Patents by Inventor Adam M. McLaughlin

Adam M. McLaughlin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11251010
    Abstract: A system for extending the life of a repeller in an IHC ion source is disclosed. The system includes an IHC ion source wherein the back surface of the repeller has been shaped to reduce the possibility of electrical shorts. The separation distance between the back surface of the repeller and the chamber wall behind the repeller is increased along its outer edge, as compared to the separation distance near the center of the repeller. This separation distance reduces the possibility that deposited material will flake and short the repeller to the chamber wall. Further, in certain embodiments, the separation distance between the back surface of the repeller and the chamber wall near the center of the repeller is unchanged, so as to minimize the flow of gas that exits from the chamber. The back surface of the repeller may be tapered, stepped or arced to achieve these criteria.
    Type: Grant
    Filed: July 27, 2021
    Date of Patent: February 15, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Alexander S. Perel, Jay S. Johnson, Suren Madunts, Adam M. McLaughlin, Graham Wright
  • Patent number: 11239040
    Abstract: An ion source having a thermally isolated repeller is disclosed. The repeller comprises a repeller disk and a plurality of spokes originating at the back surface of the repeller disk and terminating in a post. In certain embodiments, the post may be hollow through at least a portion of its length. The use of spokes rather than a central stem may reduce the thermal conduction from the repeller disk to the post. By incorporating a hollow post, the thermal conduction is further reduced. This configuration may increase the temperature of the repeller disk by more than 100° C. In certain embodiments, radiation shields are provided on the back surface of the repeller disk to reduce the amount of radiation emitted from the sides of the repeller disk. This may also help increase the temperature of the repeller. A similar design may be utilized for other electrodes in the ion source.
    Type: Grant
    Filed: October 23, 2020
    Date of Patent: February 1, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Adam M. McLaughlin, Craig R. Chaney, Jordan B. Tye
  • Publication number: 20210384004
    Abstract: Thermally isolated captive features disposed in various components of an ion implantation system are disclosed. Electrodes, such as repellers and side electrodes, may be constructed with a captive feature, which serves as the electrode stem. The electrode stem makes minimal physical contact with the electrode mass due to a gap disposed in the interior cavity which retains the flared head of the electrode stem. In this way, the temperature of the electrode mass may remain higher than would otherwise be possible as conduction is reduced. Further, this concept can be applied to workpiece holders. For example, a ceramic platen is manufactured with one or more captive fasteners which are used to affix the platen to a base. This may minimize the thermal conduction between the platen and the base, while providing an improved mechanical connection.
    Type: Application
    Filed: August 24, 2021
    Publication date: December 9, 2021
    Inventors: Adam M. McLaughlin, Jordan B. Tye
  • Publication number: 20210296077
    Abstract: Thermally isolated captive features disposed in various components of an ion implantation system are disclosed. Electrodes, such as repellers and side electrodes, may be constructed with a captive feature, which serves as the electrode stem. The electrode stem makes minimal physical contact with the electrode mass due to a gap disposed in the interior cavity which retains the flared head of the electrode stem. In this way, the temperature of the electrode mass may remain higher than would otherwise be possible as conduction is reduced. Further, this concept can be applied to workpiece holders. For example, a ceramic platen is manufactured with one or more captive fasteners which are used to affix the platen to a base. This may minimize the thermal conduction between the platen and the base, while providing an improved mechanical connection.
    Type: Application
    Filed: March 23, 2020
    Publication date: September 23, 2021
    Inventors: Adam M. McLaughlin, Jordan B. Tye
  • Patent number: 11127558
    Abstract: Thermally isolated captive features disposed in various components of an ion implantation system are disclosed. Electrodes, such as repellers and side electrodes, may be constructed with a captive feature, which serves as the electrode stem. The electrode stem makes minimal physical contact with the electrode mass due to a gap disposed in the interior cavity which retains the flared head of the electrode stem. In this way, the temperature of the electrode mass may remain higher than would otherwise be possible as conduction is reduced. Further, this concept can be applied to workpiece holders. For example, a ceramic platen is manufactured with one or more captive fasteners which are used to affix the platen to a base. This may minimize the thermal conduction between the platen and the base, while providing an improved mechanical connection.
