Patents by Inventor Adam Para

Adam Para has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Scintillator reflective layer coextrusion
    Patent number: 6218670
    Abstract: A polymeric scintillator has a reflective layer adhered to the exterior surface thereof. The reflective layer comprises a reflective pigment and an adhesive binder. The adhesive binder includes polymeric material from which the scintillator is formed. A method of forming the polymeric scintillator having a reflective layer adhered to the exterior surface thereof is also provided. The method includes the steps of (a) extruding an inner core member from a first amount of polymeric scintillator material, and (b) coextruding an outer reflective layer on the exterior surface of the inner core member. The outer reflective layer comprises a reflective pigment and a second amount of the polymeric scintillator material.
    Type: Grant
    Filed: January 29, 1999
    Date of Patent: April 17, 2001
    Assignee: Universities Research Association, Inc.
    Inventors: Jae-Chul Yun, Adam Para