Abstract: An edge ring system comprising a substrate support configured to support a substrate during plasma processing and including a baseplate and an upper layer arranged on the baseplate. An edge ring support includes a first body and an electrostatic clamping electrode arranged in the first body. The edge ring support is arranged above the baseplate and radially outside of the substrate during processing. An edge ring includes a second body arranged on and electrostatically clamped to the edge ring support during plasma processing.

Abstract: A barrier seal ring for use in a plasma chamber includes an outer seal leg extending vertically down from a top surface to a bottom surface along an outer diameter and an inner seal leg extending down from the top surface to an inner diameter. An upper leg portion of the inner seal leg extends at an angle relative to the outer seal leg and a lower leg portion extends down from a bottom of the upper leg portion and an interface is defined between the upper leg portion and the lower leg portion. The interface allows the inner seal leg to fold inward toward the inside surface of the outer seal leg during installation within a groove of a base ring disposed in a lower electrode of the plasma chamber.

Abstract: A confinement ring for use in a plasma processing chamber includes a lower horizontal section, a vertical section, and a upper horizontal section. The lower horizontal section extends between an inner lower radius and an outer radius of the confinement ring, and includes an extension section that extends vertically downward at the inner lower radius. A plurality of slots is defined in the lower horizontal section, wherein each slot extends radially from an inner diameter to an outer diameter along the lower horizontal section. An inner slot radius of each slot at the inner diameter is defined to be less than an outer slot radius at the outer diameter. The upper horizontal section extends between an inner upper radius and the outer radius of the confinement ring, and the vertical section integrally continues the lower horizontal section to the upper horizontal section at the outer radius of the confinement ring.

Abstract: A substrate support for a substrate processing chamber includes a baseplate, an edge ring arranged on the baseplate, a seal arrangement located between the edge ring and the baseplate that is configured to define an interface between the edge ring and the baseplate, and at least one channel in fluid communication with the interface and configured to supply a heat transfer gas to the interface.

Abstract: An edge ring for a substrate processing system includes an annular body and an annular channel disposed in the annular body circumferentially along an inner diameter of the annular body. The annular channel includes N distinct sections, where N is an integer greater than 1. The edge ring includes N injection ports arranged circumferentially on the annular body to respectively inject one or more gases into the N distinct sections of the annular channel. The edge ring includes a flange extending radially inwards from the inner diameter of the annular body. A plurality of slits is arranged in the flange. The slits are in fluid communication with the annular channel and extend radially inwards from the annular channel to deliver the one or more gases.

Abstract: An edge ring system comprising a substrate support configured to support a substrate during plasma processing and including a baseplate and an upper layer arranged on the baseplate. An edge ring support includes a first body and an electrostatic clamping electrode arranged in the first body. The edge ring support is arranged above the baseplate and radially outside of the substrate during processing. An edge ring includes a second body arranged on and electrostatically clamped to the edge ring support during plasma processing.