    Type: Grant
    Filed: March 23, 2020
    Date of Patent: September 21, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Adam M. McLaughlin, Jordan B. Tye
  • Publication number: 20210074503
    Abstract: An ion source having a thermally isolated repeller is disclosed. The repeller comprises a repeller disk and a plurality of spokes originating at the back surface of the repeller disk and terminating in a post. In certain embodiments, the post may be hollow through at least a portion of its length. The use of spokes rather than a central stem may reduce the thermal conduction from the repeller disk to the post. By incorporating a hollow post, the thermal conduction is further reduced. This configuration may increase the temperature of the repeller disk by more than 100° C. In certain embodiments, radiation shields are provided on the back surface of the repeller disk to reduce the amount of radiation emitted from the sides of the repeller disk. This may also help increase the temperature of the repeller. A similar design may be utilized for other electrodes in the ion source.
    Type: Application
    Filed: October 23, 2020
    Publication date: March 11, 2021
    Inventors: Adam M. McLaughlin, Craig R. Chaney, Jordan B. Tye
  • Patent number: 10892136
    Abstract: A system for reducing clogging and deposition of feed gas on a gas tube entering an ion source chamber is disclosed. To lower the overall temperature of the gas tube, a gas bushing, made of a thermally isolating material, is disposed between the ion source chamber and the gas tube. The gas bushing is made of a thermally isolating material, such as titanium, quartz, boron nitride, zirconia or ceramic. The gas bushing has an inner channel in fluid communication with the ion source chamber and the gas tube to allow the flow of feed gas to the ion source chamber. The gas bushing may have a shape that is symmetrical, allowing it to be flipped to extend its useful life. In some embodiments, the gas tube may be in communication with a heat sink to maintain its temperature.
    Type: Grant
    Filed: August 13, 2018
    Date of Patent: January 12, 2021
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Craig R. Chaney, Adam M. McLaughlin
  • Patent number: 10854416
    Abstract: An ion source having a thermally isolated repeller is disclosed. The repeller comprises a repeller disk and a plurality of spokes originating at the back surface of the repeller disk and terminating in a post. In certain embodiments, the post may be hollow through at least a portion of its length. The use of spokes rather than a central stem may reduce the thermal conduction from the repeller disk to the post. By incorporating a hollow post, the thermal conduction is further reduced. This configuration may increase the temperature of the repeller disk by more than 100° C. In certain embodiments, radiation shields are provided on the back surface of the repeller disk to reduce the amount of radiation emitted from the sides of the repeller disk. This may also help increase the temperature of the repeller. A similar design may be utilized for other electrodes in the ion source.
    Type: Grant
    Filed: September 10, 2019
    Date of Patent: December 1, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Adam M. McLaughlin, Craig R. Chaney, Jordan B. Tye
  • Patent number: 10672634
    Abstract: The present disclosure describes a method and apparatus for determining whether components in a semiconductor manufacturing system are authorized for use in that system. By embedding an identification feature in the component, it is possible for a controller to determine whether that component is qualified for use in the system. Upon detection of an unauthorized component, the system may alert the user or, in certain embodiments, stop operating of the system. This identification feature is embedded in a component by using an additive manufacturing process that allows the identification feature to be embedded in the component without subjecting the identification feature to extreme temperatures.
