Abstract: The present invention provides an in-line wrapper sentry for a programming language to detect events and to transparently extend the behavior of the events.

Abstract: A computer system capable of compiling PROLOG programs appends to the compiled code information necessary to recreate the source which generated the compiled code. This allows program statements which use the original source code to be compiled. Each program statement is compiled into a separate block of code, with all statements in a procedure linked together in lists. Program statements can be compiled as they are created, and statements can be added or deleted by adding or deleting blocks of compiled code from the appropriate lists.

Abstract: In execution of PROLOG-type programs, certain information is not saved at the time a procedure call is made. Such information is saved only if it becomes necessary, and at that time is saved in a known manner. If subsequent events make it unnecessary to save that certain information, the time required to do so has not been spent, thus improving system performance.

Abstract: Operations of a plasma etch reactor (10) are monitored to detect aberrations in etching operations. A reference end point trace is defined (62) for the etch process. Regions are defined in the reference end point trace (70) with aid of a dynamic time warping matching function (84) and characteristics and tolerances for each region are defined (72-80). The etcher is run and an actual end point trace is obtained (82) from the running of the etcher. A warping function is constructed (88) between the actual trace and the reference trace. In building the warping function, candidate path segments (100) are constructed according to a minimum cumulative cost function (96). Once the regions of the reference trace and the actual trace has been matched according to an optimum dynamic time warping function path (106), characteristics of the matched regions are compared (66) to determine whether aberrations have occurred during the etch process.

Abstract: An improved apparatus and process for detecting aberrations in production process operations is provided. In one embodiment, operations of a plasma etch reactor (10) are monitored to detect aberrations in etching operations. A reference end-point trace (EPT) is defined (62) for the etch process. Regions are defined in the reference end-point trace (70) and characteristics and tolerances for each region are defined (72-80). The etcher is run and an actual EPT is obtained (82) from the running of the etcher. The actual EPT is analyzed to identify proposed regions of the actual EPT (86), and then the proposed regions of the actual EPT are matched with regions of the reference EPT (96). The system employs a series of heuristic functions in matching proposed regions of the actual EPT with regions of the reference EPT.