Abstract: A plasma processing apparatus. The plasma processing apparatus may include a plasma chamber, to define a plasma therein, and an extraction aperture, arranged along a first side of the plasma chamber, the extraction aperture to define an ion beam extracted therethrough. The plasma processing apparatus may further include a residence time tuning assembly, coupled to a portion of the plasma chamber, different from the first side, wherein the residence time tuning assembly comprises a pumping duct, connected to the plasma chamber on a first end, and defining a pumping path for extracting a gaseous species directly from the plasma chamber, separately from the extraction aperture.

Abstract: An antenna assembly. The antenna assembly may include an antenna, having a loop structure, and a dielectric window, adjacent to the antenna. The antenna assembly may also include a Faraday shield assembly disposed between the antenna and the dielectric window, where the Faraday shield assembly is disposed at least partially around the antenna. The Faraday shield assembly may include a plurality of metallic sections, electrically isolated from one another, where the plurality of metallic sections are arranged into a plurality of shield pairs. As such, a first metallic section and a second metallic section of a given shield pair may be disposed opposite one another and may be electrically connected to one another.

Abstract: A processing system including an ion source having a plasma chamber to house a plasma, an extraction assembly, disposed along a side of the plasma chamber, and including at least one extraction aperture, and an antenna assembly extending through the plasma chamber. The antenna assembly may include a dielectric enclosure and a plurality of conductive antennas extending through the dielectric enclosure, the conductive antennas having respective gas ports formed therein for delivering a gas into the dielectric enclosure. The processing system may further include a temperature regulation system coupled to the conductive antennas and to the dielectric enclosure for monitoring a temperature of the dielectric enclosure and regulating the gas delivered to the conductive antennas for regulating the temperature of the dielectric enclosure.

Abstract: A processing system may include a plasma chamber and an extraction optics, disposed along a side of the plasma chamber. The extraction optics may include an extraction plate, having an outer side and an inner side, where the extraction plate defines at least one extraction aperture. The extraction optics may include a beam blocker, overlapping the at least one extraction aperture, and disposed towards the inner side of the extraction plate. The beam blocker may have a cross-section that defines a boomerang shape, and may comprise a first metallic material, where the extraction plate comprises a second metallic material. The processing system may further include a substrate platen, disposed outside of the plasma chamber, and movable along a scan direction with respect to the extraction aperture.

Abstract: An antenna assembly, comprising: an antenna; a dielectric enclosure surrounding the antenna; and a Faraday shield, disposed around the antenna, and arranged between the antenna and the dielectric enclosure, wherein the Faraday shield comprises a non-uniform opacity along an antenna axis of the antenna, wherein a first opacity of the Faraday shield at a first position along the antenna axis is greater than a second opacity of the Faraday shield at a second position along the antenna axis of the antenna.

Abstract: A fastening assembly for fastening a beam blocker to an extraction plate, the fastening assembly including a mounting pin having a shaft portion, a base portion at a first end of the shaft portion, and a head portion at a second end of the shaft portion, a centering sleeve radially surrounding the shaft portion and axially abutting the base portion, the centering sleeve being radially compressible between the shaft portion and the extraction plate and between the shaft portion and the beam blocker, an annular spacer surrounding the centering sleeve and axially abutting the beam blocker, with the centering sleeve extending partially into the spacer, and a latching cap surrounding the shaft portion and axially abutting the spacer, with the shaft portion extending through a through hole of the latching cap, the through hole being smaller than the head portion in a direction perpendicular to an axis of mounting pin.

Abstract: A processing system including an ion source having a plasma chamber to house a plasma, an extraction assembly, disposed along a side of the plasma chamber, and including at least one extraction aperture, and an antenna assembly extending through the plasma chamber. The antenna assembly may include a dielectric enclosure and a plurality of conductive antennas extending through the dielectric enclosure, the conductive antennas having respective gas ports formed therein for delivering a gas into the dielectric enclosure. The processing system may further include a temperature regulation system coupled to the conductive antennas and to the dielectric enclosure for monitoring a temperature of the dielectric enclosure and regulating the gas delivered to the conductive antennas for regulating the temperature of the dielectric enclosure.

Abstract: Disclosed herein are approaches for adjusting extraction slits of an extraction plate using a set of adjustable beam blockers. In one approach, an ion extraction optics may include an extraction plate including a first opening and a second opening, and a first beam blocker extending over the first opening and a second beam blocker extending over the second opening. Each of the first and second beam blockers may include an inner slit defined by a first distance between an inner edge and the extraction plate, and an outer slit defined by a second distance between an outer edge and the extraction plate, wherein the first and second beam blockers are movable to vary at least one of the first distance and the second distance. As a result, extraction through the inner and outer slits of ion beamlets characterized by similar mean angles may be achieved.

Abstract: Disclosed herein are approaches for adjusting extraction slits of an extraction plate using a set of adjustable beam blockers. In one approach, an ion extraction optics may include an extraction plate including a first opening and a second opening, and a first beam blocker extending over the first opening and a second beam blocker extending over the second opening. Each of the first and second beam blockers may include an inner slit defined by a first distance between an inner edge and the extraction plate, and an outer slit defined by a second distance between an outer edge and the extraction plate, wherein the first and second beam blockers are movable to vary at least one of the first distance and the second distance. As a result, extraction through the inner and outer slits of ion beamlets characterized by similar mean angles may be achieved.