Patents by Inventor Adam BYRD

Adam BYRD has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240379983
    Abstract: An electrochemical cell includes an electrolyte layer, an anode electrode disposed over a first surface of the electrolyte layer, a ceramic anode support laterally surrounding the anode electrode and embedded in the anode electrode, such that a recess configured to receive a seal is located above a periphery of the ceramic anode support, and a cathode disposed over a second surface of the electrolyte layer.
    Type: Application
    Filed: May 1, 2024
    Publication date: November 14, 2024
    Inventors: Travis SCHMAUSS, Keji PAN, Emad EL BATAWI, Tad ARMSTRONG, Adam BYRD
  • Publication number: 20240347739
    Abstract: A method of forming a protective layer on an interconnect for an electrochemical cell stack includes coating at least one side of the interconnect with a metal oxide powder to form a protective layer, sintering the coated interconnect in an inert atmosphere to at least partially reduce the protective layer, and oxidizing the sintered interconnect in an oxidizing atmosphere to oxidize and densify the protective layer.
    Type: Application
    Filed: April 2, 2024
    Publication date: October 17, 2024
    Inventors: Zigui LU, Guoliang XIAO, Tad ARMSTRONG, Keji PAN, Adam BYRD
  • Publication number: 20240139810
    Abstract: A method includes binder jet printing a metal alloy powder or a metal powder mixture to form a green interconnect, debinding the green interconnect, and sintering the green interconnect to form a metal alloy interconnect for an electrochemical stack.
    Type: Application
    Filed: October 30, 2023
    Publication date: May 2, 2024
    Inventor: Adam BYRD
  • Publication number: 20240093376
    Abstract: A method of forming a protective coating on an interconnect for an electrochemical device stack includes providing a powder on the interconnect and laser sintering the powder.
    Type: Application
    Filed: September 19, 2023
    Publication date: March 21, 2024
    Inventors: Adam BYRD, Zigui LU, Guoliang XIAO, Tad ARMSTRONG, Harald HERCHEN, Travis SCHMAUSS, Keji PAN
  • Publication number: 20240082916
    Abstract: A method of forming an interconnect for an electrochemical device stack includes loading a die with an interconnect material comprising an interconnect body powder comprising chromium and iron, and spark plasma sintering (SPS) the interconnect material to form a body of the interconnect.
    Type: Application
    Filed: August 30, 2023
    Publication date: March 14, 2024
    Inventors: Adam BYRD, Adil ASHARY