Abstract: Systems and methods of engineering the optical properties of an optical Integrated Computational Element device using ion implantation during fabrication are provided. A system as disclosed herein includes a chamber, a material source contained within the chamber, an ion source configured to provide a high-energy ion beam, a substrate holder to support a multilayer stack of materials that form the Integrated Computational Element device, a measurement system, and a computational unit. The material source provides a material layer to the multilayer stack, and at least a portion of the ion beam is deposited in the material layer according to an optical value provided by the measurement system.

Abstract: A memristor element is used to create a spectrally programmable optical device. An electromagnetic field is applied across the memristor element in order to alter its spectral properties. In turn, the spectral properties of the electromagnetic radiation optically interacting with the memristor element are also altered. This alteration in spectral properties allows the memristor to be “programmed” to achieve a variety of transmission/reflection/absorption functions.

Abstract: An ambient light sensor system ma be mounted in alignment with a window in a display cover layer associated with a display in an electronic device. The ambient light sensor system may have a light diffuser layer and an infrared-light-blocking filter. The light diffuser layer may have a polymer layer with embedded light-scattering desiccant particles. An ambient light sensor in the ambient light sensor system may receive ambient light through the light diffuser layer and the infrared-light-blocking filter. The infrared-light-blocking filter may have a polymer substrate and a thin-film interference filter formed from a stack of inorganic thin-film layers on the polymer substrate. Light-scattering desiccant particles may be incorporated into the polymer substrate of the infrared-light-blocking filter. Desiccant may also be incorporated into ambient light sensor support structures.

Abstract: Systems and methods of engineering the optical properties of an optical Integrated Computational Element device using ion implantation during fabrication are provided. A system as disclosed herein includes a chamber, a material source contained within the chamber, an ion source configured to provide a high-energy ion beam, a substrate holder to support a multilayer stack of materials that form the Integrated Computational Element device, a measurement system, and a computational unit. The material source provides a material layer to the multilayer stack, and at least a portion of the ion beam is deposited in the material layer according to an optical value provided by the measurement system.

Abstract: A memristor element is used to create a spectrally programmable optical computing device for use in, for example, a downhole environment. An electromagnetic field is applied across the memristor element in order to alter its spectral properties. In turn, the spectral properties of sample-interacted light optically interacting with the memristor element are also altered. This alteration in spectral properties allows the memristor to be “programmed” to achieve a variety of transmission/reflection/absorption functions.

Abstract: A method of fabricating an optical computing device using a photonic crystal-based integrated computational element is provided. The method includes selecting a photonic crystal structure with a design suite stored in a non-transitory, computer-readable medium and obtaining a transmission spectrum for the selected photonic crystal. Further, the method includes determining a predictive power of a photonic crystal-based integrated computational element for a characteristic of a sample using the transmission spectrum and a spectral database. And adjusting the transmission spectrum to improve a predictive power of the photonic crystal-based integrated computational element for measuring a characteristic of a sample being analyzed. Also, fabricating the photonic crystal structure for the photonic crystal-based integrated computational element when the predictive power surpasses a pre-selected threshold.

Abstract: An example formation fluid analysis tool includes an optical element and a detector configured to receive light passed through the optical element. The optical element is configured to receive light from a fluid sample and comprises a substrate, an integrated computational element (ICE) fabricated on a first side of the substrate, and an optical filter fabricated on a second side of the substrate opposite the first side.

Abstract: Optical computing devices may include capacitance-based nanomaterial detectors. For example, an optical computing device may include a light source that emits electromagnetic radiation into an optical train extending from the light source to a capacitance-based nanomaterial detector; a material positioned in the optical train to optically interact with the electromagnetic radiation and produce optically interacted light; and the capacitance-based nanomaterial detector comprising one or more nano-sized materials configured to have a resonantly-tuned absorption spectrum and being configured to receive the optically interacted light, apply a vector related to the characteristic of interest to the optically interacted light using the resonantly-tuned absorption spectrum, and generate an output signal indicative of the characteristic of interest.

Abstract: Technologies are described for monitoring characteristics of layers of integrated computational elements (ICEs) during fabrication using an in-situ spectrometer operated in step-scan mode in combination with lock-in or time-gated detection. As part of the step-scan mode, a wavelength selecting element of the spectrometer is discretely scanned to provide spectrally different instances of probe-light, such that each of the spectrally different instances of the probe-light is provided for a finite time interval. Additionally, an instance of the probe-light interacted during the finite time interval with the ICE layers includes a modulation that is being detected by the lock-in or time-gated detection over the finite time interval.

Abstract: Systems and methods of controlling a deposition rate during thin-film fabrication are provided. A system as provided may include a chamber, a material source contained within the chamber, an electrical component to activate the material source, a substrate holder to support the multilayer stack and at least one witness sample. The system may further include a measurement device and a computational unit. The material source provides a layer of material to the multilayer stack and to the witness sample at a deposition rate controlled at least partially by the electrical component and based on a correction value obtained in real-time by the computational unit. In some embodiments, the correction value is based on a measured value provided by the measurement device and a computed value provided by the computational unit according to a model.

