Patents by Inventor Adam L. Friedman

Adam L. Friedman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9312130
    Abstract: A method of introducing a bandgap in single layer graphite on a SiO2 substrate comprising the steps of preparing graphene flakes and CVD grown graphene films on a SiO2/Si substrate and performing hydrogenation of the graphene. Additionally, controlling the majority carrier type via surface adsorbates.
    Type: Grant
    Filed: July 15, 2013
    Date of Patent: April 12, 2016
    Assignee: The United States of America, as represented by the Secretary of the Navy
    Inventors: Jeffrey W. Baldwin, Bernard R. Matis, James S. Burgess, Felipe Bulat-Jara, Adam L. Friedman, Brian H Houston
  • Publication number: 20150299850
    Abstract: A method of making a graphene spin filter device by chemical vapor deposition comprising providing a first crystalline ferromagnetic metal surface, performing chemical vapor deposition and growing a graphene film on the first ferromagnetic metal surface, and depositing a second ferromagnetic film on the graphene film. A graphene spin filter device wherein the graphene is grown by chemical vapor deposition comprising a first crystalline ferromagnetic metal surface, a graphene film grown by chemical vapor deposition on the first ferromagnetic metal surface, and a second ferromagnetic film on the graphene film.
    Type: Application
    Filed: March 13, 2015
    Publication date: October 22, 2015
    Applicant: The Government of the United States of America, as represented by the Secretary of the Navy
    Inventors: Enrique Cobas, Olaf M. T. van 't Erve, Adam L. Friedman, Berend T. Jonker
  • Publication number: 20150303059
    Abstract: This disclosure describes a method of making a tunnel barrier-based electronic device, in which the tunnel barrier and transport channel are made of the same material—graphene. A homoepitaxial tunnel barrier/transport device is created using a monolayer chemically modified graphene sheet as a tunnel barrier on another monolayer graphene sheet. This device displays enhanced spintronic properties over heteroepitaxial devices and is the first to use graphene as both the tunnel barrier and channel.
    Type: Application
    Filed: February 24, 2015
    Publication date: October 22, 2015
    Applicant: The Government of the United States of America, as represented by the Secretary of the Navy
    Inventors: Adam L. Friedman, Olaf M. T. van 't Erve, Connie H. Li, Jeremy T. Robinson, Berend T. Jonker
  • Patent number: 9063063
    Abstract: A method of making a low-dimensional material chemical vapor sensor comprising exfoliating MoS2, applying the monolayer flakes of MoS2 onto a SiO2/Si wafer, applying a methylmethacrylate (MMA)/polymethylmethacrylate (PMMA) film, defining trenches for the deposition of metal contacts, and depositing one of Ti/Au, Au, and Pt in the trench and resulting in a MoS2 sensor. A low-dimensional material chemical vapor sensor comprising monolayer flakes of MoS2, trenches in the SiO2/Si wafer, metal contacts in the trenches, and thereby resulting in a MoS2 sensor. A full spectrum sensing suite comprising similarly fabricated parallel sensors made from a variety of low-dimensional materials including graphene, carbon nanotubes, MoS2, BN, and the family of transition metal dichalcogenides. The sensing suites are small, robust, sensitive, low-power, inexpensive, and fast in their response to chemical vapor analytes.
    Type: Grant
    Filed: November 8, 2013
    Date of Patent: June 23, 2015
    Assignee: The United States of America, as represented by the Secretary of the Navy
    Inventors: Adam L. Friedman, F. Keith Perkins, Enrique Cobas, Paul M Campbell, Glenn G. Jernigan, Berend T Jonker
  • Publication number: 20150083168
    Abstract: A medium strength, liquid solvent, spray brush station system gently cleans surfaces of components during nano- and microtronics processing in cleanroom facilities. This system includes intermediate strength, yet effective surface cleaning with minimal damage to subject nano and microtronics components. Moreover, the instrument is compatible with a cleanroom environment, and provides self contained, easily manageable disposition of the peripheral mess and waste resulting from the cleaning process.
    Type: Application
    Filed: April 4, 2014
    Publication date: March 26, 2015
    Applicant: US Gov't represented by Secretary of the Navy Chief of Naval Research ONR/NRL
    Inventors: Adam L. Friedman, David W. Zapotok
  • Publication number: 20140273259
    Abstract: A method of making a low-dimensional material chemical vapor sensor comprising exfoliating MoS2, applying the monolayer flakes of MoS2 onto a SiO2/Si wafer, applying a methylmethacrylate (MMA)/polymethylmethacrylate (PMMA) film, defining trenches for the deposition of metal contacts, and depositing one of Ti/Au, Au, and Pt in the trench and resulting in a MoS2 sensor. A low-dimensional material chemical vapor sensor comprising monolayer flakes of MoS2, trenches in the SiO2/Si wafer, metal contacts in the trenches, and thereby resulting in a MoS2 sensor. A full spectrum sensing suite comprising similarly fabricated parallel sensors made from a variety of low-dimensional materials including graphene, carbon nanotubes, MoS2, BN, and the family of transition metal dichalcogenides. The sensing suites are small, robust, sensitive, low-power, inexpensive, and fast in their response to chemical vapor analytes.
    Type: Application
    Filed: November 8, 2013
    Publication date: September 18, 2014
    Applicant: The Government of the United States of America, as represented by the Secretary of the Navy
    Inventors: Adam L. Friedman, F. Keith Perkins, Enrique Cobas, Paul M. Campbell, Glenn G. Jernigan, Berend T. Jonker
  • Publication number: 20140080295
    Abstract: A method of introducing a bandgap in single layer graphite on a SiO2 substrate comprising the steps of preparing graphene flakes and CVD grown graphene films on a SiO2/Si substrate and performing hydrogenation of the graphene. Additionally, controlling the majority carrier type via surface adsorbates.
    Type: Application
    Filed: July 15, 2013
    Publication date: March 20, 2014
    Applicant: The Government of the US, as represented by the Secretary of the Navy
    Inventors: Jeffrey W. Baldwin, Bernard R. Matis, James S. Burgess, Felipe Bulat-Jara, Adam L. Friedman, Brian H. Houston