Patents by Inventor Adam Fennimore

Adam Fennimore has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140349431
    Abstract: There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer including a fluorinated material and having a first surface energy; treating the first layer with a priming layer; exposing the priming layer patternwise with radiation having a wavelength greater than 300 nm, resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from the unexposed areas resulting in a first layer having a patterned priming layer, wherein the patterned priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid deposition on the patterned priming layer on the first layer. The priming layer includes an aromatic amine compound and a photoinitiator.
    Type: Application
    Filed: December 20, 2012
    Publication date: November 27, 2014
    Applicant: EI DU PONT DE NEMOURS AND COMPANY
    Inventors: Adam Fennimore, Steven R. MacKara
  • Patent number: 8890131
    Abstract: This invention relates to deuterated aryl-anthracene compounds that are useful in electronic applications. It also relates to electronic devices in which the active layer includes such a deuterated compound.
    Type: Grant
    Filed: March 6, 2013
    Date of Patent: November 18, 2014
    Assignee: E I du Pont de Nemours and Company
    Inventors: Daniel David Lecloux, Adam Fennimore, Weiying Gao, Nora Sabina Radu, Weishi Wu, Vsevolod Rostovtsev, Michael Henry Howard, Jr., Hong Meng, Yulong Shen, Jeffrey A Merlo, Eric Maurice Smith
  • Patent number: 8889269
    Abstract: A compound having Formula I, Formula II, or Formula III: Ar1 may independently be phenylene, substituted phenylene, naphthylene, or substituted naphthylene. Ar2 is the same or different at each occurrence and is an aryl group. M is the same or different at each occurrence and is a conjugated moiety. T1 and T2 are independently the same or different at each occurrence and are conjugated moieties which are connected in a non-planar configuration; a and e are the same or different at each occurrence and are an integer from 1 to 6; b, c, and d are mole fractions such that b+c+d=1.0, with the proviso that c is not zero, and at least one of b and d is not zero, and when b is zero, M has at least two triarylamine units; and n is an integer greater than 1.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: November 18, 2014
    Assignee: E I du Pont de Nemours and Company
    Inventors: Gary A. Johansson, Eric Maurice Smith, Reid John Chesterfield, Michael Henry Howard, Jr., Kyung-Ho Park, Nora Sabina Radu, Gene M. Rossi, Frederick P. Gentry, Troy C. Gehret, Daniel David Lecloux, Adam Fennimore
  • Patent number: 8778785
    Abstract: There is provided a process for forming a layer of electroactive material having a substantially flat profile. The process includes the steps of providing a workpiece having at least one active area; depositing a liquid composition including the electroactive material onto the workpiece in the active area, to form a wet layer; treating the wet layer on the workpiece at a controlled temperature in the range of ?25 to 80° C. and under a vacuum in the range of 10?6 to 1,000 Torr, for a first period of 1-100 minutes, to form a partially dried layer; and heating the partially dried layer to a temperature above 100° C. for a second period of 1-50 minutes to form a dried layer.
    Type: Grant
    Filed: May 15, 2009
    Date of Patent: July 15, 2014
    Assignee: E I du Pont de Nemours and Company
    Inventors: Reid John Chesterfield, Nugent Truong, Jeffrey A. Merlo, Adam Fennimore, Jonathan M. Ziebarth
  • Patent number: 8759818
    Abstract: This invention relates to deuterated aryl-anthracene compounds that are useful in electronic applications. It also relates to electronic devices in which the active layer includes such a deuterated compound.
