Patents by Inventor Addepalli Sai SUSMITA

Addepalli Sai SUSMITA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD AND APPARATUS OF ACHIEVING HIGH INPUT IMPEDANCE WITHOUT USING FERRITE MATERIALS FOR RF FILTER APPLICATIONS IN PLASMA
    Publication number: 20210111000
    Abstract: Implementations of the present disclosure generally relate to methods and apparatus for generating and controlling plasma, for example RF filters, used with plasma chambers. In one implementation, a plasma processing apparatus is provided. The plasma processing apparatus comprises a chamber body, a powered gas distribution manifold enclosing a processing volume and a radio frequency (RF) filter. A pedestal having a substrate-supporting surface is disposed in the processing volume. A heating assembly comprising one or more heating elements is disposed within the pedestal for controlling a temperature profile of the substrate-supporting surface. A tuning assembly comprising a tuning electrode is disposed within the pedestal between the one or more heating elements and the substrate-supporting surface. The RF filter comprises an air core inductor, wherein at least one of the heating elements, the tuning electrode, and the gas distribution manifold is electrically coupled to the RF filter.
    Type: Application
    Filed: November 30, 2020
    Publication date: April 15, 2021
    Inventors: Zheng John Ye, Abdul Aziz Khaja, Amit Kumar Bansal, Kwangduk Douglas Lee, Xing Lin, Jianhua Zhou, Addepalli Sai Susmita, Juan Carlos Rocha-Alvarez
  • Method and apparatus of achieving high input impedance without using ferrite materials for RF filter applications in plasma chambers
    Patent number: 10879041
    Abstract: Implementations of the present disclosure generally relate to methods and apparatus for generating and controlling plasma, for example RF filters, used with plasma chambers. In one implementation, a plasma processing apparatus is provided. The plasma processing apparatus comprises a chamber body, a powered gas distribution manifold enclosing a processing volume and a radio frequency (RF) filter. A pedestal having a substrate-supporting surface is disposed in the processing volume. A heating assembly comprising one or more heating elements is disposed within the pedestal for controlling a temperature profile of the substrate-supporting surface. A tuning assembly comprising a tuning electrode is disposed within the pedestal between the one or more heating elements and the substrate-supporting surface. The RF filter comprises an air core inductor, wherein at least one of the heating elements, the tuning electrode, and the gas distribution manifold is electrically coupled to the RF filter.
    Type: Grant
    Filed: July 19, 2016
    Date of Patent: December 29, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Zheng John Ye, Abdul Aziz Khaja, Amit Kumar Bansal, Kwangduk Douglas Lee, Xing Lin, Jianhua Zhou, Addepalli Sai Susmita, Juan Carlos Rocha-Alvarez
  • METHOD AND APPARATUS OF ACHIEVING HIGH INPUT IMPEDANCE WITHOUT USING FERRITE MATERIALS FOR RF FILTER APPLICATIONS IN PLASMA CHAMBERS
    Publication number: 20170069464
    Abstract: Implementations of the present disclosure generally relate to methods and apparatus for generating and controlling plasma, for example RF filters, used with plasma chambers. In one implementation, a plasma processing apparatus is provided. The plasma processing apparatus comprises a chamber body, a powered gas distribution manifold enclosing a processing volume and a radio frequency (RF) filter. A pedestal having a substrate-supporting surface is disposed in the processing volume. A heating assembly comprising one or more heating elements is disposed within the pedestal for controlling a temperature profile of the substrate-supporting surface. A tuning assembly comprising a tuning electrode is disposed within the pedestal between the one or more heating elements and the substrate-supporting surface. The RF filter comprises an air core inductor, wherein at least one of the heating elements, the tuning electrode, and the gas distribution manifold is electrically coupled to the RF filter.
    Type: Application
    Filed: July 19, 2016
    Publication date: March 9, 2017
    Inventors: Zheng John YE, Abdul Aziz KHAJA, Amit Kumar BANSAL, Kwangduk Douglas LEE, Xing LIN, Jianhua ZHOU, Addepalli Sai SUSMITA, Juan Carlos ROCHA-ALVAREZ