Abstract: A calibration standard for determining an intensity decay related to an evanescent field generated close to the interface between a sample to be tested and a substrate on which the sample is to be deposited, preparation and analysis methods and use thereof.

Abstract: A calibration standard for determining an intensity decay related to an evanescent field generated close to the interface between a sample to be tested and a substrate on which the sample is to be deposited, preparation and analysis methods and use thereof.

Abstract: Provided is an optical device including a dielectric transparent substrate and a metallic layer having a thickness between about 20 nm and about 1000 nm disposed on the transparent substrate. The metallic layer comprises at least one localized group of cavities, each localized group being confined within a diameter smaller than about 5 um, and each localized group comprising at least two cavities, with a distance between two adjacent cavities in the localized group being between about 100 nm and about 2000 nm. Each cavity in the localized group is shaped as a through-hole in the metallic layer, the through hole having a polygonal cross-section having a polygon side length between 50 nm and 2000 nm.

Abstract: Provided is an optical device including a dielectric transparent substrate and a metallic layer having a thickness between about 20 nm and about 1000 nm disposed on the transparent substrate. The metallic layer comprises at least one localized group of cavities, each localized group being confined within a diameter smaller than about 5 um, and each localized group comprising at least two cavities, with a distance between two adjacent cavities in the localized group being between about 100 nm and about 2000 nm. Each cavity in the localized group is shaped as a through-hole in the metallic layer, the through hole having a polygonal cross-section having a polygon side length between 50 nm and 2000 nm.

Abstract: Provided is a method for the fabrication of a nanoporous metal-based film. The method includes providing a ceramic aerogel substrate having a nanoporous structure. The substrate may include a bulk portion and a surface portion and the surface portion may be chemically or physically modified. The method may further include depositing a metal or a metal oxide from a deposition source on the ceramic aerogel substrate by a physical vapor deposition (PVD) process. The deposition may be performed at a power of less than about 90 W or at a current ranging from about 0.5 mA to about 100 mA. Further provided is a nanoporous metal-based film supported on a ceramic aerogel substrate having a nanoporous structure. The nanoporous structure of the aerogel defines the nanoporous structure of the metal-based film.