Patents by Inventor Adam F. Hannon

Adam F. Hannon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8966411
    Abstract: This disclosure relates generally to systems and methods of providing standardized topographical configurations for template regions. In one embodiment, a set of array arrangements is selected. Arrays of template structures are then formed on at least one substrate. Each of the arrays is arranged in accordance with an array arrangement in the set of array arrangements such that the arrays correspond surjectively onto the set of array arrangements. After the arrays are formed, a self-assembly material is provided on the arrays. Self-assembly patterns formed by self-assembling material as a result of the arrays may be empirically observed and used to map a set of self-assembly pattern arrangements surjectively onto the set of array arrangements. Using this mapping, a combination of the self-assembly pattern arrangements that match a target pattern arrangement can be used to select a combination of array arrangements from the set of array arrangements for a template region.
    Type: Grant
    Filed: May 22, 2013
    Date of Patent: February 24, 2015
    Assignee: Massachusetts Institute of Technology
    Inventors: Jae-Byum Chang, Hong Kyoon Choi, Adam F. Hannon, Caroline A. Ross, Karl K. Berggren
  • Publication number: 20130318483
    Abstract: This disclosure relates generally to systems and methods of providing standardized topographical configurations for template regions. In one embodiment, a set of array arrangements is selected. Arrays of template structures are then formed on at least one substrate. Each of the arrays is arranged in accordance with an array arrangement in the set of array arrangements such that the arrays correspond surjectively onto the set of array arrangements. After the arrays are formed, a self-assembly material is provided on the arrays. Self-assembly patterns formed by self-assembling material as a result of the arrays may be empirically observed and used to map a set of self-assembly pattern arrangements surjectively onto the set of array arrangements. Using this mapping, a combination of the self-assembly pattern arrangements that match a target pattern arrangement can be used to select a combination of array arrangements from the set of array arrangements for a template region.
    Type: Application
    Filed: May 22, 2013
    Publication date: November 28, 2013
    Applicant: Massachusetts Institure of Technology
    Inventors: Jae-Byum Chang, Hong Kyoon Choi, Adam F. Hannon, Caroline A. Ross, Karl K. Berggren