    Type: Grant
    Filed: December 21, 2009
    Date of Patent: June 24, 2014
    Assignee: E I du Pont de Nemours and Company
    Inventors: Daniel David LeCloux, Adam Fennimore, Weiying Gao, Nora Sabina Radu, Weishi Wu, Vsevolod Rostovtsev, Michael Henry Howard, Jr., Hong Meng, Yulong Shen, Jeffrey A. Merlo, Eric Maurice Smith
  • Publication number: 20140131684
    Abstract: An electronic device includes a backplane having a layer of an organic hole injection material disposed thereon. Some areas of the hole injection material having a first predetermined surface energy while selected other areas of the layer of hole injection material have a second, lower, predetermined surface energy associated therewith. The selected other areas of lower surface energy are produced by heating of these areas by exposure of the selected other areas to radiation, such as from a laser. A layer of a composition including an organic hole transport material disposed directly on at least some of the areas of the layer of the hole injection material having the first, higher, predetermined surface energy.
    Type: Application
    Filed: November 8, 2013
    Publication date: May 15, 2014
    Applicant: E I DU PONT DE NEMOURS AND COMPANY
    Inventors: Shiva Prakash, Stephen Sorich, Adam Fennimore
  • Patent number: 8652655
    Abstract: A compound having Formula I, Formula II, or Formula III: Ar1 may independently be phenylene, substituted phenylene, naphthylene, or substituted naphthylene. Ar2 is the same or different at each occurrence and is an aryl group. M is the same or different at each occurrence and is a conjugated moiety. T1 and T2 are independently the same or different at each occurrence and are conjugated moieties which are connected in a non-planar configuration.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: February 18, 2014
    Assignee: E I du Pont de Nemours and Company
    Inventors: Gary A. Johansson, Eric Maurice Smith, Reid John Chesterfield, Michael Henry Howard, Jr., Kyung-Ho Park, Nora Sabina Radu, Gene M. Rossi, Frederick P. Gentry, Troy C. Gehret, Daniel David Lecloux, Adam Fennimore
  • Publication number: 20140034941
    Abstract: There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer having a first surface energy; treating the first layer with a priming layer; exposing the priming layer patternwise with radiation resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from either the exposed areas or the unexposed areas resulting in a first layer having a pattern of priming layer, wherein the pattern of priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid depositions on the pattern of priming layer on the first layer. There is also provided an organic electronic device made by the process.
    Type: Application
    Filed: October 14, 2013
    Publication date: February 6, 2014
    Applicant: E I Du Pont De Nemours And Company
    Inventors: ADAM FENNIMORE, Jonathan M. Ziebarth, Nora Sabina Radu
  • Patent number: 8617720
    Abstract: There is provided an electroactive composition including: a deuterated first host material and an electroluminescent dopant material. The first host is a compound having Formula I: The compound of Formula I is deuterated. In Formula I: Ar1 to Ar4 are the same or different and are aryl; Q is a multivalent aryl group or where T is (CR?)a, SiR2, S, SO2, PR, PO, PO2, BR, or R; R is the same or different at each occurrence and is an alkyl group or an ary group; R? is the same or different at each occurrence and is selected H, D, or alkyl; a is an integer from 1-6; and m is an integer from 0-6.
    Type: Grant
    Filed: December 21, 2009
    Date of Patent: December 31, 2013
    Assignee: E I du Pont de Nemours and Company
    Inventors: Michael Henry Howard, Jr., Nora Sabina Radu, Weishi Wu, Weiying Gao, Norman Herron, Eric Maurice Smith, Christina M. Older, Adam Fennimore, Ying Wang, Daniel David Lecloux, Kalindi Dogra, Vsevolod Rostovtsev, Jerald Feldman, Siddhartha Shenoy
  • Publication number: 20130323880
    Abstract: There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer having a first surface energy; treating the first layer with a priming material to form a priming layer; exposing the priming layer patternwise with radiation resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from the unexposed areas resulting in a first layer having a pattern of developed priming layer, wherein the pattern of developed priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid depositions on the pattern of developed priming layer on the first layer.
