Abstract: A semiconductor device (10) includes a bump structure that reduces stress and thus reduces passivation cracking and silicon cratering that can be a failure mode in semiconductor manufacturing. The stress is reduced by forming a polyimide layer (16) over a passivation layer (14). The polyimide layer (16) is extended beyond an edge of the passivation layer (14) over the metal pad (12). A solder bump (22) is composed of a eutectic material and is formed on the metal pad (12) and on the polyimide layer (16). The polyimide layer (16) prevents the solder bump (22) from contacting the passivation layer (14). This is useful for electroless or electroplating technology and may also be useful in other types of bump forming technology such as C4 and E3.

Abstract: A bumped semiconductor device including bond pad (12) formed on a semiconductor die (10), and a passivation layer (14) overlying the semiconductor die and a portion of the bond pad (12). A solder bump (22) is formed so as to overlie the bond pad (12), and a stress isolation trench (15) is formed in the passivation layer (14), so as to surround the solder bump (22).