Abstract: A system and method to design highly-sensitive Integrated Computational Elements for optical computing devices. A harmonic line shape is defined and used to simulate an optical response function which has a plurality of parameters that are varied until an ideal optical response function is determined. The ideal optical response function will be that function which maximizes the output sensitivity and/or minimizes the Standard Error of Calibration. Thereafter, the method designs a film stack having an optical response function that matches the ideal transmission function, and an ICE is fabricated based upon this design.

Abstract: Systems, tools, and methods are presented for processing a plurality of spectral ranges from an electromagnetic radiation that has been interacted with a fluid. Each spectral range within the plurality corresponds to a property of the fluid or a constituent therein. In one instance, a series of spectral analyzers, each including an integrated computational element coupled to an optical transducer, forms a monolithic structure to receive interacted electromagnetic radiation from the fluid. Each spectral analyzer is configured to process one of the plurality of spectral ranges. The series is ordered so spectral ranges are processed progressively from shortest wavelengths to longest wavelengths as interacted electromagnetic radiation propagates therethrough. Other systems, tools, and methods are presented.

Abstract: Techniques include receiving a design of an integrated computational element (ICE) including (1) specification of a substrate and multiple layers, their respective target thicknesses and refractive indices, adjacent layer refractive indices being different from each other, and a notional ICE fabricated based on the ICE design being related to a characteristic of a sample, and (2) indication of target ICE performance; forming one or more of the layers of an ICE based on the ICE design; in response to determining that an ICE performance would not meet the target performance if the ICE having the formed layers were completed based on the received ICE design, updating the ICE design to a new total number of layers and new target layer thicknesses, such that performance of the ICE completed based on the updated ICE design meets the target performance; and forming some of subsequent layers based on the updated ICE design.

Abstract: Systems and methods are disclosed for improving optical spectrum fidelity of an integrated computational element fabricated on a substrate. The integrated computational element is configured, upon completion, to process an optical spectrum representing a chemical constituent of a production fluid from a wellbore. The systems and methods measure in situ a thickness, a complex index of refraction, or both of a film formed during fabrication to generate a predicted optical spectrum. The predicted optical spectrum is compared to a target optical spectrum. Revisions to a design of the integrated computational element are conducted in situ to improve optical spectrum fidelity relative to the target optical spectrum. Other systems and methods are presented.

Abstract: Systems and methods of engineering the optical properties of an optical Integrated Computational Element device using ion implantation during fabrication are provided. A system as disclosed herein includes a chamber, a material source contained within the chamber, an ion source configured to provide a high-energy ion beam, a substrate holder to support a multilayer stack of materials that form the Integrated Computational Element device, a measurement system, and a computational unit. The material source provides a material layer to the multilayer stack, and at least a portion of the ion beam is deposited in the material layer according to an optical value provided by the measurement system.

Abstract: Technologies are described for monitoring characteristics of layers of integrated computational elements (ICEs) during fabrication using an in-situ spectrometer operated in step-scan mode in combination with lock-in or time-gated detection. As part of the step-scan mode, a wavelength selecting element of the spectrometer is discretely scanned to provide spectrally different instances of probe-light, such that each of the spectrally different instances of the probe-light is provided for a finite time interval. Additionally, an instance of the probe-light interacted during the finite time interval with the ICE layers includes a modulation that is being detected by the lock-in or time-gated detection over the finite time interval.

Abstract: Techniques include receiving a design of an integrated computational element (ICE) including specification of a substrate and a plurality of layers, their respective target thicknesses and complex refractive indices, complex refractive indices of adjacent layers being different from each other, and a notional ICE fabricated in accordance with the ICE design being related to a characteristic of a sample; forming at least some of the layers of a plurality of ICEs in accordance with the ICE design using a deposition source, where the layers of the ICEs being formed are supported on a support that is periodically moved relative to the deposition source during the forming; monitoring characteristics of the layers of the ICEs during the forming, the monitoring of the characteristics being performed using a timing of the periodic motion of the support relative to the deposition source; and adjusting the forming based on results of the monitoring.

Abstract: Techniques include receiving a design of an integrated computational element (ICE) including (1) specification of a substrate and multiple layers, their respective target thicknesses and refractive indices, adjacent layer refractive indices being different from each other, and a notional ICE fabricated based on the ICE design being related to a characteristic of a sample, and (2) indication of target ICE performance; forming one or more of the layers of an ICE based on the ICE design; in response to determining that an ICE performance would not meet the target performance if the ICE having the formed layers were completed based on the received ICE design, updating the ICE design to a new total number of layers and new target layer thicknesses, such that performance of the ICE completed based on the updated ICE design meets the target performance; and forming some of subsequent layers based on the updated ICE design.

Abstract: Systems and methods of controlling a deposition rate during thin-film fabrication are provided. A system as provided may include a chamber, a material source contained within the chamber, an electrical component to activate the material source, a substrate holder to support the multilayer stack and at least one witness sample. The system may further include a measurement device and a computational unit. The material source provides a layer of material to the multilayer stack and to the witness sample at a deposition rate controlled at least partially by the electrical component and based on a correction value obtained in real-time by the computational unit. In some embodiments, the correction value is based on a measured value provided by the measurement device and a computed value provided by the computational unit according to a model.