Patents by Inventor Adam J. Regner, III

Adam J. Regner, III has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7875110
    Abstract: An electroless plating composition comprising succinic acid, potassium carbonate, a source of cobalt metal ions, a reducing agent, and water is provided. An optional buffering agent may also be included in the composition. The composition may be used to deposit cobalt metal in or on semiconductor substrate surfaces including vias, trenches, and interconnects.
    Type: Grant
    Filed: February 16, 2010
    Date of Patent: January 25, 2011
    Assignee: Micron Technology, Inc.
    Inventors: Rita J. Klein, Adam J. Regner, III
  • Publication number: 20100144144
    Abstract: An electroless plating composition comprising succinic acid, potassium carbonate, a source of cobalt metal ions, a reducing agent, and water is provided. An optional buffering agent may also be included in the composition. The composition may be used to deposit cobalt metal in or on semiconductor substrate surfaces including vias, trenches, and interconnects.
    Type: Application
    Filed: February 16, 2010
    Publication date: June 10, 2010
    Inventors: Rita J. Klein, Adam J. Regner, III
  • Patent number: 7686874
    Abstract: An electroless plating composition comprising succinic acid, potassium carbonate, a source of cobalt metal ions, a reducing agent, and water is provided. An optional buffering agent may also be included in the composition. The composition may be used to deposit cobalt metal in or on semiconductor substrate surfaces including vias, trenches, and interconnects.
    Type: Grant
    Filed: June 28, 2005
    Date of Patent: March 30, 2010
    Assignee: Micron Technology, Inc.
    Inventors: Rita J. Klein, Adam J. Regner, III
  • Patent number: 5979054
    Abstract: A method of forming a sidewall for a reactor for oxidizing volatile or semi-volatile organic compounds, the sidewall being reactive with gaseous oxidation products produced by the oxidation of the volatile or semi-volatile organic compounds, includes, i) providing a dry mixture of material comprising by weight: from about 23% to 35% cement; from about 30% to 45% added CaO; from about 6% to 20% added Ca(OH).sub.2 ; and from about 10% to 25 % added CaSO.sub.4 ; ii) combining the dry mixture of material with water and forming a slurry therefrom; iii) forming the slurry into a desired reactor sidewall shape; and iv) hardening the shaped slurry into a hardened cement reactor sidewall.
    Type: Grant
    Filed: September 24, 1997
    Date of Patent: November 9, 1999
    Assignee: Process Technologies, Inc.
    Inventors: Theodore S. Weigold, Adam J. Regner, III, John D. Ferrell
  • Patent number: 5707595
    Abstract: A method of forming a sidewall for a reactor for oxidizing volatile or semi-volatile organic compounds, the sidewall being reactive with gaseous oxidation products produced by the oxidation of the volatile or semi-volatile organic compounds, includes, i) providing a dry mixture of material comprising by weight: from about 23% to 35% cement; from about 30% to 45% added CaO; from about 6% to 20% added Ca(OH).sub.2 ; and from about 10% to 25% added CaSO.sub.4 ; ii) combining the dry mixture of material with water and forming a slurry therefrom; iii) forming the slurry into a desired reactor sidewall shape; and iv) hardening the shaped slurry into a hardened cement reactor sidewall. An apparatus for photochemically oxidizing gaseous volatile or semi-volatile organic compounds includes a reactor vessel comprising sidewalls having at least one baffle.
    Type: Grant
    Filed: November 22, 1996
    Date of Patent: January 13, 1998
    Assignee: Process Technologies, Inc.
    Inventors: Theodore S. Weigold, Adam J. Regner, III, John D. Ferrell