Abstract: A method of controlling blister formation in a glass melt flowing through a system comprising one or more refractory metal vessels by developing a blister index and determining the critical blister index value. The critical value of the blister index may be used to control the principal variables responsible for blister formation, including the water content of the melt, the concentration of reduced multivalent oxide compounds in the melt, and the hydrogen partial pressure of an atmosphere in contact with the outside surface of the refractory metal vessel. Also disclosed is a minimum partial pressure of hydrogen necessary to produce an essentially blister-free glass article in a glass essentially free of arsenic and antimony.

Abstract: A method of controlling blister formation in a glass melt flowing through a system comprising one or more refractory metal vessels by developing a blister index and determining the critical blister index value. The critical value of the blister index may be used to control the principal variables responsible for blister formation, including the water content of the melt, the concentration of reduced multivalent oxide compounds in the melt, and the hydrogen partial pressure of an atmosphere in contact with the outside surface of the refractory metal vessel. Also disclosed is a minimum partial pressure of hydrogen necessary to produce an essentially blister-free glass article in a glass essentially free of arsenic and antimony.

Abstract: Alkali-free glasses are disclosed which can be used to produce substrates for flat panel display devices, e.g., active matrix liquid crystal displays (AMLCDs). The glasses contain iron and tin as fining agents, and preferably are substantially free of arsenic and antimony. In certain embodiments, the glasses are also substantially free of barium. Methods for producing alkali-free glass sheets using a downdraw process (e.g., a fusion process) are also disclosed.

Abstract: Alkali-free glasses are disclosed which can be used to produce substrates for flat panel display devices, e.g., active matrix liquid crystal displays (AMLCDs). The glasses contain iron and tin as fining agents, and preferably are substantially free of arsenic and antimony. In certain embodiments, the glasses are also substantially free of barium. Methods for producing alkali-free glass sheets using a downdraw process (e.g., a fusion process) are also disclosed.

Abstract: Alkali-free glasses are disclosed which can be used to produce substrates for flat panel display devices, e.g., active matrix liquid crystal displays (AMLCDs). The glasses contain iron and tin as fining agents, and preferably are substantially free of arsenic and antimony. In certain embodiments, the glasses are also substantially free of barium. Methods for producing alkali-free glass sheets using a downdraw process (e.g., a fission process) are also disclosed.

Abstract: Alkali-free glasses are disclosed which can be used to produce substrates for flat panel display devices, e.g., active matrix liquid crystal displays (AMLCDs). The glasses contain iron and tin as fining agents, and preferably are substantially free of arsenic and antimony. In certain embodiments, the glasses are also substantially free of barium. Methods for producing alkali-free glass sheets using a downdraw process (e.g., a fission process) are also disclosed.

Abstract: Alkali-free glasses are disclosed which can be used to produce substrates for flat panel display devices, e.g., active matrix liquid crystal displays (AMLCDs). The glasses contain iron and tin as fining agents, and preferably are substantially free of arsenic and antimony. In certain embodiments, the glasses are also substantially free of barium. Methods for producing alkali-free glass sheets using a downdraw process (e.g., a fusion process) are also disclosed.

Abstract: A method of forming an oxide glass including heating a glass melt having a ?—OH concentration of at least about 0.35 in a vessel comprising a metal selected from the group consisting of platinum, molybdenum, palladium, rhodium, and alloys thereof, there being an interface present between the vessel and the glass, and controlling a partial pressure of hydrogen in an atmosphere in contact with an outside surface of the vessel in an amount such that hydrogen permeation blisters form in a region of the glass adjacent the glass-vessel interface.

Abstract: Alkali-free glasses are disclosed which can be used to produce substrates for flat panel display devices, e.g., active matrix liquid crystal displays (AMLCDs). The glasses contain iron and tin as fining agents, and preferably are substantially free of arsenic and antimony. In certain embodiments, the glasses are also substantially free of barium. Methods for producing alkali-free glass sheets using a downdraw process (e.g., a fusion process) are also disclosed.

Abstract: The present invention relates to a boroaluminosilicate glass which exhibits excellent UV transmission. In particular, the present invention is directed at an alkali fluorine-doped boroaluminosilicate glass comprising, in mole percent on the oxide basis, of 30-80% SiO2, 1-20% Al2(O, F2)3, 5-35% B2O3, 5-20% R2O, where R is Li, Na, K, Rb or Cs, and an amount of up to 12% of F. The glass possesses an R/Al molar ratio of between 0.4 to 3 and an F/O molar ratio of no greater than 0.35. The alkali fluorine-doped boroaluminosilicate glass of the present invention exhibits a UV transmission at 300 nm, of greater than 80%/mm.

Abstract: An aluminum titanate ceramic article having a predominant crystal phase of aluminum titanate and a material composition including aluminum, titanium, silica, an alkaline earth metal (e.g., at least one selected from the group of strontium, calcium, barium, or combinations), and a rare earth metal (e.g., at least one selected from the group consisting of yttrium, lanthanum, and combinations) and methods of making such aluminum titanate bodies are described. An oxide of yttrium metal or lanthanide metals is preferably used as a sintering aid in combination with the other compositional components to enable firing of the resulting green body at a lower heating temperature of less than 1500° C., and more preferably between 1400°-1450° C., with a preferable hold time of less than 8 hours, more preferably of 6 to 8 hours.