Abstract: A multi channel beamsplitter system operating over a wide spectral band has high optical performance despite the fact that the incoming and/or exiting light is not collimated and its material is dispersive. This is achieved using wavefront compensators that are matched to the curvature of the wavefronts of the incoming and/or exiting light.

Abstract: A multi channel beamsplitter system operating over a wide spectral band has high optical performance despite the fact that the incoming and/or exiting light is not collimated and its material is dispersive. This is achieved using wavefront compensators that are matched to the curvature of the wavefronts of the incoming and/or exiting light.

Abstract: A lithographic tool system for generating an interferometric pattern of light using a plurality of exposure beams includes a processor coupled to a positioning device. The processor receives a selected period for the interferometric pattern of light, and generates an angular control signal and a translational control signal in response to the selected period. The positioning device translates an exposure beam in response to the translational control signal, and rotates the exposure beam in response to the angular control signal.

Abstract: A method and apparatus for interference lithography utilize a fiber having a cladding region with axially formed holes surrounding a core region. The fiber emits an optical signal to perform interference lithography. A number of alternative variations in the size and arrangement of axially formed holes produces fibers having characteristics particularly adapted for receiving, communicating, and emitting optical signals for interference lithography.

Abstract: A polarization vector alignment technique for interference lithography generates a control signal indicating a difference in orientation between a polarization state of an emitted optical signal and a desired linear polarization vector. The technique adjusts the linear polarization vector to enhance the quality of the pattern produced for interference lithography.

Abstract: A method and apparatus for interference lithography utilize a fiber having a cladding region with axially formed holes surrounding a core region. The fiber emits an optical signal to perform interference lithography. A number of alternative variations in the size and arrangement of axially formed holes produces fibers having characteristics particularly adapted for receiving, communicating, and emitting optical signals for interference lithography.

Abstract: A holographic lithography tool (110) for generating a light interference pattern used to expose a photosensitive medium (119) employs a refracting prism (121) in the optical path between divergent illuminating beams (127a, 127b). The prism is optically coupled to the photosensitive medium via an index matching fluid (123). By increasing the incident beam angle and the index of refraction, the prism reduces the size of features recorded in the photosensitive material. The divergent illuminating beams are generated by a beam delivery system which preferably employs easily adjustable fiber optic cables (176, 184). Use of the prism coupling technique facilitates use of fiber-optic-compatible wavelengths in the blue region of the spectrum in a variety of applications, such a distributed feedback grating fabrication.