Abstract: An optical reflective device referred to as a skew mirror, having a reflective axis that need not be constrained to surface normal, is described. Examples of skew mirrors are configured to reflect light about substantially constant reflective axes across a relatively wide range of wavelengths. In some examples, a skew mirror has substantially constant reflective axes across a relatively wide range of angles of incidence. Exemplary methods for making and using skew mirrors are also disclosed. Skew mirrors include a grating structure, which in some examples comprises a hologram.

Abstract: An optical device for polarizing light including a polarization altering element operatively coupled to a light path associated with the first light coupling device and the second light coupling device is described. The optical device may further include a first waveguide portion including a first layer having parallel plane surfaces with the first waveguide portion having a first light coupling device. The optical device may also include a second waveguide portion including a second layer having parallel plane surfaces with the second waveguide portion having a second light coupling device.

Abstract: An optical reflective device for homogenizing light including a waveguide having a first and second waveguide surface and a partially reflective element is disclosed. The partially reflective element may be located between the first waveguide surface and the second waveguide surface. The partially reflective element may have a reflective axis parallel to a waveguide surface normal. The partially reflective element may be configured to reflect light incident on the partially reflective element at a first reflectivity for a first set of incidence angles and reflect light incident on the partially reflective element at a second reflectivity for a second set of incident angles.

Abstract: An optical reflective device for reflecting light including a grating medium having a first and second grating structure is disclosed. The first grating structure may be configured to reflect light of a wavelength about a first reflective axis offset from a surface normal of the grating medium at a first incidence angle. The second grating structure may be configured to reflect light of the wavelength about a second reflective axis offset from the surface normal of the grating medium at a second incidence angle different from the first incidence angle. The second reflective axis may be different from the first reflective axis.

Abstract: An optical reflective device referred to as a skew mirror, having a reflective axis that need not be constrained to surface normal, is described. Examples of skew mirrors are configured to reflect light about substantially constant reflective axes across a relatively wide range of wavelengths. In some examples, a skew mirror has substantially constant reflective axes across a relatively wide range of angles of incidence. Exemplary methods for making and using skew mirrors are also disclosed. Skew mirrors include a grating structure, which in some examples comprises a hologram.

Abstract: An optical reflective device referred to as a skew mirror, having a reflective axis that need not be constrained to surface normal, is described. Examples of skew mirrors are configured to reflect light about a constant reflective axis across a relatively wide range of wavelengths. In some examples, a skew mirror has a constant reflective axis across a relatively wide range of angles of incidence. Exemplary methods for making and using skew mirrors are also disclosed. Skew mirrors include a grating structure, which in some examples comprises a hologram.

Abstract: Systems and methods for liquid deposition photolithography are described. In particular, some embodiments relate to systems and methods for using photolithography to control the 2D structure of a thin layer of material (e.g., photopolymer) using various masks, projection optics and materials. In one or more embodiments, this thin layer can be manipulated by micro-fluidic techniques such that it can be formed, patterned and post-processed in a liquid environment, vastly simplifying the creation of multi-layer structures. Multiple layers are rapidly built up to create thick structures of possibly multiple materials that are currently challenging to fabricate by existing methods.

Abstract: Systems and methods for liquid deposition photolithography are described. In particular, some embodiments relate to systems and methods for using photolithography to control the 2D structure of a thin layer of material (e.g., photopolymer) using various masks, projection optics and materials. In one or more embodiments, this thin layer can be manipulated by micro-fluidic techniques such that it can be formed, patterned and post-processed in a liquid environment, vastly simplifying the creation of multi-layer structures. Multiple layers are rapidly built up to create thick structures of possibly multiple materials that are currently challenging to fabricate by existing methods.