    Type: Grant
    Filed: January 10, 2019
    Date of Patent: June 2, 2020
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Craig R. Chaney, Adam M. McLaughlin
  • Publication number: 20200051773
    Abstract: A system for reducing clogging and deposition of feed gas on a gas tube entering an ion source chamber is disclosed. To lower the overall temperature of the gas tube, a gas bushing, made of a thermally isolating material, is disposed between the ion source chamber and the gas tube. The gas bushing is made of a thermally isolating material, such as titanium, quartz, boron nitride, zirconia or ceramic. The gas bushing has an inner channel in fluid communication with the ion source chamber and the gas tube to allow the flow of feed gas to the ion source chamber. The gas bushing may have a shape that is symmetrical, allowing it to be flipped to extend its useful life. In some embodiments, the gas tube may be in communication with a heat sink to maintain its temperature.
    Type: Application
    Filed: August 13, 2018
    Publication date: February 13, 2020
    Inventors: Craig R. Chaney, Adam M. McLaughlin
  • Patent number: 10535499
    Abstract: A system that utilizes a component that controls thermal gradients and the flow of thermal energy by variation in density is disclosed. Methods of fabricating the component are also disclosed. The component is manufactured using additive manufacturing. In this way, the density of different regions of the component can be customized as desired. For example, a lattice pattern may be created in the interior of a region of the component to reduce the amount of material used. This reduces weight and also decreases the thermal conduction of that region. By using low density regions and high density regions, the flow of thermal energy can be controlled to accommodate the design constraints.
    Type: Grant
    Filed: November 3, 2017
    Date of Patent: January 14, 2020
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Adam M. McLaughlin, Craig R. Chaney
  • Publication number: 20190304738
    Abstract: A foil liner comprising a plurality of foil layers is disclosed. The foil layers may each be an electrically conductive material that are stacked on top of each other. The spacing between adjacent foil layers may create a thermal gradient such that the temperature of the plasma is hotter than the temperature of the ion source chamber. In other embodiments, the foil layers may be assembly to sink the heat from the plasma so that the plasma is cooler than the temperature of the ion source chamber. In some embodiments, gaps or protrusions are disposed on one or more of the foil layers to affect the thermal gradient. In certain embodiments, one or more of the foil layers may be constructed of an insulating material to further affect the thermal gradient. The foil liner may be easily assembled, installed and replaced from within the ion source chamber.
    Type: Application
    Filed: March 30, 2018
    Publication date: October 3, 2019
    Inventors: Craig R. Chaney, Adam M. McLaughlin, James A. Sargent, Joshua M. Abeshaus
  • Patent number: 10418223
    Abstract: A foil liner comprising a plurality of foil layers is disclosed. The foil layers may each be an electrically conductive material that are stacked on top of each other. The spacing between adjacent foil layers may create a thermal gradient such that the temperature of the plasma is hotter than the temperature of the ion source chamber. In other embodiments, the foil layers may be assembly to sink the heat from the plasma so that the plasma is cooler than the temperature of the ion source chamber. In some embodiments, gaps or protrusions are disposed on one or more of the foil layers to affect the thermal gradient. In certain embodiments, one or more of the foil layers may be constructed of an insulating material to further affect the thermal gradient. The foil liner may be easily assembled, installed and replaced from within the ion source chamber.
    Type: Grant
    Filed: March 30, 2018
    Date of Patent: September 17, 2019
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Craig R. Chaney, Adam M. McLaughlin, James A. Sargent, Joshua M. Abeshaus
  • Publication number: 20190252226
    Abstract: The present disclosure describes a method and apparatus for determining whether components in a semiconductor manufacturing system are authorized for use in that system. By embedding an identification feature in the component, it is possible for a controller to determine whether that component is qualified for use in the system. Upon detection of an unauthorized component, the system may alert the user or, in certain embodiments, stop operating of the system. This identification feature is embedded in a component by using an additive manufacturing process that allows the identification feature to be embedded in the component without subjecting the identification feature to extreme temperatures.
