Patents by Inventor Adam Dittli

Adam Dittli has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11008644
    Abstract: A method of non-ablatively laser patterning a multi-layer structure, the multi-layer structure including a substrate, a first layer disposed on the substrate, a second layer disposed on the first layer, and a third layer disposed on the second layer, the method including generating at least one laser pulse having laser parameters selected for non-ablatively changing the conductivity a selected portion of the third layer such that the selected portion becomes non-conductive, and directing the pulse to the multi-layer structure, wherein the conductivity of the first layer is not substantially changed by the pulse.
    Type: Grant
    Filed: September 25, 2018
    Date of Patent: May 18, 2021
    Assignee: nLIGHT, Inc.
    Inventors: Adam Dittli, Robert J. Martinsen
  • Patent number: 10464172
    Abstract: A processing system directs a laser beam to a composite including a substrate, a conductive layer, and a conductive border. The location of a focus of the laser beam can be controlled to bring the laser beam into focus on the surfaces of the conductive materials. The laser beam can be used to ablatively process the conductive border and non-ablatively process the conductive layer by translating a focus-adjust optical system so as to vary laser beam diameter.
    Type: Grant
    Filed: February 21, 2014
    Date of Patent: November 5, 2019
    Assignee: nLIGHT, Inc.
    Inventors: Robert J. Martinsen, Adam Dittli, Ken Gross
  • Publication number: 20190032181
    Abstract: A method of non-ablatively laser patterning a multi-layer structure, the multi-layer structure including a substrate, a first layer disposed on the substrate, a second layer disposed on the first layer, and a third layer disposed on the second layer, the method including generating at least one laser pulse having laser parameters selected for non-ablatively changing the conductivity a selected portion of the third layer such that the selected portion becomes non-conductive, and directing the pulse to the multi-layer structure, wherein the conductivity of the first layer is not substantially changed by the pulse.
    Type: Application
    Filed: September 25, 2018
    Publication date: January 31, 2019
    Applicant: nLIGHT, Inc.
    Inventors: Adam Dittli, Robert J. Martinsen
  • Patent number: 10100393
    Abstract: A method of non-ablatively laser patterning a multi-layer structure, the multi-layer structure including a substrate, a first layer disposed on the substrate, a second layer disposed on the first layer, and a third layer disposed on the second layer, the method including generating at least one laser pulse having laser parameters selected for non-ablatively changing the conductivity a selected portion of the third layer such that the selected portion becomes non-conductive, and directing the pulse to the multi-layer structure, wherein the conductivity of the first layer is not substantially changed by the pulse.
    Type: Grant
    Filed: February 21, 2014
    Date of Patent: October 16, 2018
    Assignee: nLIGHT, Inc.
    Inventors: Adam Dittli, Robert J. Martinsen
  • Publication number: 20170189992
    Abstract: A method includes generating a plurality of pulse bursts with a predetermined quantity of intra-burst pulses in each pulse burst and a temporal spacing between the intra-burst pulses, and with a pulse burst frequency, and scanning the pulse bursts across an anodized target at a scan rate so that the pulse bursts overlap at the anodized target by an amount that is above an overlap damage threshold and the intra-burst pulses provide a peak power and peak fluence that are below an ablation threshold of the anodized target so as to produce a laser mark on the anodized target with an L value of less than or equal to 30 and without a damage to an anodized layer of the anodized target.
    Type: Application
    Filed: January 2, 2017
    Publication date: July 6, 2017
    Applicant: nLIGHT, Inc.
    Inventors: Adam Dittli, Ken Gross
  • Publication number: 20170129054
    Abstract: A method includes generating at least one laser passivation pulse with process parameters selected to passivate an area of a metal target, and directing the at least one laser passivation pulse to the area in order to produce a passivation layer. Another method further includes, prior to laser passivation, generating at least one laser ablation pulse with process parameters selected to ablate metal from the area of the target, and directing the at least one laser ablation pulse to the area so as to ablate the metal and to provide the area for laser passivation.
    Type: Application
    Filed: November 11, 2016
    Publication date: May 11, 2017
    Applicant: nLIGHT, Inc.
    Inventor: Adam Dittli
  • Patent number: 9537042
    Abstract: A method for processing a transparent substrate includes generating at least one laser pulse having laser parameters selected for non-ablatively changing a conductive layer disposed on the transparent substrate into a non-conductive feature, and directing the pulse to said conductive layer. A protective film may be affixed to a surface of the transparent substrate and need not be removed during the processing of the substrate. After processing, processed areas can be visually indistinguishable from unprocessed areas.
    Type: Grant
    Filed: September 18, 2013
    Date of Patent: January 3, 2017
    Assignee: nLIGHT, Inc.
    Inventors: Adam Dittli, Robert J. Martinsen, Ken Gross
  • Publication number: 20160001402
    Abstract: A processing system directs a laser beam to a composite including a substrate, a conductive layer, and a conductive border. The location of a focus of the laser beam can be controlled to bring the laser beam into focus on the surfaces of the conductive materials. The laser beam can be used to ablatively process the conductive border and non-ablatively process the conductive layer by translating a focus-adjust optical system so as to vary laser beam diameter.
    Type: Application
    Filed: February 21, 2014
    Publication date: January 7, 2016
    Applicant: nLIGHT Photonics Corporation
    Inventors: Robert J. Martinsen, Adam Dittli, Ken Gross
  • Publication number: 20150376756
    Abstract: A method of non-ablatively laser patterning a multi-layer structure, the multi-layer structure including a substrate, a first layer disposed on the substrate, a second layer disposed on the first layer, and a third layer disposed on the second layer, the method including generating at least one laser pulse having laser parameters selected for non-ablatively changing the conductivity a selected portion of the third layer such that the selected portion becomes non-conductive, and directing the pulse to the multi-layer structure, wherein the conductivity of the first layer is not substantially changed by the pulse.
    Type: Application
    Filed: February 21, 2014
    Publication date: December 31, 2015
    Applicant: nLIGHT Photonics Corporation
    Inventors: Adam Dittli, Robert J. Martinsen
  • Publication number: 20140230967
    Abstract: A method for processing a transparent substrate includes generating at least one laser pulse having laser parameters selected for non-ablatively changing a conductive layer disposed on the transparent substrate into a non-conductive feature, and directing the pulse to said conductive layer. A protective film may be affixed to a surface of the transparent substrate and need not be removed during the processing of the substrate. After processing, processed areas can be visually indistinguishable from unprocessed areas.
    Type: Application
    Filed: September 18, 2013
    Publication date: August 21, 2014
    Applicant: nLIGHT Photonics Corporation
    Inventors: Adam Dittli, Robert J. Martinsen, Ken Gross