curative at a temperature T1 of from 40 to 90° C. and a liquid isocyanate component stream at a temperature T2 of from 40 to 90° C., each of the two components under a set point pressure of from 13,000 to 24,000 kPa so that the two streams are pointed towards each other at 90 degrees to downstream flow, thereby impingement mixing the two components to form a reaction mixture, discharging a stream of the reaction mixture from the open end of the internal chamber under pressure through a narrow, preferably, round orifice and onto an open mold substrate having a urethane releasing surface, and curing the reaction mixture to form a porous polyurethane reaction product.

Abstract: The present invention provides methods for making CMP polishing pads or layers therefore, the methods comprising introducing, separately, to a static mixer having a nozzle at its downstream end two solvent free and substantially water free components, a liquid polyol component having a temperature T1 and a liquid isocyanate component having a temperature T2, each under a low gauge pressure of from 5 to 120 kPa (1 to 14 psi), the liquid polyol component comprising one or more polyol, an amine curative; and the liquid isocyanate component comprising one or more polyisocyanate or isocyanate-terminated urethane prepolymer; mixing the two components in the static mixer to form a reaction mixture, discharging a stream of the reaction mixture from the nozzle onto an open mold substrate having a urethane releasing surface, and curing to form a porous polyurethane reaction product.