    Type: Application
    Filed: February 10, 2012
    Publication date: December 5, 2013
    Applicant: EI Du Pont De Nemours and Company
    Inventors: Nora Sabina Radu, Kyung-Ho Park, Adam Fennimore, Kerwin D. Dobbs
  • Patent number: 8592239
    Abstract: There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer having a first surface energy; treating the first layer with a priming layer; exposing the priming layer patternwise with radiation resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from either the exposed areas or the unexposed areas resulting in a first layer having a pattern of priming layer, wherein the pattern of priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid depositions on the pattern of priming layer on the first layer. There is also provided an organic electronic device made by the process.
    Type: Grant
    Filed: December 21, 2009
    Date of Patent: November 26, 2013
    Assignee: E I du Pont de Nemours and Company
    Inventors: Adam Fennimore, Jonathan M. Ziebarth, Nora Sabina Radu
  • Publication number: 20130299801
    Abstract: This invention relates to deuterated compounds that are useful in electroluminescent applications. It also relates to electronic devices in which the active layer includes such a deuterated compound.
    Type: Application
    Filed: July 18, 2013
    Publication date: November 14, 2013
    Inventors: NORMAN HERRON, Vsevolod Rostovtsev, Jeffrey A. Merlo, Michael Henry Howard, JR., Adam Fennimore, Weiying Gao, Kalindi Dogra, Nora Sabina Radu, Weishi Wu, Eric Maurice Smith, Daniel David Lecloux
  • Publication number: 20130299800
    Abstract: There is provided a process for forming a layer of electroactive material having a substantially flat profile. The process includes the steps of providing a workpiece having at least one active area; depositing a liquid composition including the electroactive material onto the workpiece in the active area, to form a wet layer; treating the wet layer on the workpiece at a controlled temperature in the range of ?25 to 80° C. and under a vacuum in the range of 10?6 to 1,000 Torr, for a first period of 1-100 minutes, to form a partially dried layer; and heating the partially dried layer to a temperature above 100° C. for a second period of 1-50 minutes to form a dried layer.
    Type: Application
    Filed: July 18, 2013
    Publication date: November 14, 2013
    Inventors: Reid John Chesterfield, Nugent Truong, Jeffrey A. Merlo, Adam Fennimore, Jonathan M. Ziebarth
  • Publication number: 20130264561
    Abstract: This invention relates to a composition including (a) a dopant, (b) a first host having at least one unit of Formula I, and (c) a second host compound. Formula I has the structure In Formula I: Ar1, Ar2, and Ar3 are the same or different and are H, D, or aryl groups. At least two of Ar1, Ar2, and Ar3 are aryl and none of Ar1, Ar2, and Ar3 includes an indolocarbazole moiety.
    Type: Application
    Filed: December 19, 2011
    Publication date: October 10, 2013
    Applicant: E I DU PONT DE NEMOURS AND COMPANY
    Inventors: Kerwin D. Dobbs, Adam Fennimore, Weiying Gao, Mark A. Guidry, Norman Herron, Nora Sabina Radu, Gene M. Rossi, Gabriel C. Schumacher
  • Publication number: 20130264560
    Abstract: There is provided a compound having at least one unit of Formula I where Ar1, Ar2, and Ar3 are the same or different and have Formula II In Formula II: R1 is the same or different at each occurrence and is D, alkyl, or silyl, or adjacent R1 groups can be joined together to form a 6-membered fused aromatic ring; Q is the same or different at each occurrence and is phenyl, naphthyl, substituted naphthyl, an N,O,S-heterocycle, or a deuterated analog thereof; a is an integer from 1-5; b is an integer from 0-5, with the proviso that when b=5, c=0; and c is an integer from 0-4. In the compound not all Ar1, Ar2, and Ar3 are the same.
