Patents by Inventor Adam Ticknor

Adam Ticknor has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Dual medium filter for ion and particle filtering during semiconductor processing
    Patent number: 10109505
    Abstract: The present disclosure is directed to fluid filtering systems and methods for use during semiconductor processing. One or more embodiments are directed to fluid filtering systems and methods for filtering ions and particles from a fluid as the fluid is being provided to a semiconductor wafer processing tool, such as to a semiconductor wafer cleaning tool.
    Type: Grant
    Filed: February 3, 2017
    Date of Patent: October 23, 2018
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: John H. Zhang, Laertis Economikos, Adam Ticknor, Wei-Tsu Tseng
  • DUAL MEDIUM FILTER FOR ION AND PARTICLE FILTERING DURING SEMICONDUCTOR PROCESSING
    Publication number: 20170148647
    Abstract: The present disclosure is directed to fluid filtering systems and methods for use during semiconductor processing. One or more embodiments are directed to fluid filtering systems and methods for filtering ions and particles from a fluid as the fluid is being provided to a semiconductor wafer processing tool, such as to a semiconductor wafer cleaning tool.
    Type: Application
    Filed: February 3, 2017
    Publication date: May 25, 2017
    Inventors: John H. Zhang, Laertis Economikos, Adam Ticknor, Wei-Tsu Tseng
  • Dual medium filter for ion and particle filtering during semiconductor processing
    Patent number: 9607864
    Abstract: The present disclosure is directed to fluid filtering systems and methods for use during semiconductor processing. One or more embodiments are directed to fluid filtering systems and methods for filtering ions and particles from a fluid as the fluid is being provided to a semiconductor wafer processing tool, such as to a semiconductor wafer cleaning tool.
    Type: Grant
    Filed: May 23, 2012
    Date of Patent: March 28, 2017
    Assignees: STMicroelectronics, Inc., INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: John H. Zhang, Laertis Economikos, Wei-Tsu Tseng, Adam Ticknor
  • DUAL MEDIUM FILTER FOR ION AND PARTICLE FILTERING DURING SEMICONDUCTOR PROCESSING
    Publication number: 20130312791
    Abstract: The present disclosure is directed to fluid filtering systems and methods for use during semiconductor processing. One or more embodiments are directed to fluid filtering systems and methods for filtering ions and particles from a fluid as the fluid is being provided to a semiconductor wafer processing tool, such as to a semiconductor wafer cleaning tool.
    Type: Application
    Filed: May 23, 2012
    Publication date: November 28, 2013
    Applicants: INTERNATIONAL BUSINESS MACHINES CORPORATION, STMicroelectronics, Inc.
    Inventors: John H. Zhang, Laertis Economikos, Wei-Tsu Tseng, Adam Ticknor
  • WAFER REMOVING FORCE REDUCTION ON CMP TOOL
    Publication number: 20070190788
    Abstract: Reduction of a wafer removing force on a chemical mechanical planarization (CMP) tool that includes planarizing a wafer on a platen at a wafer/platen interface; applying carbonated water to the wafer/platen interface so as to reduce the removing force; and removing the wafer from the platen.
    Type: Application
    Filed: February 15, 2006
    Publication date: August 16, 2007
    Inventors: Manoj Balachandran, James Hagan, Ben Kim, Deoram Persaud, Adam Ticknor, Wei-Tsu Tseng