    Type: Application
    Filed: January 10, 2019
    Publication date: August 15, 2019
    Inventors: Craig R. Chaney, Adam M. McLaughlin
  • Patent number: 10347457
    Abstract: A system and method for varying the temperature of a faceplate for an ion source is disclosed. The faceplate is held against the chamber walls of the ion source by a plurality of fasteners. These fasteners may include tension springs or compression springs. By changing the length of the tension spring or compression spring when under load, the spring force of the spring can be increased. This increased spring force increases the compressive force between the faceplate and the chamber walls, creating improved thermal conductivity. In certain embodiments, the length of the spring is regulated by an electronic length adjuster. This electronic length adjuster is in communication with a controller that outputs an electrical signal indicative of the desired length of the spring. Various mechanisms for adjusting the length of the spring are disclosed.
    Type: Grant
    Filed: December 19, 2017
    Date of Patent: July 9, 2019
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Alexander S. Perel, Sr., David P. Sporleder, Adam M. McLaughlin, Craig R. Chaney, Neil J. Bassom
  • Publication number: 20190189387
    Abstract: A system and method for varying the temperature of a faceplate for an ion source is disclosed. The faceplate is held against the chamber walls of the ion source by a plurality of fasteners. These fasteners may include tension springs or compression springs. By changing the length of the tension spring or compression spring when under load, the spring force of the spring can be increased. This increased spring force increases the compressive force between the faceplate and the chamber walls, creating improved thermal conductivity. In certain embodiments, the length of the spring is regulated by an electronic length adjuster. This electronic length adjuster is in communication with a controller that outputs an electrical signal indicative of the desired length of the spring. Various mechanisms for adjusting the length of the spring are disclosed.
    Type: Application
    Filed: December 19, 2017
    Publication date: June 20, 2019
    Inventors: Alexander S. Perel, David P. Sporleder, Adam M. McLaughlin, Craig R. Chaney, Neil J. Bassom
  • Publication number: 20190139742
    Abstract: A system that utilizes a component that controls thermal gradients and the flow of thermal energy by variation in density is disclosed. Methods of fabricating the component are also disclosed. The component is manufactured using additive manufacturing. In this way, the density of different regions of the component can be customized as desired. For example, a lattice pattern may be created in the interior of a region of the component to reduce the amount of material used. This reduces weight and also decreases the thermal conduction of that region. By using low density regions and high density regions, the flow of thermal energy can be controlled to accommodate the design constraints.
    Type: Application
    Filed: November 3, 2017
    Publication date: May 9, 2019
    Inventors: Adam M. McLaughlin, Craig R. Chaney
  • Patent number: 10217654
    Abstract: The present disclosure describes a method and apparatus for determining whether components in a semiconductor manufacturing system are authorized for use in that system. By embedding an identification feature in the component, it is possible for a controller to determine whether that component is qualified for use in the system. Upon detection of an unauthorized component, the system may alert the user or, in certain embodiments, stop operating of the system. This identification feature is embedded in a component by using an additive manufacturing process that allows the identification feature to be embedded in the component without subjecting the identification feature to extreme temperatures.
    Type: Grant
    Filed: February 12, 2018
    Date of Patent: February 26, 2019
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Craig R. Chaney, Adam M. McLaughlin
  • Publication number: 20170140956
    Abstract: A single piece ceramic platen is disclosed. This platen may be manufactured using additive manufacturing. The single piece ceramic platen may be manufactured using additive manufacturing processes. As such, the single piece ceramic platen may include a plurality of embedded features. Electrodes, cooling channels, heating elements, temperature sensors, strain gauges and back side gas channels may each be embedded in the electrode. Incorporation of cooling channels and heating elements allows the platen to operate over a wider range of temperatures. Further, these features may be disposed on a plurality of different depths following a planar or non-planar pathway. For example, the heating elements may be configured such that heating element in one region of the platen, such as an outer edge, are disposed closer to the top surface of the platen.
    Type: Application
    Filed: November 13, 2015
    Publication date: May 18, 2017
    Inventors: Adam M. McLaughlin, Jordan B. Tye