Abstract: The semiconductor apparatus according to the present invention includes: a second-conductivity-type first diffusion region formed on the semiconductor layer; a first-conductivity-type second diffusion region formed in the first diffusion region; a second-conductivity-type first high concentration diffusion region and a first-conductivity-type second high concentration diffusion region formed in the second diffusion region; a second-conductivity-type third high concentration diffusion region, separated by a given distance from the second diffusion region, in the first diffusion region; and a gate electrode formed above and between the first high concentration diffusion region and third high concentration diffusion region, with a gate insulation film interposed therebetween, where the gate electrode is formed overlapping the first high concentration diffusion region, and the gate electrode is electrically connected with the first high concentration diffusion region and second high concentration diffusion region