    Type: Application
    Filed: December 19, 2011
    Publication date: October 10, 2013
    Applicant: E I DU PONT DE NEMOURS AND COMPANY
    Inventors: Kerwin D. Dobbs, Adam Fennimore, Weiying Gao, Mark A Guidry, Norman Herron, Nora Sabina Radu, Gene M Rossi, Gabriel C Schumacher
  • Publication number: 20130256646
    Abstract: There is provided a compound having Formula I or Formula II In Formula I: R1-R4 are the same or different and are H, D, alkyl, silyl, alkoxy, cyano or aryl. At least two of R1-R4 are aryl groups and at least one aryl group includes an N,O,S-heterocycle. When two of R1-R4 include N-carbazolyl groups, two of R1-R4 are not aryl; In Formula II: Q is a single bond or a hydrocarbon aryl; and R5 and R6 are the same or different at each occurrence and are H, D, alkyl, silyl, alkoxy, cyano or aryl. At least one of R5 and at least one of R6 are an aryl group. At least one aryl group includes an N,O,S-heterocycle.
    Type: Application
    Filed: December 20, 2011
    Publication date: October 3, 2013
    Applicant: E I DU Pont De Nemours and Company
    Inventors: Adam Fennimore, Michael Henry Howard, JR.
  • Publication number: 20130248849
    Abstract: This invention relates to a composition including (a) a dopant, (b) a first host having at least one unit of Formula I, and (c) a second host compound. Formula I has the structure where Q is a fused ring linkage having the formula In Formula I: R1 is the same or different at each occurrence and is D, alkyl, aryl, silyl, alkoxy, aryloxy, cyano, vinyl, or allyl; R2 is the same or different at each occurrence and is H, D, alkyl, or aryl, or both R2 are an N-heterocycle; R3 is the same or different at each occurrence and is H, D, cyano, alkyl or aryl; and a is the same or different at each occurrence and is an integer from 0-4.
    Type: Application
    Filed: December 19, 2011
    Publication date: September 26, 2013
    Applicant: E I DuPont De Nemours and Company
    Inventors: Jerals Feldman, Norman Herron, Michael Henry Howard, JR., Nora Sabina Radu, Vsevolod Rostovtsev, Kerwin D. Dobbs, Adam Fennimore, Weiying Gao, Weishi Wu, Ying Wang, Charles D. Mclaren
  • Publication number: 20130248848
    Abstract: There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer having a first surface energy; treating the first layer with a priming material to form a priming layer; exposing the priming layer patternwise with radiation resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from the unexposed areas resulting in a first layer having a pattern of priming layer, wherein the pattern of priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid depositions on the pattern of priming layer on the first layer.
    Type: Application
    Filed: December 19, 2011
    Publication date: September 26, 2013
    Applicant: E.I. Du Pont Nemours and Company
    Inventors: Nora Sabina Radu, Adam Fennimore
  • Publication number: 20130248847
    Abstract: There is disclosed a compound having Formula I In Formula I: Ar1 through Ar4 are the same or different and are aryl groups; L is a spiro group, an adamantyl group, bicyclic cyclohexyl, deuterated analogs thereof, or substituted derivatives thereof; R1 is the same or different at each occurrence and is D, F, alkyl, aryl, alkoxy, silyl, or a crosslinkable group, where adjacent R1 groups can be joined together to form an aromatic ring; R2 is the same or different at each occurrence and is H, D, or halogen; a is the same or different at each occurrence and is an integer from 0-4; and n is an integer greater than 0.
    Type: Application
    Filed: December 19, 2011
    Publication date: September 26, 2013
    Applicant: E I DU PONT DE NEMOURS AND COMPANY
    Inventors: Nora Sabina Radu, Adam Fennimore
  • Publication number: 20130240866
    Abstract: There is provided a compound having Formula I or Formula II where: Ar1—Ar4 are the same or different and are H, D, or aryl.
    Type: Application
    Filed: December 12, 2011
    Publication date: September 19, 2013
    Applicant: E I DU PONT DE NEMOURS AND COMPANY
    Inventors: Kalindi Dogra, Adam Fennimore, Christina M. Older, Robert A. Eakin