Patents by Inventor Adam Jan URBANCZYK

Adam Jan URBANCZYK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD OF DETERMINING A PERFORMANCE PARAMETER DISTRIBUTION
    Publication number: 20240402618
    Abstract: A method of determining a performance parameter distribution and/or associated quantile function. The method includes obtaining a quantile function prediction model operable to predict a quantile value for a substrate position and given quantile probability such that the predicted quantile values vary monotonically as a function of quantile probability and using the trained quantile 5 function prediction model to predict quantile values for a plurality of different quantile probabilities for one or more locations on the substrate.
    Type: Application
    Filed: September 30, 2022
    Publication date: December 5, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Vahid BASTANI, Raoul Maarten Simon KNOPS, Thomas THEEUWES, Adam Jan URBANCZYK, Jochem Sebastiaan WILDENBERG, Robert Jan VAN WIJK
  • METHOD AND APPARATUS FOR DETERMINING CONTROL DATA FOR A LITHOGRAPHIC APPARATUS
    Publication number: 20220413391
    Abstract: A method for determining an input to a lens model to determine a setpoint for manipulation of a lens of a lithographic apparatus when addressing at least one of a plurality of fields of a substrate, the method including: receiving parameter data for the at least one field, the parameter data relating to one or more parameters of the substrate within the at least one field, the one or more parameters being at least partially sensitive to manipulation of the lens as part of an exposure performed by the lithographic apparatus; receiving lens model data relating to the lens; and determining the input based on the parameter data and on the lens model data.
    Type: Application
    Filed: October 15, 2020
    Publication date: December 29, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Michel Alphons Theodorus VAN HINSBERG, James Robert DOWNES, Erwin Josef Maria VERDURMEN, Jacob Fredrik Friso KLINKHAMER, Roy WERKMAN, Jochem Sebastiaan WILDENBERG, Adam Jan URBANCZYK, Lucas Jan Joppe VISSER
  • Method to change an etch parameter
    Patent number: 11300887
    Abstract: A method to change an etch parameter of a substrate etching process, the method including: making a first measurement of a first metric associated with a structure on a substrate before being etched; making a second measurement of a second metric associated with a structure on a substrate after being etched; and changing the etch parameter based on a difference between the first measurement and the second measurement.
    Type: Grant
    Filed: November 6, 2017
    Date of Patent: April 12, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Richard Johannes Franciscus Van Haren, Victor Emanuel Calado, Leon Paul Van Dijk, Roy Werkman, Everhardus Cornelis Mos, Jochem Sebastiaan Wildenberg, Marinus Jochemsen, Bijoy Rajasekharan, Erik Jensen, Adam Jan Urbanczyk
  • Metrology method and apparatus and associated computer product
    Patent number: 10551750
    Abstract: Disclosed is a process monitoring method, and an associated metrology apparatus.
    Type: Grant
    Filed: April 24, 2019
    Date of Patent: February 4, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Adam Jan Urbanczyk, Hans Van Der Laan, Grzegorz Grzela, Alberto Da Costa Assafrao, Chien-Hung Tseng, Jay Jianhui Chen
  • A METHOD TO CHANGE AN ETCH PARAMETER
    Publication number: 20190285992
    Abstract: A method to change an etch parameter of a substrate etching process, the method including: making a first measurement of a first metric associated with a structure on a substrate before being etched; making a second measurement of a second metric associated with a structure on a substrate after being etched; and changing the etch parameter based on a difference between the first measurement and the second measurement.
    Type: Application
    Filed: November 6, 2017
    Publication date: September 19, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Richard Johannes Franciscus VAN HAREN, Victor Emanuel CALADO, Leon Paul VAN DIJK, Roy WERKMAN, Everhardus Cornelis MOS, Jochem Sebastiaan WILDENBERG, Marinus JOCHEMSEN, Bijoy RAJASEKHARAN, Erik JENSEN, Adam Jan URBANCZYK
  • Metrology Method and Apparatus and Associated Computer Product
    Publication number: 20190250520
    Abstract: Disclosed is a process monitoring method, and an associated metrology apparatus.
    Type: Application
    Filed: April 24, 2019
    Publication date: August 15, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Adam Jan URBANCZYK, Hans VAN DER LAAN, Grzegorz GRZELA, Alberto DA COSTA ASSAFRAO, Chien-Hung TSENG, Jay Jianhui CHEN