Patents by Inventor Adam Weisel

Adam Weisel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240180599
    Abstract: A system for surgical planning and assessment of spinal deformity correction is provided that has a spinal imaging system and a control unit. The spinal imaging system is configured to collect at least one digitized position of one or more vertebral bodies of a subject. The control unit is configured to receive the at least one digitized position, and calculate, based on the at least one digitized position, an optimized posture for the subject. The control unit is configured to receive one or more simulated spinal correction inputs, and based on the inputs and optimized posture, predict an optimal simulated postoperative surgical correction.
    Type: Application
    Filed: January 11, 2024
    Publication date: June 6, 2024
    Inventors: David Skinlo, Thomas B. Buford, Ephraim Akyuz, Thomas Weisel, Roger Pisarnwongs, Adam G. Beckett, Jeffrey Lee Gilbert, Frank Yan Liu, Urs Weber, Edmund J. Roschak, Blair Walker, Scott Pool, Mark T. Dahl
  • Patent number: 10712240
    Abstract: Embodiments of the present invention are directed to methods, systems, and software for assessing contaminant quantities in a fluid. Fluid enters a reaction chamber. A controller then signals two different sheets with different reagents to move into the reaction chamber. One sheet contains reagents to form a contaminant byproduct or gas, while the other sheet is saturated with reagent that will have a photometric effect upon reacting with the contaminant byproduct or gas. After the photometric effect has occurred, the controller moves the reacted portion of the other reagent sheet into alignment with a photometric sensor. This photometric effect is calculated to contaminant concentration. The concentration is recorded and the data is transmitted to memory. The fluid sample in the chamber is drained and the remaining solid waste is collected onto the first reagent sheet. Both sheets are individually collected into separate controllable collectors.
    Type: Grant
    Filed: April 19, 2017
    Date of Patent: July 14, 2020
    Inventors: Ariana Schanzer, Michale Goldberger, Aardra Rajendran, Adam Weisel
  • Publication number: 20170299502
    Abstract: Embodiments of the present invention are directed to methods, systems, and software for assessing contaminant quantities in a fluid. Fluid enters a reaction chamber. A controller then signals two different sheets with different reagents to move into the reaction chamber. One sheet contains reagents to form a contaminant byproduct or gas, while the other sheet is saturated with reagent that will have a photometric effect upon reacting with the contaminant byproduct or gas. After the photometric effect has occurred, the controller moves the reacted portion of the other reagent sheet into alignment with a photometric sensor. This photometric effect is calculated to contaminant concentration. The concentration is recorded and the data is transmitted to memory. The fluid sample in the chamber is drained and the remaining solid waste is collected onto the first reagent sheet. Both sheets are individually collected into separate controllable collectors.
    Type: Application
    Filed: April 19, 2017
    Publication date: October 19, 2017
    Inventors: Ariana Schanzer, Michale Goldberger, Aardra Rajendran, Adam Weisel